Impact of InxGa1-x composition and source Zn diffusion temperature on intrinsic voltage gain in InGaAs TFETs
Autor(a) principal: | |
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Data de Publicação: | 2017 |
Outros Autores: | , , , , , , , , , , |
Tipo de documento: | Artigo de conferência |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1109/S3S.2016.7804393 http://hdl.handle.net/11449/169419 |
Resumo: | This work reports for the first time on the experimental study of the intrinsic voltage gain of InGaAs nTFET. The influence of Indium/Gallium composition and Zn diffusion temperature is analyzed. For a higher Indium amount (In0.7Ga0.3As compared to In0.53Ga0.47As) the band to band tunneling (BTBT) is improved due to bandgap narrowing. A higher Zn diffusion temperature gives rise to a higher source doping, resulting in a smaller tunneling length, which also increases BTBT. In both devices the intrinsic voltage gain is improved. One interesting characteristic of these devices is that they present good analog performance at low voltages (VGS=VDS=0.6V), which is promising for low power/low voltage analog applications. High-temperature operation increases in all cases more the output conductance than the transconductance, resulting in a lower intrinsic voltage gain. |
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Impact of InxGa1-x composition and source Zn diffusion temperature on intrinsic voltage gain in InGaAs TFETsAnalogIII-VmaterialsTemperature effectsTFETThis work reports for the first time on the experimental study of the intrinsic voltage gain of InGaAs nTFET. The influence of Indium/Gallium composition and Zn diffusion temperature is analyzed. For a higher Indium amount (In0.7Ga0.3As compared to In0.53Ga0.47As) the band to band tunneling (BTBT) is improved due to bandgap narrowing. A higher Zn diffusion temperature gives rise to a higher source doping, resulting in a smaller tunneling length, which also increases BTBT. In both devices the intrinsic voltage gain is improved. One interesting characteristic of these devices is that they present good analog performance at low voltages (VGS=VDS=0.6V), which is promising for low power/low voltage analog applications. High-temperature operation increases in all cases more the output conductance than the transconductance, resulting in a lower intrinsic voltage gain.Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)ImecLSI PSI USP University of Sao PauloUNESP Univ. Estadual Paulista Campus de Sao Joao da Boa VistaE.E. Dept. KU LeuvenUNESP Univ. Estadual Paulista Campus de Sao Joao da Boa VistaImecUniversidade de São Paulo (USP)Universidade Estadual Paulista (Unesp)KU LeuvenBordallo, C.Martino, J.Agopian, P. [UNESP]Alian, A.Mols, Y.Rooyackers, R.Vandooren, A.Verhulst, A.Simoen, E.Claeys, C.Collaert, N.Thean, A.2018-12-11T16:45:48Z2018-12-11T16:45:48Z2017-01-03info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObjecthttp://dx.doi.org/10.1109/S3S.2016.78043932016 SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2016.http://hdl.handle.net/11449/16941910.1109/S3S.2016.78043932-s2.0-85011256377Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPeng2016 SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2016info:eu-repo/semantics/openAccess2021-10-23T21:47:05Zoai:repositorio.unesp.br:11449/169419Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462021-10-23T21:47:05Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Impact of InxGa1-x composition and source Zn diffusion temperature on intrinsic voltage gain in InGaAs TFETs |
title |
Impact of InxGa1-x composition and source Zn diffusion temperature on intrinsic voltage gain in InGaAs TFETs |
spellingShingle |
Impact of InxGa1-x composition and source Zn diffusion temperature on intrinsic voltage gain in InGaAs TFETs Bordallo, C. Analog III-Vmaterials Temperature effects TFET |
title_short |
Impact of InxGa1-x composition and source Zn diffusion temperature on intrinsic voltage gain in InGaAs TFETs |
title_full |
Impact of InxGa1-x composition and source Zn diffusion temperature on intrinsic voltage gain in InGaAs TFETs |
title_fullStr |
Impact of InxGa1-x composition and source Zn diffusion temperature on intrinsic voltage gain in InGaAs TFETs |
title_full_unstemmed |
Impact of InxGa1-x composition and source Zn diffusion temperature on intrinsic voltage gain in InGaAs TFETs |
title_sort |
Impact of InxGa1-x composition and source Zn diffusion temperature on intrinsic voltage gain in InGaAs TFETs |
author |
Bordallo, C. |
author_facet |
Bordallo, C. Martino, J. Agopian, P. [UNESP] Alian, A. Mols, Y. Rooyackers, R. Vandooren, A. Verhulst, A. Simoen, E. Claeys, C. Collaert, N. Thean, A. |
author_role |
author |
author2 |
Martino, J. Agopian, P. [UNESP] Alian, A. Mols, Y. Rooyackers, R. Vandooren, A. Verhulst, A. Simoen, E. Claeys, C. Collaert, N. Thean, A. |
author2_role |
author author author author author author author author author author author |
dc.contributor.none.fl_str_mv |
Imec Universidade de São Paulo (USP) Universidade Estadual Paulista (Unesp) KU Leuven |
dc.contributor.author.fl_str_mv |
Bordallo, C. Martino, J. Agopian, P. [UNESP] Alian, A. Mols, Y. Rooyackers, R. Vandooren, A. Verhulst, A. Simoen, E. Claeys, C. Collaert, N. Thean, A. |
dc.subject.por.fl_str_mv |
Analog III-Vmaterials Temperature effects TFET |
topic |
Analog III-Vmaterials Temperature effects TFET |
description |
This work reports for the first time on the experimental study of the intrinsic voltage gain of InGaAs nTFET. The influence of Indium/Gallium composition and Zn diffusion temperature is analyzed. For a higher Indium amount (In0.7Ga0.3As compared to In0.53Ga0.47As) the band to band tunneling (BTBT) is improved due to bandgap narrowing. A higher Zn diffusion temperature gives rise to a higher source doping, resulting in a smaller tunneling length, which also increases BTBT. In both devices the intrinsic voltage gain is improved. One interesting characteristic of these devices is that they present good analog performance at low voltages (VGS=VDS=0.6V), which is promising for low power/low voltage analog applications. High-temperature operation increases in all cases more the output conductance than the transconductance, resulting in a lower intrinsic voltage gain. |
publishDate |
2017 |
dc.date.none.fl_str_mv |
2017-01-03 2018-12-11T16:45:48Z 2018-12-11T16:45:48Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/conferenceObject |
format |
conferenceObject |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1109/S3S.2016.7804393 2016 SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2016. http://hdl.handle.net/11449/169419 10.1109/S3S.2016.7804393 2-s2.0-85011256377 |
url |
http://dx.doi.org/10.1109/S3S.2016.7804393 http://hdl.handle.net/11449/169419 |
identifier_str_mv |
2016 SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2016. 10.1109/S3S.2016.7804393 2-s2.0-85011256377 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
2016 SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2016 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1803047387865808896 |