Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS

Detalhes bibliográficos
Autor(a) principal: Merij,Abrão Chiaranda
Data de Publicação: 2015
Outros Autores: Sugahara,Tarcila, Martins,Gislene Valdete, Silva Sobrinho,Argemiro Soares da, Reis,Danieli Aparecida Pereira, Gonçalves,Polyana Alves Radi, Massi,Marcos
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Materials research (São Carlos. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000500904
Resumo: AbstractIn this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness.
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spelling Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMSadhesionCr interlayerHiPIMSSiC thin filmAbstractIn this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness.ABM, ABC, ABPol2015-10-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000500904Materials Research v.18 n.5 2015reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1516-1439.313114info:eu-repo/semantics/openAccessMerij,Abrão ChiarandaSugahara,TarcilaMartins,Gislene ValdeteSilva Sobrinho,Argemiro Soares daReis,Danieli Aparecida PereiraGonçalves,Polyana Alves RadiMassi,Marcoseng2015-10-19T00:00:00Zoai:scielo:S1516-14392015000500904Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2015-10-19T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false
dc.title.none.fl_str_mv Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
title Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
spellingShingle Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
Merij,Abrão Chiaranda
adhesion
Cr interlayer
HiPIMS
SiC thin film
title_short Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
title_full Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
title_fullStr Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
title_full_unstemmed Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
title_sort Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
author Merij,Abrão Chiaranda
author_facet Merij,Abrão Chiaranda
Sugahara,Tarcila
Martins,Gislene Valdete
Silva Sobrinho,Argemiro Soares da
Reis,Danieli Aparecida Pereira
Gonçalves,Polyana Alves Radi
Massi,Marcos
author_role author
author2 Sugahara,Tarcila
Martins,Gislene Valdete
Silva Sobrinho,Argemiro Soares da
Reis,Danieli Aparecida Pereira
Gonçalves,Polyana Alves Radi
Massi,Marcos
author2_role author
author
author
author
author
author
dc.contributor.author.fl_str_mv Merij,Abrão Chiaranda
Sugahara,Tarcila
Martins,Gislene Valdete
Silva Sobrinho,Argemiro Soares da
Reis,Danieli Aparecida Pereira
Gonçalves,Polyana Alves Radi
Massi,Marcos
dc.subject.por.fl_str_mv adhesion
Cr interlayer
HiPIMS
SiC thin film
topic adhesion
Cr interlayer
HiPIMS
SiC thin film
description AbstractIn this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness.
publishDate 2015
dc.date.none.fl_str_mv 2015-10-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000500904
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000500904
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/1516-1439.313114
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv ABM, ABC, ABPol
publisher.none.fl_str_mv ABM, ABC, ABPol
dc.source.none.fl_str_mv Materials Research v.18 n.5 2015
reponame:Materials research (São Carlos. Online)
instname:Universidade Federal de São Carlos (UFSCAR)
instacron:ABM ABC ABPOL
instname_str Universidade Federal de São Carlos (UFSCAR)
instacron_str ABM ABC ABPOL
institution ABM ABC ABPOL
reponame_str Materials research (São Carlos. Online)
collection Materials research (São Carlos. Online)
repository.name.fl_str_mv Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)
repository.mail.fl_str_mv dedz@power.ufscar.br
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