Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface
Autor(a) principal: | |
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Data de Publicação: | 2012 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo de conferência |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1149/1.4704931 http://hdl.handle.net/11449/73842 |
Resumo: | This work studied the influence of the rare earth (Ce3+ and Ce4+) elements concentration in polysiloxane flints deposited on copper by dip-coating process, and evaluated their resistance in a 3.5 wt.% NaCl medium. Classical electrochemistry techniques were used as open circuit potential, polarization curves and electrochemical impedance spectroscopy. The results revealed that by adding low concentration of Ce4+ ions, the coating prevents the electrolyte uptake any longer retarding the substrate degradation consequently. ©The Electrochemical Society. |
id |
UNSP_f35a99d49f60d4be991da72f20833a02 |
---|---|
oai_identifier_str |
oai:repositorio.unesp.br:11449/73842 |
network_acronym_str |
UNSP |
network_name_str |
Repositório Institucional da UNESP |
repository_id_str |
2946 |
spelling |
Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surfaceCopper surfaceDip-coating processLow concentrationsOpen circuit potentialPolarization curvesSubstrate degradationCopperDegradationElectrochemical impedance spectroscopyElectrochemistrySilicon compoundsSiliconesCoatingsThis work studied the influence of the rare earth (Ce3+ and Ce4+) elements concentration in polysiloxane flints deposited on copper by dip-coating process, and evaluated their resistance in a 3.5 wt.% NaCl medium. Classical electrochemistry techniques were used as open circuit potential, polarization curves and electrochemical impedance spectroscopy. The results revealed that by adding low concentration of Ce4+ ions, the coating prevents the electrolyte uptake any longer retarding the substrate degradation consequently. ©The Electrochemical Society.Faculdade de Ciências Exatas e Tecnologia UFGD, Dourados, MSDepartamento de Engenharia Química Escola Politécnica USP, São Paulo, SPDepartamento de Físico-Química Instituto de Química UNESP, Araraquara, SPDepartamento de Físico-Química Instituto de Química UNESP, Araraquara, SPUniversidade Federal da Grande Dourados (UFGD)Universidade de São Paulo (USP)Universidade Estadual Paulista (Unesp)Basho, É N.Sakai, R. T.Da Cruz, F. M D L [UNESP]De Melo, H. G.Benedetti, Assis Vicente [UNESP]Suegama, P. H.2014-05-27T11:27:19Z2014-05-27T11:27:19Z2012-12-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject3-7http://dx.doi.org/10.1149/1.4704931ECS Transactions, v. 43, n. 1, p. 3-7, 2012.1938-58621938-6737http://hdl.handle.net/11449/7384210.1149/1.47049312-s2.0-84879436516Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengECS Transactions0,2250,225info:eu-repo/semantics/openAccess2021-10-23T21:44:18Zoai:repositorio.unesp.br:11449/73842Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462021-10-23T21:44:18Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface |
title |
Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface |
spellingShingle |
Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface Basho, É N. Copper surface Dip-coating process Low concentrations Open circuit potential Polarization curves Substrate degradation Copper Degradation Electrochemical impedance spectroscopy Electrochemistry Silicon compounds Silicones Coatings |
title_short |
Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface |
title_full |
Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface |
title_fullStr |
Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface |
title_full_unstemmed |
Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface |
title_sort |
Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface |
author |
Basho, É N. |
author_facet |
Basho, É N. Sakai, R. T. Da Cruz, F. M D L [UNESP] De Melo, H. G. Benedetti, Assis Vicente [UNESP] Suegama, P. H. |
author_role |
author |
author2 |
Sakai, R. T. Da Cruz, F. M D L [UNESP] De Melo, H. G. Benedetti, Assis Vicente [UNESP] Suegama, P. H. |
author2_role |
author author author author author |
dc.contributor.none.fl_str_mv |
Universidade Federal da Grande Dourados (UFGD) Universidade de São Paulo (USP) Universidade Estadual Paulista (Unesp) |
dc.contributor.author.fl_str_mv |
Basho, É N. Sakai, R. T. Da Cruz, F. M D L [UNESP] De Melo, H. G. Benedetti, Assis Vicente [UNESP] Suegama, P. H. |
dc.subject.por.fl_str_mv |
Copper surface Dip-coating process Low concentrations Open circuit potential Polarization curves Substrate degradation Copper Degradation Electrochemical impedance spectroscopy Electrochemistry Silicon compounds Silicones Coatings |
topic |
Copper surface Dip-coating process Low concentrations Open circuit potential Polarization curves Substrate degradation Copper Degradation Electrochemical impedance spectroscopy Electrochemistry Silicon compounds Silicones Coatings |
description |
This work studied the influence of the rare earth (Ce3+ and Ce4+) elements concentration in polysiloxane flints deposited on copper by dip-coating process, and evaluated their resistance in a 3.5 wt.% NaCl medium. Classical electrochemistry techniques were used as open circuit potential, polarization curves and electrochemical impedance spectroscopy. The results revealed that by adding low concentration of Ce4+ ions, the coating prevents the electrolyte uptake any longer retarding the substrate degradation consequently. ©The Electrochemical Society. |
publishDate |
2012 |
dc.date.none.fl_str_mv |
2012-12-01 2014-05-27T11:27:19Z 2014-05-27T11:27:19Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/conferenceObject |
format |
conferenceObject |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1149/1.4704931 ECS Transactions, v. 43, n. 1, p. 3-7, 2012. 1938-5862 1938-6737 http://hdl.handle.net/11449/73842 10.1149/1.4704931 2-s2.0-84879436516 |
url |
http://dx.doi.org/10.1149/1.4704931 http://hdl.handle.net/11449/73842 |
identifier_str_mv |
ECS Transactions, v. 43, n. 1, p. 3-7, 2012. 1938-5862 1938-6737 10.1149/1.4704931 2-s2.0-84879436516 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
ECS Transactions 0,225 0,225 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
3-7 |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1803046917912920064 |