Plasma-polymerized acetylene nanofilms modified by nitrogen ion implantation
Autor(a) principal: | |
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Data de Publicação: | 2013 |
Outros Autores: | , , , |
Tipo de documento: | Artigo de conferência |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1016/j.apsusc.2013.01.105 http://hdl.handle.net/11449/75659 |
Resumo: | Thin films were prepared by plasma enhanced chemical vapour deposition (PECVD) from a mixture of acetylene and argon, and post deposition-treated by plasma immersion ion implantation (PIII). The effect of PIII on the nanofilms properties was evaluated as a function of treatment time. The average thickness and roughness were diminished upon PIII. On the other hand, hardness (0.7-3.9 GPa) and elastic modulus (29-54 GPa) increased upon 60 min of ion bombardment. Such results are ascribed mainly to the densification of the film structure caused by the increment in the crosslinking degree with increasing the energy deposited in the films. Wettability of the samples, investigated by contact angle measurements, was reduced (from 64 to 21°) right after PIII. This result, attributed to the introduction of polar groups in the film structure, was not preserved as the sample was aged in atmosphere. After aging, contact angles were larger than 70° but still smaller than 90°. Although the wettability has decreased with aging, the hydrophilic character of the samples was preserved. For certain treatment times, nitrogen PIII turned the plasma-polymerized acetylene films smoother, denser, mechanically and tribologicaly more resistant than the as-deposited material. © 2013 Elsevier B.V. |
id |
UNSP_5b7b90d7cbe919eac25fdc0742c976ca |
---|---|
oai_identifier_str |
oai:repositorio.unesp.br:11449/75659 |
network_acronym_str |
UNSP |
network_name_str |
Repositório Institucional da UNESP |
repository_id_str |
2946 |
spelling |
Plasma-polymerized acetylene nanofilms modified by nitrogen ion implantationAcetyleneHardnessIon implantationPlasmaWettabilityCross-linking degreeFilm structureNano filmsNitrogen ion implantationsPlasma enhanced chemical vapour depositions (PECVD)Plasma immersion ion implantationPolar groupsTreatment timeContact angleDepositsIon bombardmentLightingNitrogenPlasma applicationsPlasma enhanced chemical vapor depositionPlasmasWettingNitrogen plasmaThin films were prepared by plasma enhanced chemical vapour deposition (PECVD) from a mixture of acetylene and argon, and post deposition-treated by plasma immersion ion implantation (PIII). The effect of PIII on the nanofilms properties was evaluated as a function of treatment time. The average thickness and roughness were diminished upon PIII. On the other hand, hardness (0.7-3.9 GPa) and elastic modulus (29-54 GPa) increased upon 60 min of ion bombardment. Such results are ascribed mainly to the densification of the film structure caused by the increment in the crosslinking degree with increasing the energy deposited in the films. Wettability of the samples, investigated by contact angle measurements, was reduced (from 64 to 21°) right after PIII. This result, attributed to the introduction of polar groups in the film structure, was not preserved as the sample was aged in atmosphere. After aging, contact angles were larger than 70° but still smaller than 90°. Although the wettability has decreased with aging, the hydrophilic character of the samples was preserved. For certain treatment times, nitrogen PIII turned the plasma-polymerized acetylene films smoother, denser, mechanically and tribologicaly more resistant than the as-deposited material. © 2013 Elsevier B.V.College of Technology CEETEPS, Rodovia Vereador Abel Fabrício Dias, 4010, Água Preta, 12455-010, Pindamonhangaba, SPPlasma Laboratory College of Engineering UNESP, 12516-410, Guaratinguetá, SPTechnological Plasma Laboratory UNESP, 18087-180, Sorocaba, SPPlasma Laboratory College of Engineering UNESP, 12516-410, Guaratinguetá, SPTechnological Plasma Laboratory UNESP, 18087-180, Sorocaba, SPCEETEPSUniversidade Estadual Paulista (Unesp)Santos, D. C RMota, Rogério Pinto [UNESP]Honda, R. Y. [UNESP]Cruz, N. C. [UNESP]Rangel, E. C. [UNESP]2014-05-27T11:29:41Z2014-05-27T11:29:41Z2013-06-15info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject88-93http://dx.doi.org/10.1016/j.apsusc.2013.01.105Applied Surface Science, v. 275, p. 88-93.0169-4332http://hdl.handle.net/11449/7565910.1016/j.apsusc.2013.01.105WOS:0003189773000172-s2.0-84877581539Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengApplied Surface Science4.4391,093info:eu-repo/semantics/openAccess2021-10-23T21:41:36Zoai:repositorio.unesp.br:11449/75659Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T19:18:19.194176Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Plasma-polymerized acetylene nanofilms modified by nitrogen ion implantation |
title |
Plasma-polymerized acetylene nanofilms modified by nitrogen ion implantation |
spellingShingle |
Plasma-polymerized acetylene nanofilms modified by nitrogen ion implantation Santos, D. C R Acetylene Hardness Ion implantation Plasma Wettability Cross-linking degree Film structure Nano films Nitrogen ion implantations Plasma enhanced chemical vapour depositions (PECVD) Plasma immersion ion implantation Polar groups Treatment time Contact angle Deposits Ion bombardment Lighting Nitrogen Plasma applications Plasma enhanced chemical vapor deposition Plasmas Wetting Nitrogen plasma |
title_short |
Plasma-polymerized acetylene nanofilms modified by nitrogen ion implantation |
title_full |
Plasma-polymerized acetylene nanofilms modified by nitrogen ion implantation |
title_fullStr |
Plasma-polymerized acetylene nanofilms modified by nitrogen ion implantation |
title_full_unstemmed |
Plasma-polymerized acetylene nanofilms modified by nitrogen ion implantation |
title_sort |
Plasma-polymerized acetylene nanofilms modified by nitrogen ion implantation |
author |
Santos, D. C R |
author_facet |
Santos, D. C R Mota, Rogério Pinto [UNESP] Honda, R. Y. [UNESP] Cruz, N. C. [UNESP] Rangel, E. C. [UNESP] |
author_role |
author |
author2 |
Mota, Rogério Pinto [UNESP] Honda, R. Y. [UNESP] Cruz, N. C. [UNESP] Rangel, E. C. [UNESP] |
author2_role |
author author author author |
dc.contributor.none.fl_str_mv |
CEETEPS Universidade Estadual Paulista (Unesp) |
dc.contributor.author.fl_str_mv |
Santos, D. C R Mota, Rogério Pinto [UNESP] Honda, R. Y. [UNESP] Cruz, N. C. [UNESP] Rangel, E. C. [UNESP] |
dc.subject.por.fl_str_mv |
Acetylene Hardness Ion implantation Plasma Wettability Cross-linking degree Film structure Nano films Nitrogen ion implantations Plasma enhanced chemical vapour depositions (PECVD) Plasma immersion ion implantation Polar groups Treatment time Contact angle Deposits Ion bombardment Lighting Nitrogen Plasma applications Plasma enhanced chemical vapor deposition Plasmas Wetting Nitrogen plasma |
topic |
Acetylene Hardness Ion implantation Plasma Wettability Cross-linking degree Film structure Nano films Nitrogen ion implantations Plasma enhanced chemical vapour depositions (PECVD) Plasma immersion ion implantation Polar groups Treatment time Contact angle Deposits Ion bombardment Lighting Nitrogen Plasma applications Plasma enhanced chemical vapor deposition Plasmas Wetting Nitrogen plasma |
description |
Thin films were prepared by plasma enhanced chemical vapour deposition (PECVD) from a mixture of acetylene and argon, and post deposition-treated by plasma immersion ion implantation (PIII). The effect of PIII on the nanofilms properties was evaluated as a function of treatment time. The average thickness and roughness were diminished upon PIII. On the other hand, hardness (0.7-3.9 GPa) and elastic modulus (29-54 GPa) increased upon 60 min of ion bombardment. Such results are ascribed mainly to the densification of the film structure caused by the increment in the crosslinking degree with increasing the energy deposited in the films. Wettability of the samples, investigated by contact angle measurements, was reduced (from 64 to 21°) right after PIII. This result, attributed to the introduction of polar groups in the film structure, was not preserved as the sample was aged in atmosphere. After aging, contact angles were larger than 70° but still smaller than 90°. Although the wettability has decreased with aging, the hydrophilic character of the samples was preserved. For certain treatment times, nitrogen PIII turned the plasma-polymerized acetylene films smoother, denser, mechanically and tribologicaly more resistant than the as-deposited material. © 2013 Elsevier B.V. |
publishDate |
2013 |
dc.date.none.fl_str_mv |
2013-06-15 2014-05-27T11:29:41Z 2014-05-27T11:29:41Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/conferenceObject |
format |
conferenceObject |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1016/j.apsusc.2013.01.105 Applied Surface Science, v. 275, p. 88-93. 0169-4332 http://hdl.handle.net/11449/75659 10.1016/j.apsusc.2013.01.105 WOS:000318977300017 2-s2.0-84877581539 |
url |
http://dx.doi.org/10.1016/j.apsusc.2013.01.105 http://hdl.handle.net/11449/75659 |
identifier_str_mv |
Applied Surface Science, v. 275, p. 88-93. 0169-4332 10.1016/j.apsusc.2013.01.105 WOS:000318977300017 2-s2.0-84877581539 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Applied Surface Science 4.439 1,093 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
88-93 |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1808129049341460480 |