The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1-xAs nTFETs
Autor(a) principal: | |
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Data de Publicação: | 2017 |
Outros Autores: | , , , , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1109/TED.2017.2721110 http://hdl.handle.net/11449/159674 |
Resumo: | The basic analog parameters of three splits of InxGa1 - xAs nTFETs are analyzed for the first time. The first two splits are In0.53Ga0.47As devices with a 3-nm HfO2/1-nm Al2O3 and a 2-nm HfO2/1-nm Al2O3, while the last one is an In0.7Ga0.3As channel with a 3-nm HfO2/1-nm Al2O3 gate. The lowequivalentoxide thicknessimproves the electrostatic coupling, enhancing I-DS, and, consequently, also gm and A(V), especially for higher V-GS. The InGaAs tunnel field-effect transistors (TFETs) show compatible performance with Si TFETs, and have better performance than Si MOSFETs, making them useful for low-power and lowvoltage analog applications. The highest efficiency is found using the combination of a 2-nm HfO2 with In0.53Ga0.47As, due to the 56-mV/dec subthreshold swing obtained. For all splits, the A(V) peak can be related to the V-GS necessary for band-to-band tunneling to become the dominant transport mechanism. |
id |
UNSP_44c9c72fce7e79b4fa96c2deb2971b26 |
---|---|
oai_identifier_str |
oai:repositorio.unesp.br:11449/159674 |
network_acronym_str |
UNSP |
network_name_str |
Repositório Institucional da UNESP |
repository_id_str |
2946 |
spelling |
The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1-xAs nTFETsAnalog parameterscurrent conduction mechanismsintrinsic voltage gainsub-60 mV/dectunnel field-effect transistors (TFET)The basic analog parameters of three splits of InxGa1 - xAs nTFETs are analyzed for the first time. The first two splits are In0.53Ga0.47As devices with a 3-nm HfO2/1-nm Al2O3 and a 2-nm HfO2/1-nm Al2O3, while the last one is an In0.7Ga0.3As channel with a 3-nm HfO2/1-nm Al2O3 gate. The lowequivalentoxide thicknessimproves the electrostatic coupling, enhancing I-DS, and, consequently, also gm and A(V), especially for higher V-GS. The InGaAs tunnel field-effect transistors (TFETs) show compatible performance with Si TFETs, and have better performance than Si MOSFETs, making them useful for low-power and lowvoltage analog applications. The highest efficiency is found using the combination of a 2-nm HfO2 with In0.53Ga0.47As, due to the 56-mV/dec subthreshold swing obtained. For all splits, the A(V) peak can be related to the V-GS necessary for band-to-band tunneling to become the dominant transport mechanism.Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Imec's Logic Device ProgramUniv Sao Paulo, BR-05508010 Sao Paulo, BrazilSao Paulo State Univ, BR-13876750 Sao Joao Da Boa Vista, BrazilIMEC, B-3001 Leuven, BelgiumKatholieke Univ Leuven, Dept Elect Engn, B-3000 Leuven, BelgiumSao Paulo State Univ, BR-13876750 Sao Joao Da Boa Vista, BrazilIeee-inst Electrical Electronics Engineers IncUniversidade de São Paulo (USP)Universidade Estadual Paulista (Unesp)IMECKatholieke Univ LeuvenBordallo, Caio C. M.Martino, Joao AntonioAgopian, Paula G. D. [UNESP]Alian, AlirezaMols, YvesRooyackers, RitaVandooren, AnneVerhulst, Anne S.Simoen, EddyClaeys, CorCollaert, Nadine2018-11-26T15:44:52Z2018-11-26T15:44:52Z2017-09-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article3588-3593application/pdfhttp://dx.doi.org/10.1109/TED.2017.2721110Ieee Transactions On Electron Devices. Piscataway: Ieee-inst Electrical Electronics Engineers Inc, v. 64, n. 9, p. 3588-3593, 2017.0018-9383http://hdl.handle.net/11449/15967410.1109/TED.2017.2721110WOS:000408118700010WOS000408118700010.pdf04969095954656960000-0002-0886-7798Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengIeee Transactions On Electron Devices0,839info:eu-repo/semantics/openAccess2023-11-03T06:12:11Zoai:repositorio.unesp.br:11449/159674Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T16:50:27.417244Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1-xAs nTFETs |
title |
The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1-xAs nTFETs |
spellingShingle |
The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1-xAs nTFETs Bordallo, Caio C. M. Analog parameters current conduction mechanisms intrinsic voltage gain sub-60 mV/dec tunnel field-effect transistors (TFET) |
title_short |
The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1-xAs nTFETs |
title_full |
The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1-xAs nTFETs |
title_fullStr |
The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1-xAs nTFETs |
title_full_unstemmed |
The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1-xAs nTFETs |
title_sort |
The Influence of Oxide Thickness and Indium Amount on the Analog Parameters of InxGa1-xAs nTFETs |
author |
Bordallo, Caio C. M. |
author_facet |
Bordallo, Caio C. M. Martino, Joao Antonio Agopian, Paula G. D. [UNESP] Alian, Alireza Mols, Yves Rooyackers, Rita Vandooren, Anne Verhulst, Anne S. Simoen, Eddy Claeys, Cor Collaert, Nadine |
author_role |
author |
author2 |
Martino, Joao Antonio Agopian, Paula G. D. [UNESP] Alian, Alireza Mols, Yves Rooyackers, Rita Vandooren, Anne Verhulst, Anne S. Simoen, Eddy Claeys, Cor Collaert, Nadine |
author2_role |
author author author author author author author author author author |
dc.contributor.none.fl_str_mv |
Universidade de São Paulo (USP) Universidade Estadual Paulista (Unesp) IMEC Katholieke Univ Leuven |
dc.contributor.author.fl_str_mv |
Bordallo, Caio C. M. Martino, Joao Antonio Agopian, Paula G. D. [UNESP] Alian, Alireza Mols, Yves Rooyackers, Rita Vandooren, Anne Verhulst, Anne S. Simoen, Eddy Claeys, Cor Collaert, Nadine |
dc.subject.por.fl_str_mv |
Analog parameters current conduction mechanisms intrinsic voltage gain sub-60 mV/dec tunnel field-effect transistors (TFET) |
topic |
Analog parameters current conduction mechanisms intrinsic voltage gain sub-60 mV/dec tunnel field-effect transistors (TFET) |
description |
The basic analog parameters of three splits of InxGa1 - xAs nTFETs are analyzed for the first time. The first two splits are In0.53Ga0.47As devices with a 3-nm HfO2/1-nm Al2O3 and a 2-nm HfO2/1-nm Al2O3, while the last one is an In0.7Ga0.3As channel with a 3-nm HfO2/1-nm Al2O3 gate. The lowequivalentoxide thicknessimproves the electrostatic coupling, enhancing I-DS, and, consequently, also gm and A(V), especially for higher V-GS. The InGaAs tunnel field-effect transistors (TFETs) show compatible performance with Si TFETs, and have better performance than Si MOSFETs, making them useful for low-power and lowvoltage analog applications. The highest efficiency is found using the combination of a 2-nm HfO2 with In0.53Ga0.47As, due to the 56-mV/dec subthreshold swing obtained. For all splits, the A(V) peak can be related to the V-GS necessary for band-to-band tunneling to become the dominant transport mechanism. |
publishDate |
2017 |
dc.date.none.fl_str_mv |
2017-09-01 2018-11-26T15:44:52Z 2018-11-26T15:44:52Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1109/TED.2017.2721110 Ieee Transactions On Electron Devices. Piscataway: Ieee-inst Electrical Electronics Engineers Inc, v. 64, n. 9, p. 3588-3593, 2017. 0018-9383 http://hdl.handle.net/11449/159674 10.1109/TED.2017.2721110 WOS:000408118700010 WOS000408118700010.pdf 0496909595465696 0000-0002-0886-7798 |
url |
http://dx.doi.org/10.1109/TED.2017.2721110 http://hdl.handle.net/11449/159674 |
identifier_str_mv |
Ieee Transactions On Electron Devices. Piscataway: Ieee-inst Electrical Electronics Engineers Inc, v. 64, n. 9, p. 3588-3593, 2017. 0018-9383 10.1109/TED.2017.2721110 WOS:000408118700010 WOS000408118700010.pdf 0496909595465696 0000-0002-0886-7798 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Ieee Transactions On Electron Devices 0,839 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
3588-3593 application/pdf |
dc.publisher.none.fl_str_mv |
Ieee-inst Electrical Electronics Engineers Inc |
publisher.none.fl_str_mv |
Ieee-inst Electrical Electronics Engineers Inc |
dc.source.none.fl_str_mv |
Web of Science reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1808128707888414720 |