Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
Autor(a) principal: | |
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Data de Publicação: | 2020 |
Outros Autores: | , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.3390/polym12112692 http://hdl.handle.net/11449/210567 |
Resumo: | Eugenol (4-Allyl-2-methoxyphenol) is the main constituent of clove oil. In addition to being widely used as a condiment, it has been recognized as a powerful bactericide. Owing to that, Eugenol has been used in several applications including odontology and as a conservative for food products. Aiming at the development of natural bactericide coatings, in this work, using an atmospheric pressure plasma in a dielectric barrier discharge (DBD) reactor Eugenol was deposited on stainless steel substrate, with argon as a carrier gas. The discharge power supply was a transformer at 14.4 kV peak-to-peak voltage and 60 Hz frequency. Operating with a gas flow rate at 4 L/min, the active power was around 1.2 W. The maximum plasma electron temperature of the plasma with monomers was about 1.5 eV, estimated by visible emission spectroscopy using a local thermodynamic equilibrium approach. The study also comprehended the analysis of the film structure, aging, and thermal stability using infrared reflectance spectroscopy, and its thicknesses and roughness by profilometry. The thickness of the films was in the range of 1000 to 2400 nm with a roughness of up to 800 nm with good adhesion on the substrate. The FTIR result shows a stable coating with a chemical structure similar to that of the monomer. Aging analysis showed that the film does not degrade, even after exposing the film for 120 days in ambient air and for 1.0 h under a high thermal UV-lamp. |
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Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating CharacterizationsEugenolplasmadielectric barrier dischargeEugenol (4-Allyl-2-methoxyphenol) is the main constituent of clove oil. In addition to being widely used as a condiment, it has been recognized as a powerful bactericide. Owing to that, Eugenol has been used in several applications including odontology and as a conservative for food products. Aiming at the development of natural bactericide coatings, in this work, using an atmospheric pressure plasma in a dielectric barrier discharge (DBD) reactor Eugenol was deposited on stainless steel substrate, with argon as a carrier gas. The discharge power supply was a transformer at 14.4 kV peak-to-peak voltage and 60 Hz frequency. Operating with a gas flow rate at 4 L/min, the active power was around 1.2 W. The maximum plasma electron temperature of the plasma with monomers was about 1.5 eV, estimated by visible emission spectroscopy using a local thermodynamic equilibrium approach. The study also comprehended the analysis of the film structure, aging, and thermal stability using infrared reflectance spectroscopy, and its thicknesses and roughness by profilometry. The thickness of the films was in the range of 1000 to 2400 nm with a roughness of up to 800 nm with good adhesion on the substrate. The FTIR result shows a stable coating with a chemical structure similar to that of the monomer. Aging analysis showed that the film does not degrade, even after exposing the film for 120 days in ambient air and for 1.0 h under a high thermal UV-lamp.Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Bahir Dar Univ, Coll Sci, Dept Chem, Bahir Dar 79, EthiopiaSao Paulo State Univ, Inst Sci & Technol, Lab Technol Plasmas, BR-18087180 Sorocaba, SP, BrazilSao Paulo State Univ, Lab Plasma & Applicat, Campus Guaratingueta, BR-12516410 Guaratingueta, SP, BrazilSao Paulo State Univ, Inst Sci & Technol, Lab Technol Plasmas, BR-18087180 Sorocaba, SP, BrazilSao Paulo State Univ, Lab Plasma & Applicat, Campus Guaratingueta, BR-12516410 Guaratingueta, SP, BrazilFAPESP: 190896/2015-9FAPESP: 302992/2017-0MdpiBahir Dar UnivUniversidade Estadual Paulista (Unesp)Getnet, Tsegaye Gashaw [UNESP]Kayama, Milton E. [UNESP]Rangel, Elidiane C. [UNESP]Cruz, Nilson C. [UNESP]2021-06-25T22:04:37Z2021-06-25T22:04:37Z2020-11-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article16http://dx.doi.org/10.3390/polym12112692Polymers. Basel: Mdpi, v. 12, n. 11, 16 p., 2020.http://hdl.handle.net/11449/21056710.3390/polym12112692WOS:000594515900001Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengPolymersinfo:eu-repo/semantics/openAccess2021-10-23T21:37:43Zoai:repositorio.unesp.br:11449/210567Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T17:46:38.745549Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations |
title |
Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations |
spellingShingle |
Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations Getnet, Tsegaye Gashaw [UNESP] Eugenol plasma dielectric barrier discharge |
title_short |
Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations |
title_full |
Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations |
title_fullStr |
Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations |
title_full_unstemmed |
Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations |
title_sort |
Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations |
author |
Getnet, Tsegaye Gashaw [UNESP] |
author_facet |
Getnet, Tsegaye Gashaw [UNESP] Kayama, Milton E. [UNESP] Rangel, Elidiane C. [UNESP] Cruz, Nilson C. [UNESP] |
author_role |
author |
author2 |
Kayama, Milton E. [UNESP] Rangel, Elidiane C. [UNESP] Cruz, Nilson C. [UNESP] |
author2_role |
author author author |
dc.contributor.none.fl_str_mv |
Bahir Dar Univ Universidade Estadual Paulista (Unesp) |
dc.contributor.author.fl_str_mv |
Getnet, Tsegaye Gashaw [UNESP] Kayama, Milton E. [UNESP] Rangel, Elidiane C. [UNESP] Cruz, Nilson C. [UNESP] |
dc.subject.por.fl_str_mv |
Eugenol plasma dielectric barrier discharge |
topic |
Eugenol plasma dielectric barrier discharge |
description |
Eugenol (4-Allyl-2-methoxyphenol) is the main constituent of clove oil. In addition to being widely used as a condiment, it has been recognized as a powerful bactericide. Owing to that, Eugenol has been used in several applications including odontology and as a conservative for food products. Aiming at the development of natural bactericide coatings, in this work, using an atmospheric pressure plasma in a dielectric barrier discharge (DBD) reactor Eugenol was deposited on stainless steel substrate, with argon as a carrier gas. The discharge power supply was a transformer at 14.4 kV peak-to-peak voltage and 60 Hz frequency. Operating with a gas flow rate at 4 L/min, the active power was around 1.2 W. The maximum plasma electron temperature of the plasma with monomers was about 1.5 eV, estimated by visible emission spectroscopy using a local thermodynamic equilibrium approach. The study also comprehended the analysis of the film structure, aging, and thermal stability using infrared reflectance spectroscopy, and its thicknesses and roughness by profilometry. The thickness of the films was in the range of 1000 to 2400 nm with a roughness of up to 800 nm with good adhesion on the substrate. The FTIR result shows a stable coating with a chemical structure similar to that of the monomer. Aging analysis showed that the film does not degrade, even after exposing the film for 120 days in ambient air and for 1.0 h under a high thermal UV-lamp. |
publishDate |
2020 |
dc.date.none.fl_str_mv |
2020-11-01 2021-06-25T22:04:37Z 2021-06-25T22:04:37Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.3390/polym12112692 Polymers. Basel: Mdpi, v. 12, n. 11, 16 p., 2020. http://hdl.handle.net/11449/210567 10.3390/polym12112692 WOS:000594515900001 |
url |
http://dx.doi.org/10.3390/polym12112692 http://hdl.handle.net/11449/210567 |
identifier_str_mv |
Polymers. Basel: Mdpi, v. 12, n. 11, 16 p., 2020. 10.3390/polym12112692 WOS:000594515900001 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Polymers |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
16 |
dc.publisher.none.fl_str_mv |
Mdpi |
publisher.none.fl_str_mv |
Mdpi |
dc.source.none.fl_str_mv |
Web of Science reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1808128856122458112 |