Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering

Detalhes bibliográficos
Autor(a) principal: Freitas,Flávio Gustavo Ribeiro
Data de Publicação: 2015
Outros Autores: Hübler,Roberto, Soares,Gabriel, Conceição,Amanda Gardênia Santos, Vitória,Edson Reis, Carvalho,Renata Gomes, Tentardini,Eduardo Kirinus
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Materials research (São Carlos. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000800030
Resumo: Zirconium silicon nitride (ZrSiN) thin films were deposited by reactive magnetron sputtering in order to verify the silicon influence on coating morphology and mechanical properties. The Si/(Zr+Si) ratio was adjusted between 0 to 15% just modifying the power applied on the silicon target. Only peaks associated to ZrN crystalline structure were observed in XRD analysis, since Si3N4 phase was amorphous. All samples have (111) preferred orientation, but there is a peak intensity reduction and a broadening increase for the sample with the highest Si/(Zr+Si) ratio (15%), demonstrating a considerable loss of crystallinity or grain size reduction (about 8 nm calculated by Scherrer). It was also observed that the I(200)/I(111) ratio increases with silicon addition. Chemical composition and thickness of the coatings were determined by RBS analysis. No significant changes in nanohardness with increasing Si content were found. The morphology observed by FEG-SEM presents non columnar characteristics for thin films with silicon addition. The set of results suggests that Si addition is restricting the columnar growth of ZrN thin films. This conclusion is justified by the fact that Si contributes to increase the ZrN grains nucleation during the sputtering process.
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spelling Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputteringthin filmsZrSiNmagnetron sputteringnanohardnessRBSZirconium silicon nitride (ZrSiN) thin films were deposited by reactive magnetron sputtering in order to verify the silicon influence on coating morphology and mechanical properties. The Si/(Zr+Si) ratio was adjusted between 0 to 15% just modifying the power applied on the silicon target. Only peaks associated to ZrN crystalline structure were observed in XRD analysis, since Si3N4 phase was amorphous. All samples have (111) preferred orientation, but there is a peak intensity reduction and a broadening increase for the sample with the highest Si/(Zr+Si) ratio (15%), demonstrating a considerable loss of crystallinity or grain size reduction (about 8 nm calculated by Scherrer). It was also observed that the I(200)/I(111) ratio increases with silicon addition. Chemical composition and thickness of the coatings were determined by RBS analysis. No significant changes in nanohardness with increasing Si content were found. The morphology observed by FEG-SEM presents non columnar characteristics for thin films with silicon addition. The set of results suggests that Si addition is restricting the columnar growth of ZrN thin films. This conclusion is justified by the fact that Si contributes to increase the ZrN grains nucleation during the sputtering process.ABM, ABC, ABPol2015-12-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000800030Materials Research v.18 suppl.2 2015reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1516-1439.336214info:eu-repo/semantics/openAccessFreitas,Flávio Gustavo RibeiroHübler,RobertoSoares,GabrielConceição,Amanda Gardênia SantosVitória,Edson ReisCarvalho,Renata GomesTentardini,Eduardo Kirinuseng2016-01-04T00:00:00Zoai:scielo:S1516-14392015000800030Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2016-01-04T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false
dc.title.none.fl_str_mv Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering
title Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering
spellingShingle Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering
Freitas,Flávio Gustavo Ribeiro
thin films
ZrSiN
magnetron sputtering
nanohardness
RBS
title_short Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering
title_full Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering
title_fullStr Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering
title_full_unstemmed Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering
title_sort Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering
author Freitas,Flávio Gustavo Ribeiro
author_facet Freitas,Flávio Gustavo Ribeiro
Hübler,Roberto
Soares,Gabriel
Conceição,Amanda Gardênia Santos
Vitória,Edson Reis
Carvalho,Renata Gomes
Tentardini,Eduardo Kirinus
author_role author
author2 Hübler,Roberto
Soares,Gabriel
Conceição,Amanda Gardênia Santos
Vitória,Edson Reis
Carvalho,Renata Gomes
Tentardini,Eduardo Kirinus
author2_role author
author
author
author
author
author
dc.contributor.author.fl_str_mv Freitas,Flávio Gustavo Ribeiro
Hübler,Roberto
Soares,Gabriel
Conceição,Amanda Gardênia Santos
Vitória,Edson Reis
Carvalho,Renata Gomes
Tentardini,Eduardo Kirinus
dc.subject.por.fl_str_mv thin films
ZrSiN
magnetron sputtering
nanohardness
RBS
topic thin films
ZrSiN
magnetron sputtering
nanohardness
RBS
description Zirconium silicon nitride (ZrSiN) thin films were deposited by reactive magnetron sputtering in order to verify the silicon influence on coating morphology and mechanical properties. The Si/(Zr+Si) ratio was adjusted between 0 to 15% just modifying the power applied on the silicon target. Only peaks associated to ZrN crystalline structure were observed in XRD analysis, since Si3N4 phase was amorphous. All samples have (111) preferred orientation, but there is a peak intensity reduction and a broadening increase for the sample with the highest Si/(Zr+Si) ratio (15%), demonstrating a considerable loss of crystallinity or grain size reduction (about 8 nm calculated by Scherrer). It was also observed that the I(200)/I(111) ratio increases with silicon addition. Chemical composition and thickness of the coatings were determined by RBS analysis. No significant changes in nanohardness with increasing Si content were found. The morphology observed by FEG-SEM presents non columnar characteristics for thin films with silicon addition. The set of results suggests that Si addition is restricting the columnar growth of ZrN thin films. This conclusion is justified by the fact that Si contributes to increase the ZrN grains nucleation during the sputtering process.
publishDate 2015
dc.date.none.fl_str_mv 2015-12-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000800030
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000800030
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/1516-1439.336214
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv ABM, ABC, ABPol
publisher.none.fl_str_mv ABM, ABC, ABPol
dc.source.none.fl_str_mv Materials Research v.18 suppl.2 2015
reponame:Materials research (São Carlos. Online)
instname:Universidade Federal de São Carlos (UFSCAR)
instacron:ABM ABC ABPOL
instname_str Universidade Federal de São Carlos (UFSCAR)
instacron_str ABM ABC ABPOL
institution ABM ABC ABPOL
reponame_str Materials research (São Carlos. Online)
collection Materials research (São Carlos. Online)
repository.name.fl_str_mv Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)
repository.mail.fl_str_mv dedz@power.ufscar.br
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