New approach for removing the self-heating from MOSFET current using only DC characteristics

Detalhes bibliográficos
Autor(a) principal: Mori, C. A. B.
Data de Publicação: 2018
Outros Autores: Agopian, P. G. D. [UNESP], Martino, J. A., IEEE
Tipo de documento: Artigo de conferência
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://hdl.handle.net/11449/186353
Resumo: In this paper we report a new technique for removing the self-heating from the DC output characteristics of a MOSFET. In this method, the self-heating is eliminated from the drain current through a mathematical procedure, allowing a direct comparison of the curves with and without self-heating. We developed an analytical model considering the temperature increase in the channel of devices due to self-heating which causes the mobility degradation. To apply this technique, the inverse transistor efficiency method was employed to obtain the thermal resistance (using only DC measurements) and the temperature mobility degradation factor. In the worst case for tridimensional simulations of Silicon-On-Insulator FinFET devices, we obtained an error of 3.6% between the drain current with the self-heating eliminated through our method and the current without self heating. Additionally, when we applied the method to devices without self-heating, the drain current presented no changes, showing that the method can determine if a device is self-heating free or not.
id UNSP_61a919f520a16633c9d7964d589695db
oai_identifier_str oai:repositorio.unesp.br:11449/186353
network_acronym_str UNSP
network_name_str Repositório Institucional da UNESP
repository_id_str 2946
spelling New approach for removing the self-heating from MOSFET current using only DC characteristicsself-heating effectSilicon-On-InsulatorFinFETIn this paper we report a new technique for removing the self-heating from the DC output characteristics of a MOSFET. In this method, the self-heating is eliminated from the drain current through a mathematical procedure, allowing a direct comparison of the curves with and without self-heating. We developed an analytical model considering the temperature increase in the channel of devices due to self-heating which causes the mobility degradation. To apply this technique, the inverse transistor efficiency method was employed to obtain the thermal resistance (using only DC measurements) and the temperature mobility degradation factor. In the worst case for tridimensional simulations of Silicon-On-Insulator FinFET devices, we obtained an error of 3.6% between the drain current with the self-heating eliminated through our method and the current without self heating. Additionally, when we applied the method to devices without self-heating, the drain current presented no changes, showing that the method can determine if a device is self-heating free or not.Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Univ Sao Paulo, PSI, LSI, Sao Paulo, BrazilSao Paulo State Univ UNESP, Sao Joao Da Boa Vista, BrazilSao Paulo State Univ UNESP, Sao Joao Da Boa Vista, BrazilIeeeUniversidade de São Paulo (USP)Universidade Estadual Paulista (Unesp)Mori, C. A. B.Agopian, P. G. D. [UNESP]Martino, J. A.IEEE2019-10-04T19:12:11Z2019-10-04T19:12:11Z2018-01-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject32018 Ieee Soi-3d-subthreshold Microelectronics Technology Unified Conference (s3s). New York: Ieee, 3 p., 2018.2573-5926http://hdl.handle.net/11449/186353WOS:000462960700051Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPeng2018 Ieee Soi-3d-subthreshold Microelectronics Technology Unified Conference (s3s)info:eu-repo/semantics/openAccess2021-10-22T22:23:42Zoai:repositorio.unesp.br:11449/186353Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T21:20:16.198737Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv New approach for removing the self-heating from MOSFET current using only DC characteristics
title New approach for removing the self-heating from MOSFET current using only DC characteristics
spellingShingle New approach for removing the self-heating from MOSFET current using only DC characteristics
Mori, C. A. B.
self-heating effect
Silicon-On-Insulator
FinFET
title_short New approach for removing the self-heating from MOSFET current using only DC characteristics
title_full New approach for removing the self-heating from MOSFET current using only DC characteristics
title_fullStr New approach for removing the self-heating from MOSFET current using only DC characteristics
title_full_unstemmed New approach for removing the self-heating from MOSFET current using only DC characteristics
title_sort New approach for removing the self-heating from MOSFET current using only DC characteristics
author Mori, C. A. B.
author_facet Mori, C. A. B.
Agopian, P. G. D. [UNESP]
Martino, J. A.
IEEE
author_role author
author2 Agopian, P. G. D. [UNESP]
Martino, J. A.
IEEE
author2_role author
author
author
dc.contributor.none.fl_str_mv Universidade de São Paulo (USP)
Universidade Estadual Paulista (Unesp)
dc.contributor.author.fl_str_mv Mori, C. A. B.
Agopian, P. G. D. [UNESP]
Martino, J. A.
IEEE
dc.subject.por.fl_str_mv self-heating effect
Silicon-On-Insulator
FinFET
topic self-heating effect
Silicon-On-Insulator
FinFET
description In this paper we report a new technique for removing the self-heating from the DC output characteristics of a MOSFET. In this method, the self-heating is eliminated from the drain current through a mathematical procedure, allowing a direct comparison of the curves with and without self-heating. We developed an analytical model considering the temperature increase in the channel of devices due to self-heating which causes the mobility degradation. To apply this technique, the inverse transistor efficiency method was employed to obtain the thermal resistance (using only DC measurements) and the temperature mobility degradation factor. In the worst case for tridimensional simulations of Silicon-On-Insulator FinFET devices, we obtained an error of 3.6% between the drain current with the self-heating eliminated through our method and the current without self heating. Additionally, when we applied the method to devices without self-heating, the drain current presented no changes, showing that the method can determine if a device is self-heating free or not.
publishDate 2018
dc.date.none.fl_str_mv 2018-01-01
2019-10-04T19:12:11Z
2019-10-04T19:12:11Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/conferenceObject
format conferenceObject
status_str publishedVersion
dc.identifier.uri.fl_str_mv 2018 Ieee Soi-3d-subthreshold Microelectronics Technology Unified Conference (s3s). New York: Ieee, 3 p., 2018.
2573-5926
http://hdl.handle.net/11449/186353
WOS:000462960700051
identifier_str_mv 2018 Ieee Soi-3d-subthreshold Microelectronics Technology Unified Conference (s3s). New York: Ieee, 3 p., 2018.
2573-5926
WOS:000462960700051
url http://hdl.handle.net/11449/186353
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 2018 Ieee Soi-3d-subthreshold Microelectronics Technology Unified Conference (s3s)
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 3
dc.publisher.none.fl_str_mv Ieee
publisher.none.fl_str_mv Ieee
dc.source.none.fl_str_mv Web of Science
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
_version_ 1808129310997872640