Optical and Structural Study of ZnO Thin Films Deposited by RF Magnetron Sputtering at Different Thicknesses: a Comparison with Single Crystal

Detalhes bibliográficos
Autor(a) principal: Jazmati,Abdul Kader
Data de Publicação: 2018
Outros Autores: Abdallah,Bassam
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Materials research (São Carlos. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392018000300025
Resumo: Optical characterizations of preferred orientation (002) ZnO thin films, prepared by RF magnetron sputtering under pure argon plasma, with different thicknesses have been investigated, where grain size and resistivity increase with thickness. Energy band gap and refractive indices have been calculated. A correlation between band gap values and crystalline quality, which is improved with thickness, has been discussed. The calculated refractive indices of the thicker deposited films have increased as the thickness increases. Full width Half Maxima (FWHM) of band gap Photoluminescence (PL) emission decreases with thickness increasement due to quality improvement as it has been monitored by X-Ray Diffraction (XRD). A comparison between PL spectra of 1200 nm film and ZnO single crystal at low temperature is found to be similar.
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spelling Optical and Structural Study of ZnO Thin Films Deposited by RF Magnetron Sputtering at Different Thicknesses: a Comparison with Single CrystalThin filmsZinc oxidestructure propertiesPhotoluminescenceUV characteristicsOptical characterizations of preferred orientation (002) ZnO thin films, prepared by RF magnetron sputtering under pure argon plasma, with different thicknesses have been investigated, where grain size and resistivity increase with thickness. Energy band gap and refractive indices have been calculated. A correlation between band gap values and crystalline quality, which is improved with thickness, has been discussed. The calculated refractive indices of the thicker deposited films have increased as the thickness increases. Full width Half Maxima (FWHM) of band gap Photoluminescence (PL) emission decreases with thickness increasement due to quality improvement as it has been monitored by X-Ray Diffraction (XRD). A comparison between PL spectra of 1200 nm film and ZnO single crystal at low temperature is found to be similar.ABM, ABC, ABPol2018-01-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392018000300025Materials Research v.21 n.3 2018reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1980-5373-mr-2017-0821info:eu-repo/semantics/openAccessJazmati,Abdul KaderAbdallah,Bassameng2018-05-10T00:00:00Zoai:scielo:S1516-14392018000300025Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2018-05-10T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false
dc.title.none.fl_str_mv Optical and Structural Study of ZnO Thin Films Deposited by RF Magnetron Sputtering at Different Thicknesses: a Comparison with Single Crystal
title Optical and Structural Study of ZnO Thin Films Deposited by RF Magnetron Sputtering at Different Thicknesses: a Comparison with Single Crystal
spellingShingle Optical and Structural Study of ZnO Thin Films Deposited by RF Magnetron Sputtering at Different Thicknesses: a Comparison with Single Crystal
Jazmati,Abdul Kader
Thin films
Zinc oxide
structure properties
Photoluminescence
UV characteristics
title_short Optical and Structural Study of ZnO Thin Films Deposited by RF Magnetron Sputtering at Different Thicknesses: a Comparison with Single Crystal
title_full Optical and Structural Study of ZnO Thin Films Deposited by RF Magnetron Sputtering at Different Thicknesses: a Comparison with Single Crystal
title_fullStr Optical and Structural Study of ZnO Thin Films Deposited by RF Magnetron Sputtering at Different Thicknesses: a Comparison with Single Crystal
title_full_unstemmed Optical and Structural Study of ZnO Thin Films Deposited by RF Magnetron Sputtering at Different Thicknesses: a Comparison with Single Crystal
title_sort Optical and Structural Study of ZnO Thin Films Deposited by RF Magnetron Sputtering at Different Thicknesses: a Comparison with Single Crystal
author Jazmati,Abdul Kader
author_facet Jazmati,Abdul Kader
Abdallah,Bassam
author_role author
author2 Abdallah,Bassam
author2_role author
dc.contributor.author.fl_str_mv Jazmati,Abdul Kader
Abdallah,Bassam
dc.subject.por.fl_str_mv Thin films
Zinc oxide
structure properties
Photoluminescence
UV characteristics
topic Thin films
Zinc oxide
structure properties
Photoluminescence
UV characteristics
description Optical characterizations of preferred orientation (002) ZnO thin films, prepared by RF magnetron sputtering under pure argon plasma, with different thicknesses have been investigated, where grain size and resistivity increase with thickness. Energy band gap and refractive indices have been calculated. A correlation between band gap values and crystalline quality, which is improved with thickness, has been discussed. The calculated refractive indices of the thicker deposited films have increased as the thickness increases. Full width Half Maxima (FWHM) of band gap Photoluminescence (PL) emission decreases with thickness increasement due to quality improvement as it has been monitored by X-Ray Diffraction (XRD). A comparison between PL spectra of 1200 nm film and ZnO single crystal at low temperature is found to be similar.
publishDate 2018
dc.date.none.fl_str_mv 2018-01-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392018000300025
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392018000300025
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/1980-5373-mr-2017-0821
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv ABM, ABC, ABPol
publisher.none.fl_str_mv ABM, ABC, ABPol
dc.source.none.fl_str_mv Materials Research v.21 n.3 2018
reponame:Materials research (São Carlos. Online)
instname:Universidade Federal de São Carlos (UFSCAR)
instacron:ABM ABC ABPOL
instname_str Universidade Federal de São Carlos (UFSCAR)
instacron_str ABM ABC ABPOL
institution ABM ABC ABPOL
reponame_str Materials research (São Carlos. Online)
collection Materials research (São Carlos. Online)
repository.name.fl_str_mv Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)
repository.mail.fl_str_mv dedz@power.ufscar.br
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