Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations

Detalhes bibliográficos
Autor(a) principal: Getnet, Tsegaye Gashaw [UNESP]
Data de Publicação: 2020
Outros Autores: Kayama, Milton E. [UNESP], Rangel, Elidiane C. [UNESP], Cruz, Nilson C. [UNESP]
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://dx.doi.org/10.3390/polym12112692
http://hdl.handle.net/11449/210567
Resumo: Eugenol (4-Allyl-2-methoxyphenol) is the main constituent of clove oil. In addition to being widely used as a condiment, it has been recognized as a powerful bactericide. Owing to that, Eugenol has been used in several applications including odontology and as a conservative for food products. Aiming at the development of natural bactericide coatings, in this work, using an atmospheric pressure plasma in a dielectric barrier discharge (DBD) reactor Eugenol was deposited on stainless steel substrate, with argon as a carrier gas. The discharge power supply was a transformer at 14.4 kV peak-to-peak voltage and 60 Hz frequency. Operating with a gas flow rate at 4 L/min, the active power was around 1.2 W. The maximum plasma electron temperature of the plasma with monomers was about 1.5 eV, estimated by visible emission spectroscopy using a local thermodynamic equilibrium approach. The study also comprehended the analysis of the film structure, aging, and thermal stability using infrared reflectance spectroscopy, and its thicknesses and roughness by profilometry. The thickness of the films was in the range of 1000 to 2400 nm with a roughness of up to 800 nm with good adhesion on the substrate. The FTIR result shows a stable coating with a chemical structure similar to that of the monomer. Aging analysis showed that the film does not degrade, even after exposing the film for 120 days in ambient air and for 1.0 h under a high thermal UV-lamp.
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spelling Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating CharacterizationsEugenolplasmadielectric barrier dischargeEugenol (4-Allyl-2-methoxyphenol) is the main constituent of clove oil. In addition to being widely used as a condiment, it has been recognized as a powerful bactericide. Owing to that, Eugenol has been used in several applications including odontology and as a conservative for food products. Aiming at the development of natural bactericide coatings, in this work, using an atmospheric pressure plasma in a dielectric barrier discharge (DBD) reactor Eugenol was deposited on stainless steel substrate, with argon as a carrier gas. The discharge power supply was a transformer at 14.4 kV peak-to-peak voltage and 60 Hz frequency. Operating with a gas flow rate at 4 L/min, the active power was around 1.2 W. The maximum plasma electron temperature of the plasma with monomers was about 1.5 eV, estimated by visible emission spectroscopy using a local thermodynamic equilibrium approach. The study also comprehended the analysis of the film structure, aging, and thermal stability using infrared reflectance spectroscopy, and its thicknesses and roughness by profilometry. The thickness of the films was in the range of 1000 to 2400 nm with a roughness of up to 800 nm with good adhesion on the substrate. The FTIR result shows a stable coating with a chemical structure similar to that of the monomer. Aging analysis showed that the film does not degrade, even after exposing the film for 120 days in ambient air and for 1.0 h under a high thermal UV-lamp.Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Bahir Dar Univ, Coll Sci, Dept Chem, Bahir Dar 79, EthiopiaSao Paulo State Univ, Inst Sci & Technol, Lab Technol Plasmas, BR-18087180 Sorocaba, SP, BrazilSao Paulo State Univ, Lab Plasma & Applicat, Campus Guaratingueta, BR-12516410 Guaratingueta, SP, BrazilSao Paulo State Univ, Inst Sci & Technol, Lab Technol Plasmas, BR-18087180 Sorocaba, SP, BrazilSao Paulo State Univ, Lab Plasma & Applicat, Campus Guaratingueta, BR-12516410 Guaratingueta, SP, BrazilFAPESP: 190896/2015-9FAPESP: 302992/2017-0MdpiBahir Dar UnivUniversidade Estadual Paulista (Unesp)Getnet, Tsegaye Gashaw [UNESP]Kayama, Milton E. [UNESP]Rangel, Elidiane C. [UNESP]Cruz, Nilson C. [UNESP]2021-06-25T22:04:37Z2021-06-25T22:04:37Z2020-11-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article16http://dx.doi.org/10.3390/polym12112692Polymers. Basel: Mdpi, v. 12, n. 11, 16 p., 2020.http://hdl.handle.net/11449/21056710.3390/polym12112692WOS:000594515900001Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengPolymersinfo:eu-repo/semantics/openAccess2021-10-23T21:37:43Zoai:repositorio.unesp.br:11449/210567Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T17:46:38.745549Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
title Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
spellingShingle Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
Getnet, Tsegaye Gashaw [UNESP]
Eugenol
plasma
dielectric barrier discharge
title_short Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
title_full Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
title_fullStr Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
title_full_unstemmed Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
title_sort Thin Film Deposition by Atmospheric Pressure Dielectric Barrier Discharges Containing Eugenol: Discharge and Coating Characterizations
author Getnet, Tsegaye Gashaw [UNESP]
author_facet Getnet, Tsegaye Gashaw [UNESP]
Kayama, Milton E. [UNESP]
Rangel, Elidiane C. [UNESP]
Cruz, Nilson C. [UNESP]
author_role author
author2 Kayama, Milton E. [UNESP]
Rangel, Elidiane C. [UNESP]
Cruz, Nilson C. [UNESP]
author2_role author
author
author
dc.contributor.none.fl_str_mv Bahir Dar Univ
Universidade Estadual Paulista (Unesp)
dc.contributor.author.fl_str_mv Getnet, Tsegaye Gashaw [UNESP]
Kayama, Milton E. [UNESP]
Rangel, Elidiane C. [UNESP]
Cruz, Nilson C. [UNESP]
dc.subject.por.fl_str_mv Eugenol
plasma
dielectric barrier discharge
topic Eugenol
plasma
dielectric barrier discharge
description Eugenol (4-Allyl-2-methoxyphenol) is the main constituent of clove oil. In addition to being widely used as a condiment, it has been recognized as a powerful bactericide. Owing to that, Eugenol has been used in several applications including odontology and as a conservative for food products. Aiming at the development of natural bactericide coatings, in this work, using an atmospheric pressure plasma in a dielectric barrier discharge (DBD) reactor Eugenol was deposited on stainless steel substrate, with argon as a carrier gas. The discharge power supply was a transformer at 14.4 kV peak-to-peak voltage and 60 Hz frequency. Operating with a gas flow rate at 4 L/min, the active power was around 1.2 W. The maximum plasma electron temperature of the plasma with monomers was about 1.5 eV, estimated by visible emission spectroscopy using a local thermodynamic equilibrium approach. The study also comprehended the analysis of the film structure, aging, and thermal stability using infrared reflectance spectroscopy, and its thicknesses and roughness by profilometry. The thickness of the films was in the range of 1000 to 2400 nm with a roughness of up to 800 nm with good adhesion on the substrate. The FTIR result shows a stable coating with a chemical structure similar to that of the monomer. Aging analysis showed that the film does not degrade, even after exposing the film for 120 days in ambient air and for 1.0 h under a high thermal UV-lamp.
publishDate 2020
dc.date.none.fl_str_mv 2020-11-01
2021-06-25T22:04:37Z
2021-06-25T22:04:37Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://dx.doi.org/10.3390/polym12112692
Polymers. Basel: Mdpi, v. 12, n. 11, 16 p., 2020.
http://hdl.handle.net/11449/210567
10.3390/polym12112692
WOS:000594515900001
url http://dx.doi.org/10.3390/polym12112692
http://hdl.handle.net/11449/210567
identifier_str_mv Polymers. Basel: Mdpi, v. 12, n. 11, 16 p., 2020.
10.3390/polym12112692
WOS:000594515900001
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Polymers
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 16
dc.publisher.none.fl_str_mv Mdpi
publisher.none.fl_str_mv Mdpi
dc.source.none.fl_str_mv Web of Science
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
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