Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering
Autor(a) principal: | |
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Data de Publicação: | 2015 |
Outros Autores: | , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Materials research (São Carlos. Online) |
Texto Completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000800030 |
Resumo: | Zirconium silicon nitride (ZrSiN) thin films were deposited by reactive magnetron sputtering in order to verify the silicon influence on coating morphology and mechanical properties. The Si/(Zr+Si) ratio was adjusted between 0 to 15% just modifying the power applied on the silicon target. Only peaks associated to ZrN crystalline structure were observed in XRD analysis, since Si3N4 phase was amorphous. All samples have (111) preferred orientation, but there is a peak intensity reduction and a broadening increase for the sample with the highest Si/(Zr+Si) ratio (15%), demonstrating a considerable loss of crystallinity or grain size reduction (about 8 nm calculated by Scherrer). It was also observed that the I(200)/I(111) ratio increases with silicon addition. Chemical composition and thickness of the coatings were determined by RBS analysis. No significant changes in nanohardness with increasing Si content were found. The morphology observed by FEG-SEM presents non columnar characteristics for thin films with silicon addition. The set of results suggests that Si addition is restricting the columnar growth of ZrN thin films. This conclusion is justified by the fact that Si contributes to increase the ZrN grains nucleation during the sputtering process. |
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Materials research (São Carlos. Online) |
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Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputteringthin filmsZrSiNmagnetron sputteringnanohardnessRBSZirconium silicon nitride (ZrSiN) thin films were deposited by reactive magnetron sputtering in order to verify the silicon influence on coating morphology and mechanical properties. The Si/(Zr+Si) ratio was adjusted between 0 to 15% just modifying the power applied on the silicon target. Only peaks associated to ZrN crystalline structure were observed in XRD analysis, since Si3N4 phase was amorphous. All samples have (111) preferred orientation, but there is a peak intensity reduction and a broadening increase for the sample with the highest Si/(Zr+Si) ratio (15%), demonstrating a considerable loss of crystallinity or grain size reduction (about 8 nm calculated by Scherrer). It was also observed that the I(200)/I(111) ratio increases with silicon addition. Chemical composition and thickness of the coatings were determined by RBS analysis. No significant changes in nanohardness with increasing Si content were found. The morphology observed by FEG-SEM presents non columnar characteristics for thin films with silicon addition. The set of results suggests that Si addition is restricting the columnar growth of ZrN thin films. This conclusion is justified by the fact that Si contributes to increase the ZrN grains nucleation during the sputtering process.ABM, ABC, ABPol2015-12-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000800030Materials Research v.18 suppl.2 2015reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1516-1439.336214info:eu-repo/semantics/openAccessFreitas,Flávio Gustavo RibeiroHübler,RobertoSoares,GabrielConceição,Amanda Gardênia SantosVitória,Edson ReisCarvalho,Renata GomesTentardini,Eduardo Kirinuseng2016-01-04T00:00:00Zoai:scielo:S1516-14392015000800030Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2016-01-04T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false |
dc.title.none.fl_str_mv |
Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering |
title |
Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering |
spellingShingle |
Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering Freitas,Flávio Gustavo Ribeiro thin films ZrSiN magnetron sputtering nanohardness RBS |
title_short |
Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering |
title_full |
Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering |
title_fullStr |
Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering |
title_full_unstemmed |
Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering |
title_sort |
Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering |
author |
Freitas,Flávio Gustavo Ribeiro |
author_facet |
Freitas,Flávio Gustavo Ribeiro Hübler,Roberto Soares,Gabriel Conceição,Amanda Gardênia Santos Vitória,Edson Reis Carvalho,Renata Gomes Tentardini,Eduardo Kirinus |
author_role |
author |
author2 |
Hübler,Roberto Soares,Gabriel Conceição,Amanda Gardênia Santos Vitória,Edson Reis Carvalho,Renata Gomes Tentardini,Eduardo Kirinus |
author2_role |
author author author author author author |
dc.contributor.author.fl_str_mv |
Freitas,Flávio Gustavo Ribeiro Hübler,Roberto Soares,Gabriel Conceição,Amanda Gardênia Santos Vitória,Edson Reis Carvalho,Renata Gomes Tentardini,Eduardo Kirinus |
dc.subject.por.fl_str_mv |
thin films ZrSiN magnetron sputtering nanohardness RBS |
topic |
thin films ZrSiN magnetron sputtering nanohardness RBS |
description |
Zirconium silicon nitride (ZrSiN) thin films were deposited by reactive magnetron sputtering in order to verify the silicon influence on coating morphology and mechanical properties. The Si/(Zr+Si) ratio was adjusted between 0 to 15% just modifying the power applied on the silicon target. Only peaks associated to ZrN crystalline structure were observed in XRD analysis, since Si3N4 phase was amorphous. All samples have (111) preferred orientation, but there is a peak intensity reduction and a broadening increase for the sample with the highest Si/(Zr+Si) ratio (15%), demonstrating a considerable loss of crystallinity or grain size reduction (about 8 nm calculated by Scherrer). It was also observed that the I(200)/I(111) ratio increases with silicon addition. Chemical composition and thickness of the coatings were determined by RBS analysis. No significant changes in nanohardness with increasing Si content were found. The morphology observed by FEG-SEM presents non columnar characteristics for thin films with silicon addition. The set of results suggests that Si addition is restricting the columnar growth of ZrN thin films. This conclusion is justified by the fact that Si contributes to increase the ZrN grains nucleation during the sputtering process. |
publishDate |
2015 |
dc.date.none.fl_str_mv |
2015-12-01 |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000800030 |
url |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000800030 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1590/1516-1439.336214 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
text/html |
dc.publisher.none.fl_str_mv |
ABM, ABC, ABPol |
publisher.none.fl_str_mv |
ABM, ABC, ABPol |
dc.source.none.fl_str_mv |
Materials Research v.18 suppl.2 2015 reponame:Materials research (São Carlos. Online) instname:Universidade Federal de São Carlos (UFSCAR) instacron:ABM ABC ABPOL |
instname_str |
Universidade Federal de São Carlos (UFSCAR) |
instacron_str |
ABM ABC ABPOL |
institution |
ABM ABC ABPOL |
reponame_str |
Materials research (São Carlos. Online) |
collection |
Materials research (São Carlos. Online) |
repository.name.fl_str_mv |
Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR) |
repository.mail.fl_str_mv |
dedz@power.ufscar.br |
_version_ |
1754212666642006016 |