Visible and near IR photoluminescent response of nc-Si: er thin films produced by rf sputtering

Detalhes bibliográficos
Autor(a) principal: Cerqueira, M. F.
Data de Publicação: 2004
Outros Autores: Monteiro, T., Stepikhova, M., Losurdo, M., Soares, M. J., Gomes, I. Tarroso
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/1822/13952
Resumo: In this contribution we present the Visible and near IR photoluminescence (PL) analysis of Er doped nanocrystalline silicon thin films produced by rf magnetron sputtering method. Efficient photoluminescence was observed in these structures in both visible and 1.54µm wavelength regions. We show the strong influence of the presence of nanocrystalline fraction in films on their luminescence efficiency at 1.54 μm that has been studied on the series of specially prepared samples with the different crystallinity, i.e. percentage and sizes of Si nanocrystals. The mechanism involved in the visible photoluminescence of highly a crystalline nc-Si:H consisting of about 7 nm silicon nanocrystals embedded in an amorphous matrix is discussed.
id RCAP_389963bc4889aaa7262f0bc5bcfbd35e
oai_identifier_str oai:repositorium.sdum.uminho.pt:1822/13952
network_acronym_str RCAP
network_name_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository_id_str
spelling Visible and near IR photoluminescent response of nc-Si: er thin films produced by rf sputteringVisible PLIR PLEr dopingNanocrystalline siliconScience & TechnologyIn this contribution we present the Visible and near IR photoluminescence (PL) analysis of Er doped nanocrystalline silicon thin films produced by rf magnetron sputtering method. Efficient photoluminescence was observed in these structures in both visible and 1.54µm wavelength regions. We show the strong influence of the presence of nanocrystalline fraction in films on their luminescence efficiency at 1.54 μm that has been studied on the series of specially prepared samples with the different crystallinity, i.e. percentage and sizes of Si nanocrystals. The mechanism involved in the visible photoluminescence of highly a crystalline nc-Si:H consisting of about 7 nm silicon nanocrystals embedded in an amorphous matrix is discussed.IOP PublishingUniversidade do MinhoCerqueira, M. F.Monteiro, T.Stepikhova, M.Losurdo, M.Soares, M. J.Gomes, I. Tarroso20042004-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/13952eng0957-448410.1088/0957-4484/15/7/015http://iopscience.iop.org/0957-4484/15/7/015/pdf/0957-4484_15_7_015.pdfinfo:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T12:20:24ZPortal AgregadorONG
dc.title.none.fl_str_mv Visible and near IR photoluminescent response of nc-Si: er thin films produced by rf sputtering
title Visible and near IR photoluminescent response of nc-Si: er thin films produced by rf sputtering
spellingShingle Visible and near IR photoluminescent response of nc-Si: er thin films produced by rf sputtering
Cerqueira, M. F.
Visible PL
IR PL
Er doping
Nanocrystalline silicon
Science & Technology
title_short Visible and near IR photoluminescent response of nc-Si: er thin films produced by rf sputtering
title_full Visible and near IR photoluminescent response of nc-Si: er thin films produced by rf sputtering
title_fullStr Visible and near IR photoluminescent response of nc-Si: er thin films produced by rf sputtering
title_full_unstemmed Visible and near IR photoluminescent response of nc-Si: er thin films produced by rf sputtering
title_sort Visible and near IR photoluminescent response of nc-Si: er thin films produced by rf sputtering
author Cerqueira, M. F.
author_facet Cerqueira, M. F.
Monteiro, T.
Stepikhova, M.
Losurdo, M.
Soares, M. J.
Gomes, I. Tarroso
author_role author
author2 Monteiro, T.
Stepikhova, M.
Losurdo, M.
Soares, M. J.
Gomes, I. Tarroso
author2_role author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade do Minho
dc.contributor.author.fl_str_mv Cerqueira, M. F.
Monteiro, T.
Stepikhova, M.
Losurdo, M.
Soares, M. J.
Gomes, I. Tarroso
dc.subject.por.fl_str_mv Visible PL
IR PL
Er doping
Nanocrystalline silicon
Science & Technology
topic Visible PL
IR PL
Er doping
Nanocrystalline silicon
Science & Technology
description In this contribution we present the Visible and near IR photoluminescence (PL) analysis of Er doped nanocrystalline silicon thin films produced by rf magnetron sputtering method. Efficient photoluminescence was observed in these structures in both visible and 1.54µm wavelength regions. We show the strong influence of the presence of nanocrystalline fraction in films on their luminescence efficiency at 1.54 μm that has been studied on the series of specially prepared samples with the different crystallinity, i.e. percentage and sizes of Si nanocrystals. The mechanism involved in the visible photoluminescence of highly a crystalline nc-Si:H consisting of about 7 nm silicon nanocrystals embedded in an amorphous matrix is discussed.
publishDate 2004
dc.date.none.fl_str_mv 2004
2004-01-01T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/1822/13952
url http://hdl.handle.net/1822/13952
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 0957-4484
10.1088/0957-4484/15/7/015
http://iopscience.iop.org/0957-4484/15/7/015/pdf/0957-4484_15_7_015.pdf
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv IOP Publishing
publisher.none.fl_str_mv IOP Publishing
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv
repository.mail.fl_str_mv
_version_ 1777303734125068288

Registros relacionados