Microstructural Analysis of AgIn5VI8 (VI: S, Se, Te) Ternary Semiconductors by X-Ray Diffraction

Detalhes bibliográficos
Autor(a) principal: Fermin,José R.
Data de Publicação: 2019
Outros Autores: Rincón,Carlos Durante, Castro,Jaime A.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Materials research (São Carlos. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392019000500226
Resumo: This work is a study of the microstructural properties of the polycrystalline ternary compounds AgIn5S8, AgIn5Se8, and AgIn5Te8 by X-ray diffraction technique (XRD). The full-width-half-maximum (FWHM) of the XRD profile is measured as function of the diffraction angle and used to estimate the microstructural parameters. In general, a microstructural characterization by XRD is principally performed by Strain/Size analysis based on the modified Scherrer formula, which in turn, allows for mean grain size and average microstrain to be computed. However, when applied to polycrystalline bulk semiconductors, the modified Scherrer formula gives grain sizes of the order of a few hundreds of nanometers, which is not usually observed in bulk materials. Instead, a new theoretical scheme with misfit dislocations and plastic deformations would be used to calculate the grain size into a bulk. Assuming that these dislocations are of elastic origin, we were able to calculate the misfit dislocations density as function of the elastic constants of the materials. With this, the modified Scherrer formula is corrected to explain the additional XRD line broadening. All microstructure parameters of our samples increase as the atomic radius of the VI-element increases, with elastic constants similar to related semiconducting compounds.
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spelling Microstructural Analysis of AgIn5VI8 (VI: S, Se, Te) Ternary Semiconductors by X-Ray DiffractionStrain/Size analysisModified Scherrer Equationmicrostructural parametersternary semiconductors AgIn5VI8Poisson ratioThis work is a study of the microstructural properties of the polycrystalline ternary compounds AgIn5S8, AgIn5Se8, and AgIn5Te8 by X-ray diffraction technique (XRD). The full-width-half-maximum (FWHM) of the XRD profile is measured as function of the diffraction angle and used to estimate the microstructural parameters. In general, a microstructural characterization by XRD is principally performed by Strain/Size analysis based on the modified Scherrer formula, which in turn, allows for mean grain size and average microstrain to be computed. However, when applied to polycrystalline bulk semiconductors, the modified Scherrer formula gives grain sizes of the order of a few hundreds of nanometers, which is not usually observed in bulk materials. Instead, a new theoretical scheme with misfit dislocations and plastic deformations would be used to calculate the grain size into a bulk. Assuming that these dislocations are of elastic origin, we were able to calculate the misfit dislocations density as function of the elastic constants of the materials. With this, the modified Scherrer formula is corrected to explain the additional XRD line broadening. All microstructure parameters of our samples increase as the atomic radius of the VI-element increases, with elastic constants similar to related semiconducting compounds.ABM, ABC, ABPol2019-01-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392019000500226Materials Research v.22 n.5 2019reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1980-5373-mr-2019-0752info:eu-repo/semantics/openAccessFermin,José R.Rincón,Carlos DuranteCastro,Jaime A.eng2019-11-12T00:00:00Zoai:scielo:S1516-14392019000500226Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2019-11-12T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false
dc.title.none.fl_str_mv Microstructural Analysis of AgIn5VI8 (VI: S, Se, Te) Ternary Semiconductors by X-Ray Diffraction
title Microstructural Analysis of AgIn5VI8 (VI: S, Se, Te) Ternary Semiconductors by X-Ray Diffraction
spellingShingle Microstructural Analysis of AgIn5VI8 (VI: S, Se, Te) Ternary Semiconductors by X-Ray Diffraction
Fermin,José R.
Strain/Size analysis
Modified Scherrer Equation
microstructural parameters
ternary semiconductors AgIn5VI8
Poisson ratio
title_short Microstructural Analysis of AgIn5VI8 (VI: S, Se, Te) Ternary Semiconductors by X-Ray Diffraction
title_full Microstructural Analysis of AgIn5VI8 (VI: S, Se, Te) Ternary Semiconductors by X-Ray Diffraction
title_fullStr Microstructural Analysis of AgIn5VI8 (VI: S, Se, Te) Ternary Semiconductors by X-Ray Diffraction
title_full_unstemmed Microstructural Analysis of AgIn5VI8 (VI: S, Se, Te) Ternary Semiconductors by X-Ray Diffraction
title_sort Microstructural Analysis of AgIn5VI8 (VI: S, Se, Te) Ternary Semiconductors by X-Ray Diffraction
author Fermin,José R.
author_facet Fermin,José R.
Rincón,Carlos Durante
Castro,Jaime A.
author_role author
author2 Rincón,Carlos Durante
Castro,Jaime A.
author2_role author
author
dc.contributor.author.fl_str_mv Fermin,José R.
Rincón,Carlos Durante
Castro,Jaime A.
dc.subject.por.fl_str_mv Strain/Size analysis
Modified Scherrer Equation
microstructural parameters
ternary semiconductors AgIn5VI8
Poisson ratio
topic Strain/Size analysis
Modified Scherrer Equation
microstructural parameters
ternary semiconductors AgIn5VI8
Poisson ratio
description This work is a study of the microstructural properties of the polycrystalline ternary compounds AgIn5S8, AgIn5Se8, and AgIn5Te8 by X-ray diffraction technique (XRD). The full-width-half-maximum (FWHM) of the XRD profile is measured as function of the diffraction angle and used to estimate the microstructural parameters. In general, a microstructural characterization by XRD is principally performed by Strain/Size analysis based on the modified Scherrer formula, which in turn, allows for mean grain size and average microstrain to be computed. However, when applied to polycrystalline bulk semiconductors, the modified Scherrer formula gives grain sizes of the order of a few hundreds of nanometers, which is not usually observed in bulk materials. Instead, a new theoretical scheme with misfit dislocations and plastic deformations would be used to calculate the grain size into a bulk. Assuming that these dislocations are of elastic origin, we were able to calculate the misfit dislocations density as function of the elastic constants of the materials. With this, the modified Scherrer formula is corrected to explain the additional XRD line broadening. All microstructure parameters of our samples increase as the atomic radius of the VI-element increases, with elastic constants similar to related semiconducting compounds.
publishDate 2019
dc.date.none.fl_str_mv 2019-01-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392019000500226
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392019000500226
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/1980-5373-mr-2019-0752
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv ABM, ABC, ABPol
publisher.none.fl_str_mv ABM, ABC, ABPol
dc.source.none.fl_str_mv Materials Research v.22 n.5 2019
reponame:Materials research (São Carlos. Online)
instname:Universidade Federal de São Carlos (UFSCAR)
instacron:ABM ABC ABPOL
instname_str Universidade Federal de São Carlos (UFSCAR)
instacron_str ABM ABC ABPOL
institution ABM ABC ABPOL
reponame_str Materials research (São Carlos. Online)
collection Materials research (São Carlos. Online)
repository.name.fl_str_mv Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)
repository.mail.fl_str_mv dedz@power.ufscar.br
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