Innovative low temperature plasma approach for deposition of alumina films
Autor(a) principal: | |
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Data de Publicação: | 2014 |
Outros Autores: | , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://www.scielo.br/scielo.php?pid=S1516-14392014000600008&script=sci_arttext http://hdl.handle.net/11449/130267 |
Resumo: | Alumina films were deposited from a new plasma method using aluminum acetylacetonate (AAA) powder as precursor. The AAA was sputtered in argon and oxygen plasma mixtures. It was investigated the effect of the oxygen proportion (O-2 %) on the properties of the coatings. Deposition rate was derived from the layer height measured by profilometry. The elemental composition and molecular structure of the films were determined by Rutherford backscattering and infrared spectroscopies, respectively. Grazing incidence X-ray diffraction was used to investigate the microstructure of the films while hardness was determined by nanoindentation technique. Inspections on the surface morphology and on the film composition were conducted associating scanning electron microscopy and energy dispersive spectroscopy. Incorporation of oxygen affects the plasma kinetics and consequently the properties of the coatings. As moderated concentrations of oxygen (<25%) are added, the structure is predominantly organic containing stoichiometric amorphous alumina. On the other hand, as high O-2 % (> 25%) are incorporated, the structure become rich in metallic aluminum with carbon rising at low proportions. The deposited layer is not homogeneous in thickness once the chemical composition of the precursor is changed by the action of the reactive oxygen plasma. Oxygen ablation on the film surface also contributes to the lack of homogeneity of the structure, especially as high oxygen proportions are imposed. Hardness data (0.5-2.0 GPa) corroborated the idea of an amorphous structure. Based on the results presented here it was possible to identify the oxygen concentration in the plasma atmosphere which mostly removed organics while preserving the stoichiometric alumina precipitation, subject of great relevance as one considers the reduction in the energy necessary for the creation of fully oxide coatings. |
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Innovative low temperature plasma approach for deposition of alumina filmsAluminaAluminum acetylacetonateReactive plasma sputteringCompositionStructureMorphologyAlumina films were deposited from a new plasma method using aluminum acetylacetonate (AAA) powder as precursor. The AAA was sputtered in argon and oxygen plasma mixtures. It was investigated the effect of the oxygen proportion (O-2 %) on the properties of the coatings. Deposition rate was derived from the layer height measured by profilometry. The elemental composition and molecular structure of the films were determined by Rutherford backscattering and infrared spectroscopies, respectively. Grazing incidence X-ray diffraction was used to investigate the microstructure of the films while hardness was determined by nanoindentation technique. Inspections on the surface morphology and on the film composition were conducted associating scanning electron microscopy and energy dispersive spectroscopy. Incorporation of oxygen affects the plasma kinetics and consequently the properties of the coatings. As moderated concentrations of oxygen (<25%) are added, the structure is predominantly organic containing stoichiometric amorphous alumina. On the other hand, as high O-2 % (> 25%) are incorporated, the structure become rich in metallic aluminum with carbon rising at low proportions. The deposited layer is not homogeneous in thickness once the chemical composition of the precursor is changed by the action of the reactive oxygen plasma. Oxygen ablation on the film surface also contributes to the lack of homogeneity of the structure, especially as high oxygen proportions are imposed. Hardness data (0.5-2.0 GPa) corroborated the idea of an amorphous structure. Based on the results presented here it was possible to identify the oxygen concentration in the plasma atmosphere which mostly removed organics while preserving the stoichiometric alumina precipitation, subject of great relevance as one considers the reduction in the energy necessary for the creation of fully oxide coatings.Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Departamento de Ciências Exatas e da Terra, Universidade Federal de São Paulo - UNIFESP, Rua Artur Riedel Eldorado, CEP 09972-970, Diadema, SP, BrasilDepartamento de Física Nuclear, Universidade de São Paulo - USP, Rua do Matão, Travessa R, 187, Cidade Universitária, CEP 05508-900, São Paulo, SP, BrasilDepartamento de Física Aplicada, Universidade de São Paulo - USP, Rua do Matão, Travessa R, 187, Cidade Universitária, CEP 05508-900, São Paulo, SP, Brasil.Laboratório de Plasmas Tecnológicos, Universidade Estadual Paulista - UNESP, Câmpus Experimental de Sorocaba, Avenida Três de Março, 211, Alto da Boa Vista, CEP 18087-180, Sorocaba, SP, Brasil.FAPESP: 2009/07604-3FAPESP: 2012/14708-2Univ Fed Sao Carlos, Dept Engenharia MaterialsUniversidade Estadual Paulista (Unesp)Universidade Federal de São Paulo (UNIFESP)Universidade de São Paulo (USP)Darriba Battaglin, Felipe Augusto [UNESP]Hosokawa, Ricardo Shindi [UNESP]Cruz, Nilson Cristino da [UNESP]Caseli, LucianoRangel, Elidiane Cipriano [UNESP]Silva, Tiago Fiorini daTabacniks, Manfredo Harri2015-11-03T15:30:50Z2015-11-03T15:30:50Z2014-11-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article1410-1419application/pdfhttp://www.scielo.br/scielo.php?pid=S1516-14392014000600008&script=sci_arttextMaterials Research-ibero-american Journal Of Materials. Sao Carlos: Univ Fed Sao Carlos, Dept Engenharia Materials, v. 17, n. 6, p. 1410-1419, 2014.1516-1439http://hdl.handle.net/11449/13026710.1590/1516-1439.283514S1516-14392014000600008WOS:000349766900007S1516-14392014000600008.pdf7157327220048138Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengMaterials Research-ibero-american Journal Of Materials1.1030,398info:eu-repo/semantics/openAccess2023-12-22T06:22:43Zoai:repositorio.unesp.br:11449/130267Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T21:00:56.669097Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Innovative low temperature plasma approach for deposition of alumina films |
title |
Innovative low temperature plasma approach for deposition of alumina films |
spellingShingle |
Innovative low temperature plasma approach for deposition of alumina films Darriba Battaglin, Felipe Augusto [UNESP] Alumina Aluminum acetylacetonate Reactive plasma sputtering Composition Structure Morphology |
title_short |
Innovative low temperature plasma approach for deposition of alumina films |
title_full |
Innovative low temperature plasma approach for deposition of alumina films |
title_fullStr |
Innovative low temperature plasma approach for deposition of alumina films |
title_full_unstemmed |
Innovative low temperature plasma approach for deposition of alumina films |
title_sort |
Innovative low temperature plasma approach for deposition of alumina films |
author |
Darriba Battaglin, Felipe Augusto [UNESP] |
author_facet |
Darriba Battaglin, Felipe Augusto [UNESP] Hosokawa, Ricardo Shindi [UNESP] Cruz, Nilson Cristino da [UNESP] Caseli, Luciano Rangel, Elidiane Cipriano [UNESP] Silva, Tiago Fiorini da Tabacniks, Manfredo Harri |
author_role |
author |
author2 |
Hosokawa, Ricardo Shindi [UNESP] Cruz, Nilson Cristino da [UNESP] Caseli, Luciano Rangel, Elidiane Cipriano [UNESP] Silva, Tiago Fiorini da Tabacniks, Manfredo Harri |
author2_role |
author author author author author author |
dc.contributor.none.fl_str_mv |
Universidade Estadual Paulista (Unesp) Universidade Federal de São Paulo (UNIFESP) Universidade de São Paulo (USP) |
dc.contributor.author.fl_str_mv |
Darriba Battaglin, Felipe Augusto [UNESP] Hosokawa, Ricardo Shindi [UNESP] Cruz, Nilson Cristino da [UNESP] Caseli, Luciano Rangel, Elidiane Cipriano [UNESP] Silva, Tiago Fiorini da Tabacniks, Manfredo Harri |
dc.subject.por.fl_str_mv |
Alumina Aluminum acetylacetonate Reactive plasma sputtering Composition Structure Morphology |
topic |
Alumina Aluminum acetylacetonate Reactive plasma sputtering Composition Structure Morphology |
description |
Alumina films were deposited from a new plasma method using aluminum acetylacetonate (AAA) powder as precursor. The AAA was sputtered in argon and oxygen plasma mixtures. It was investigated the effect of the oxygen proportion (O-2 %) on the properties of the coatings. Deposition rate was derived from the layer height measured by profilometry. The elemental composition and molecular structure of the films were determined by Rutherford backscattering and infrared spectroscopies, respectively. Grazing incidence X-ray diffraction was used to investigate the microstructure of the films while hardness was determined by nanoindentation technique. Inspections on the surface morphology and on the film composition were conducted associating scanning electron microscopy and energy dispersive spectroscopy. Incorporation of oxygen affects the plasma kinetics and consequently the properties of the coatings. As moderated concentrations of oxygen (<25%) are added, the structure is predominantly organic containing stoichiometric amorphous alumina. On the other hand, as high O-2 % (> 25%) are incorporated, the structure become rich in metallic aluminum with carbon rising at low proportions. The deposited layer is not homogeneous in thickness once the chemical composition of the precursor is changed by the action of the reactive oxygen plasma. Oxygen ablation on the film surface also contributes to the lack of homogeneity of the structure, especially as high oxygen proportions are imposed. Hardness data (0.5-2.0 GPa) corroborated the idea of an amorphous structure. Based on the results presented here it was possible to identify the oxygen concentration in the plasma atmosphere which mostly removed organics while preserving the stoichiometric alumina precipitation, subject of great relevance as one considers the reduction in the energy necessary for the creation of fully oxide coatings. |
publishDate |
2014 |
dc.date.none.fl_str_mv |
2014-11-01 2015-11-03T15:30:50Z 2015-11-03T15:30:50Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://www.scielo.br/scielo.php?pid=S1516-14392014000600008&script=sci_arttext Materials Research-ibero-american Journal Of Materials. Sao Carlos: Univ Fed Sao Carlos, Dept Engenharia Materials, v. 17, n. 6, p. 1410-1419, 2014. 1516-1439 http://hdl.handle.net/11449/130267 10.1590/1516-1439.283514 S1516-14392014000600008 WOS:000349766900007 S1516-14392014000600008.pdf 7157327220048138 |
url |
http://www.scielo.br/scielo.php?pid=S1516-14392014000600008&script=sci_arttext http://hdl.handle.net/11449/130267 |
identifier_str_mv |
Materials Research-ibero-american Journal Of Materials. Sao Carlos: Univ Fed Sao Carlos, Dept Engenharia Materials, v. 17, n. 6, p. 1410-1419, 2014. 1516-1439 10.1590/1516-1439.283514 S1516-14392014000600008 WOS:000349766900007 S1516-14392014000600008.pdf 7157327220048138 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Materials Research-ibero-american Journal Of Materials 1.103 0,398 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
1410-1419 application/pdf |
dc.publisher.none.fl_str_mv |
Univ Fed Sao Carlos, Dept Engenharia Materials |
publisher.none.fl_str_mv |
Univ Fed Sao Carlos, Dept Engenharia Materials |
dc.source.none.fl_str_mv |
Web of Science reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
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1808129274237943808 |