Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis
Autor(a) principal: | |
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Data de Publicação: | 2011 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1590/S1516-14392011005000032 http://hdl.handle.net/11449/22850 |
Resumo: | In this paper SiOx thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiOx thin films were deposited at different oxygen concentrations in the Ar+O-2 plasma forming gas. After deposition processes, SiOx thin films were characterized by profilometry, energy dispersive spectroscopy (EDS), optical microscopy and scanning electron microscopy (SEM). Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O-2 increased the bond strength to (32.8 +/- 5.4) MPa. This value has not been achieved by traditional methods. |
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Repositório Institucional da UNESP |
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Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental ProsthesisY-TZPdental materialthin filmssilicon oxideIn this paper SiOx thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiOx thin films were deposited at different oxygen concentrations in the Ar+O-2 plasma forming gas. After deposition processes, SiOx thin films were characterized by profilometry, energy dispersive spectroscopy (EDS), optical microscopy and scanning electron microscopy (SEM). Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O-2 increased the bond strength to (32.8 +/- 5.4) MPa. This value has not been achieved by traditional methods.Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)São Paulo State Univ UNESP, Sch Dent, BR-12245000 Sao Jose Dos Campos, SP, BrazilTechnol Inst Aeronaut ITA, Plasma Sci & Technol Lab, BR-12228900 Sao Jose Dos Campos, SP, BrazilFed Univ Paraiba UFPB, Dept Restorat Dent, BR-58039080 Joao Pessoa, Paraiba, BrazilSão Paulo State Univ UNESP, Sch Dent, BR-12245000 Sao Jose Dos Campos, SP, BrazilUniversidade Federal de São Carlos (UFSCar), Dept Engenharia MaterialsUniversidade Estadual Paulista (Unesp)Instituto Tecnológico de Aeronáutica (ITA)Universidade Federal da Paraíba (UFPB)Calvacanti de Queiroz, Jose Renato [UNESP]Duarte, Diego Alexandrede Assuncao e Souza, Rodrigo OthavioFissmer, Sara FernandaMassi, MarcosBottino, Marco Antonio [UNESP]2014-05-20T14:05:09Z2014-05-20T14:05:09Z2011-04-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article212-216http://dx.doi.org/10.1590/S1516-14392011005000032Materials Research-ibero-american Journal of Materials. São Carlos: Universidade Federal de São Carlos (UFSCar), Dept Engenharia Materials, v. 14, n. 2, p. 212-216, 2011.1516-1439http://hdl.handle.net/11449/2285010.1590/S1516-14392011005000032S1516-14392011000200012WOS:000292723200012S1516-14392011000200012.pdf9234456003563666Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengMaterials Research-ibero-american Journal of Materials1.1030,398info:eu-repo/semantics/openAccess2021-10-23T17:16:46Zoai:repositorio.unesp.br:11449/22850Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462021-10-23T17:16:46Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis |
title |
Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis |
spellingShingle |
Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis Calvacanti de Queiroz, Jose Renato [UNESP] Y-TZP dental material thin films silicon oxide |
title_short |
Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis |
title_full |
Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis |
title_fullStr |
Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis |
title_full_unstemmed |
Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis |
title_sort |
Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis |
author |
Calvacanti de Queiroz, Jose Renato [UNESP] |
author_facet |
Calvacanti de Queiroz, Jose Renato [UNESP] Duarte, Diego Alexandre de Assuncao e Souza, Rodrigo Othavio Fissmer, Sara Fernanda Massi, Marcos Bottino, Marco Antonio [UNESP] |
author_role |
author |
author2 |
Duarte, Diego Alexandre de Assuncao e Souza, Rodrigo Othavio Fissmer, Sara Fernanda Massi, Marcos Bottino, Marco Antonio [UNESP] |
author2_role |
author author author author author |
dc.contributor.none.fl_str_mv |
Universidade Estadual Paulista (Unesp) Instituto Tecnológico de Aeronáutica (ITA) Universidade Federal da Paraíba (UFPB) |
dc.contributor.author.fl_str_mv |
Calvacanti de Queiroz, Jose Renato [UNESP] Duarte, Diego Alexandre de Assuncao e Souza, Rodrigo Othavio Fissmer, Sara Fernanda Massi, Marcos Bottino, Marco Antonio [UNESP] |
dc.subject.por.fl_str_mv |
Y-TZP dental material thin films silicon oxide |
topic |
Y-TZP dental material thin films silicon oxide |
description |
In this paper SiOx thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiOx thin films were deposited at different oxygen concentrations in the Ar+O-2 plasma forming gas. After deposition processes, SiOx thin films were characterized by profilometry, energy dispersive spectroscopy (EDS), optical microscopy and scanning electron microscopy (SEM). Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O-2 increased the bond strength to (32.8 +/- 5.4) MPa. This value has not been achieved by traditional methods. |
publishDate |
2011 |
dc.date.none.fl_str_mv |
2011-04-01 2014-05-20T14:05:09Z 2014-05-20T14:05:09Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1590/S1516-14392011005000032 Materials Research-ibero-american Journal of Materials. São Carlos: Universidade Federal de São Carlos (UFSCar), Dept Engenharia Materials, v. 14, n. 2, p. 212-216, 2011. 1516-1439 http://hdl.handle.net/11449/22850 10.1590/S1516-14392011005000032 S1516-14392011000200012 WOS:000292723200012 S1516-14392011000200012.pdf 9234456003563666 |
url |
http://dx.doi.org/10.1590/S1516-14392011005000032 http://hdl.handle.net/11449/22850 |
identifier_str_mv |
Materials Research-ibero-american Journal of Materials. São Carlos: Universidade Federal de São Carlos (UFSCar), Dept Engenharia Materials, v. 14, n. 2, p. 212-216, 2011. 1516-1439 10.1590/S1516-14392011005000032 S1516-14392011000200012 WOS:000292723200012 S1516-14392011000200012.pdf 9234456003563666 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Materials Research-ibero-american Journal of Materials 1.103 0,398 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
212-216 |
dc.publisher.none.fl_str_mv |
Universidade Federal de São Carlos (UFSCar), Dept Engenharia Materials |
publisher.none.fl_str_mv |
Universidade Federal de São Carlos (UFSCar), Dept Engenharia Materials |
dc.source.none.fl_str_mv |
Web of Science reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1803650067430637568 |