Caracteriza????o de filmes finos de ??xidos de ni??bio obtidos por sputtering reativo

Detalhes bibliográficos
Autor(a) principal: SCHEIDT, G.S
Data de Publicação: 2015
Outros Autores: SILVA JUNIOR, O.P.V., ARAUJO, E.G., PILLIS, M.F., CONGRESSO BRASILEIRO DE ENGENHARIA E CI??NCIA DOS MATERIAIS, 21.
Tipo de documento: Artigo de conferência
Título da fonte: Repositório Institucional do IPEN
Texto Completo: http://repositorio.ipen.br/handle/123456789/23468
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spelling 2015-02-09T11:55:56Z2015-04-02T03:34:13Z2015-02-09T11:55:56Z2015-04-02T03:34:13Z9-13 de novembro, 2014http://repositorio.ipen.br/handle/123456789/23468Submitted by Maria Eneide de Souza Araujo (mearaujo@ipen.br) on 2015-02-09T11:55:56Z No. of bitstreams: 1 20511.pdf: 174868 bytes, checksum: a97ecb8a23651ac5cd74930fbfb9ef32 (MD5)Made available in DSpace on 2015-02-09T11:55:56Z (GMT). No. of bitstreams: 1 20511.pdf: 174868 bytes, checksum: a97ecb8a23651ac5cd74930fbfb9ef32 (MD5)Made available in DSpace on 2015-04-02T03:34:13Z (GMT). No. of bitstreams: 2 license.txt: 1748 bytes, checksum: 8a4605be74aa9ea9d79846c1fba20a33 (MD5) 20511.pdf: 174868 bytes, checksum: a97ecb8a23651ac5cd74930fbfb9ef32 (MD5)795-802thin filmsniobium oxidessputteringrefractive indexoptical propertieschemical propertiescorrosion resistancesiliconboron silicatesellipsometryrutherford scatteringCaracteriza????o de filmes finos de ??xidos de ni??bio obtidos por sputtering reativoinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObjectCBECIMATNCuiab??, MTSCHEIDT, G.SSILVA JUNIOR, O.P.V.ARAUJO, E.G.PILLIS, M.F.CONGRESSO BRASILEIRO DE ENGENHARIA E CI??NCIA DOS MATERIAIS, 21.info:eu-repo/semantics/openAccessreponame:Repositório Institucional do IPENinstname:Instituto de Pesquisas Energéticas e Nucleares (IPEN)instacron:IPEN205112014SCHEIDT, G.SPILLIS, M.F.15-02Anais24381689758SILVA JUNIOR, O.P.V.:2438:-1:NARAUJO, E.G.:1689:-1:NPILLIS, M.F.:758:730:NLICENSElicense.txttext/plain1748http://repositorio.ipen.br/bitstream/123456789/23468/1/license.txt8a4605be74aa9ea9d79846c1fba20a33MD51ORIGINAL20511.pdfapplication/pdf174868http://repositorio.ipen.br/bitstream/123456789/23468/2/20511.pdfa97ecb8a23651ac5cd74930fbfb9ef32MD52123456789/234682016-06-10 17:31:51.94oai:repositorio.ipen.br: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Repositório InstitucionalPUBhttp://repositorio.ipen.br/oai/requestbibl@ipen.bropendoar:45102016-06-10T17:31:51Repositório Institucional do IPEN - Instituto de Pesquisas Energéticas e Nucleares (IPEN)false
dc.title.pt_BR.fl_str_mv Caracteriza????o de filmes finos de ??xidos de ni??bio obtidos por sputtering reativo
title Caracteriza????o de filmes finos de ??xidos de ni??bio obtidos por sputtering reativo
spellingShingle Caracteriza????o de filmes finos de ??xidos de ni??bio obtidos por sputtering reativo
SCHEIDT, G.S
thin films
niobium oxides
sputtering
refractive index
optical properties
chemical properties
corrosion resistance
silicon
boron silicates
ellipsometry
rutherford scattering
title_short Caracteriza????o de filmes finos de ??xidos de ni??bio obtidos por sputtering reativo
title_full Caracteriza????o de filmes finos de ??xidos de ni??bio obtidos por sputtering reativo
title_fullStr Caracteriza????o de filmes finos de ??xidos de ni??bio obtidos por sputtering reativo
title_full_unstemmed Caracteriza????o de filmes finos de ??xidos de ni??bio obtidos por sputtering reativo
title_sort Caracteriza????o de filmes finos de ??xidos de ni??bio obtidos por sputtering reativo
author SCHEIDT, G.S
author_facet SCHEIDT, G.S
SILVA JUNIOR, O.P.V.
ARAUJO, E.G.
PILLIS, M.F.
CONGRESSO BRASILEIRO DE ENGENHARIA E CI??NCIA DOS MATERIAIS, 21.
author_role author
author2 SILVA JUNIOR, O.P.V.
ARAUJO, E.G.
PILLIS, M.F.
CONGRESSO BRASILEIRO DE ENGENHARIA E CI??NCIA DOS MATERIAIS, 21.
author2_role author
author
author
author
dc.contributor.author.fl_str_mv SCHEIDT, G.S
SILVA JUNIOR, O.P.V.
ARAUJO, E.G.
PILLIS, M.F.
CONGRESSO BRASILEIRO DE ENGENHARIA E CI??NCIA DOS MATERIAIS, 21.
dc.subject.por.fl_str_mv thin films
niobium oxides
sputtering
refractive index
optical properties
chemical properties
corrosion resistance
silicon
boron silicates
ellipsometry
rutherford scattering
topic thin films
niobium oxides
sputtering
refractive index
optical properties
chemical properties
corrosion resistance
silicon
boron silicates
ellipsometry
rutherford scattering
publishDate 2015
dc.date.evento.pt_BR.fl_str_mv 9-13 de novembro, 2014
dc.date.accessioned.fl_str_mv 2015-02-09T11:55:56Z
2015-04-02T03:34:13Z
dc.date.available.fl_str_mv 2015-02-09T11:55:56Z
2015-04-02T03:34:13Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
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