Temperature influence on analog figures-of-merit of nanosheet nMOSFET devices for sub-7nm technology node
Autor(a) principal: | |
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Data de Publicação: | 2020 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo de conferência |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1109/EUROSOI-ULIS49407.2020.9365565 http://hdl.handle.net/11449/206092 |
Resumo: | This work analyzes the impact of temperature on the Analog figures of Merit of vertically stacked nanosheet nMOSFETs. The excellent electrostatic control between gate and channel results in a strong reduction of the short channel effect, as expected. The analog parameters like the intrinsic voltage gain, transistor efficiency and Early voltage are analyzed as a function of temperature. A high intrinsic voltage gain and a weak temperature dependence are observed, mainly at strong inversion region. The transistor efficiency and subthreshold swing maintain their value close to the theoretical limit. |
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Repositório Institucional da UNESP |
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Temperature influence on analog figures-of-merit of nanosheet nMOSFET devices for sub-7nm technology nodeAnalog operationMOSFETNanosheets (NS)This work analyzes the impact of temperature on the Analog figures of Merit of vertically stacked nanosheet nMOSFETs. The excellent electrostatic control between gate and channel results in a strong reduction of the short channel effect, as expected. The analog parameters like the intrinsic voltage gain, transistor efficiency and Early voltage are analyzed as a function of temperature. A high intrinsic voltage gain and a weak temperature dependence are observed, mainly at strong inversion region. The transistor efficiency and subthreshold swing maintain their value close to the theoretical limit.LSI/PSI/USP University of Sao PauloImecUNESP Sao Paulo State UniversityUNESP Sao Paulo State UniversityUniversidade de São Paulo (USP)ImecUniversidade Estadual Paulista (Unesp)Silva, V. C.P.Perina, W. F.Martino, J. A. [UNESP]Simoen, E.Veloso, A.Agopian, P. G.D.2021-06-25T10:26:24Z2021-06-25T10:26:24Z2020-09-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObjecthttp://dx.doi.org/10.1109/EUROSOI-ULIS49407.2020.93655652020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2020.http://hdl.handle.net/11449/20609210.1109/EUROSOI-ULIS49407.2020.93655652-s2.0-85102973717Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPeng2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2020info:eu-repo/semantics/openAccess2021-10-22T20:56:18Zoai:repositorio.unesp.br:11449/206092Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462021-10-22T20:56:18Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Temperature influence on analog figures-of-merit of nanosheet nMOSFET devices for sub-7nm technology node |
title |
Temperature influence on analog figures-of-merit of nanosheet nMOSFET devices for sub-7nm technology node |
spellingShingle |
Temperature influence on analog figures-of-merit of nanosheet nMOSFET devices for sub-7nm technology node Silva, V. C.P. Analog operation MOSFET Nanosheets (NS) |
title_short |
Temperature influence on analog figures-of-merit of nanosheet nMOSFET devices for sub-7nm technology node |
title_full |
Temperature influence on analog figures-of-merit of nanosheet nMOSFET devices for sub-7nm technology node |
title_fullStr |
Temperature influence on analog figures-of-merit of nanosheet nMOSFET devices for sub-7nm technology node |
title_full_unstemmed |
Temperature influence on analog figures-of-merit of nanosheet nMOSFET devices for sub-7nm technology node |
title_sort |
Temperature influence on analog figures-of-merit of nanosheet nMOSFET devices for sub-7nm technology node |
author |
Silva, V. C.P. |
author_facet |
Silva, V. C.P. Perina, W. F. Martino, J. A. [UNESP] Simoen, E. Veloso, A. Agopian, P. G.D. |
author_role |
author |
author2 |
Perina, W. F. Martino, J. A. [UNESP] Simoen, E. Veloso, A. Agopian, P. G.D. |
author2_role |
author author author author author |
dc.contributor.none.fl_str_mv |
Universidade de São Paulo (USP) Imec Universidade Estadual Paulista (Unesp) |
dc.contributor.author.fl_str_mv |
Silva, V. C.P. Perina, W. F. Martino, J. A. [UNESP] Simoen, E. Veloso, A. Agopian, P. G.D. |
dc.subject.por.fl_str_mv |
Analog operation MOSFET Nanosheets (NS) |
topic |
Analog operation MOSFET Nanosheets (NS) |
description |
This work analyzes the impact of temperature on the Analog figures of Merit of vertically stacked nanosheet nMOSFETs. The excellent electrostatic control between gate and channel results in a strong reduction of the short channel effect, as expected. The analog parameters like the intrinsic voltage gain, transistor efficiency and Early voltage are analyzed as a function of temperature. A high intrinsic voltage gain and a weak temperature dependence are observed, mainly at strong inversion region. The transistor efficiency and subthreshold swing maintain their value close to the theoretical limit. |
publishDate |
2020 |
dc.date.none.fl_str_mv |
2020-09-01 2021-06-25T10:26:24Z 2021-06-25T10:26:24Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/conferenceObject |
format |
conferenceObject |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1109/EUROSOI-ULIS49407.2020.9365565 2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2020. http://hdl.handle.net/11449/206092 10.1109/EUROSOI-ULIS49407.2020.9365565 2-s2.0-85102973717 |
url |
http://dx.doi.org/10.1109/EUROSOI-ULIS49407.2020.9365565 http://hdl.handle.net/11449/206092 |
identifier_str_mv |
2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2020. 10.1109/EUROSOI-ULIS49407.2020.9365565 2-s2.0-85102973717 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2020 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1799965558816374784 |