Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons

Detalhes bibliográficos
Autor(a) principal: da Silva Oliveira, C.I.
Data de Publicação: 2021
Outros Autores: Martínez Martinez, Diego, Cunha, L., Lanceros-Méndez, S., Martins, Pedro Libânio Abreu, Alves, E., Barradas, N. P., Apreutesei, M.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: https://hdl.handle.net/1822/75473
Resumo: In this work, we explore the addition of Ti ribbons on the racetrack of a Zr target to prepare Zr-O-N films including Ti, by reactive magnetron sputtering with a mixture of N2 and O2 as reactive gases. This approach is simple and not invasive, it avoids the modification of the target and minimizes its contamination. These films were compared in terms of chemical composition, density, film growth and crystallographic structure with others prepared in identical conditions without Ti ribbons. In addition, the composition and density of the films were correlated with crystallographic references from literature. The color and electrical properties of the films were evaluated as well. It was observed that poisoning of the Zr target is promoted by the increase of the N2 + O2 flow and the reduction of magnetron current, but it is retarded by the introduction of the Ti ribbons. This effect was particularly remarkable at lower target current, since the sputtering is confined in areas nearer to the racetrack, where the Ti ribbons are located. To account for the poisoning of the target and compare it among the different samples, a ‘poisoning parameter’ was defined, using a combination of the chemical composition of the films and the deposition rates. The color and electrical properties of the films correlate surprisingly well with their oxygen-to-metal ratio, while the concentration of N does not seem to play any significant role.
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spelling Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbonsOxynitrideSputteringTitaniumZirconiumColorEngenharia e Tecnologia::Engenharia dos MateriaisScience & TechnologyIn this work, we explore the addition of Ti ribbons on the racetrack of a Zr target to prepare Zr-O-N films including Ti, by reactive magnetron sputtering with a mixture of N2 and O2 as reactive gases. This approach is simple and not invasive, it avoids the modification of the target and minimizes its contamination. These films were compared in terms of chemical composition, density, film growth and crystallographic structure with others prepared in identical conditions without Ti ribbons. In addition, the composition and density of the films were correlated with crystallographic references from literature. The color and electrical properties of the films were evaluated as well. It was observed that poisoning of the Zr target is promoted by the increase of the N2 + O2 flow and the reduction of magnetron current, but it is retarded by the introduction of the Ti ribbons. This effect was particularly remarkable at lower target current, since the sputtering is confined in areas nearer to the racetrack, where the Ti ribbons are located. To account for the poisoning of the target and compare it among the different samples, a ‘poisoning parameter’ was defined, using a combination of the chemical composition of the films and the deposition rates. The color and electrical properties of the films correlate surprisingly well with their oxygen-to-metal ratio, while the concentration of N does not seem to play any significant role.The financial support of Portuguese Foundation of Science and Technology (FCT), under the projects IF/00671/2013, M-ERA-NET2/0012/2016, and Strategic Funding UIDB/04650/2020 are gratefully acknowledged. The financial support from the Basque Government Industry Department under the ELKARTEK program is also acknowledged.ElsevierUniversidade do Minhoda Silva Oliveira, C.I.Martínez Martinez, DiegoCunha, L.Lanceros-Méndez, S.Martins, Pedro Libânio AbreuAlves, E.Barradas, N. P.Apreutesei, M.20212021-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttps://hdl.handle.net/1822/75473engda Silva Oliveira, C. I., Martínez-Martínez, D., Cunha, L., Lanceros-Mendez, S., Martins, P., Alves, E., . . . Apreutesei, M. (2021). Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons. Surface and Coatings Technology, 409, 126737. doi: https://doi.org/10.1016/j.surfcoat.2020.1267370257-897210.1016/j.surfcoat.2020.126737https://www.sciencedirect.com/science/article/pii/S0257897220314079info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T12:53:04Zoai:repositorium.sdum.uminho.pt:1822/75473Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T19:52:21.709561Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons
title Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons
spellingShingle Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons
da Silva Oliveira, C.I.
Oxynitride
Sputtering
Titanium
Zirconium
Color
Engenharia e Tecnologia::Engenharia dos Materiais
Science & Technology
title_short Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons
title_full Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons
title_fullStr Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons
title_full_unstemmed Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons
title_sort Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons
author da Silva Oliveira, C.I.
author_facet da Silva Oliveira, C.I.
Martínez Martinez, Diego
Cunha, L.
Lanceros-Méndez, S.
Martins, Pedro Libânio Abreu
Alves, E.
Barradas, N. P.
Apreutesei, M.
author_role author
author2 Martínez Martinez, Diego
Cunha, L.
Lanceros-Méndez, S.
Martins, Pedro Libânio Abreu
Alves, E.
Barradas, N. P.
Apreutesei, M.
author2_role author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade do Minho
dc.contributor.author.fl_str_mv da Silva Oliveira, C.I.
Martínez Martinez, Diego
Cunha, L.
Lanceros-Méndez, S.
Martins, Pedro Libânio Abreu
Alves, E.
Barradas, N. P.
Apreutesei, M.
dc.subject.por.fl_str_mv Oxynitride
Sputtering
Titanium
Zirconium
Color
Engenharia e Tecnologia::Engenharia dos Materiais
Science & Technology
topic Oxynitride
Sputtering
Titanium
Zirconium
Color
Engenharia e Tecnologia::Engenharia dos Materiais
Science & Technology
description In this work, we explore the addition of Ti ribbons on the racetrack of a Zr target to prepare Zr-O-N films including Ti, by reactive magnetron sputtering with a mixture of N2 and O2 as reactive gases. This approach is simple and not invasive, it avoids the modification of the target and minimizes its contamination. These films were compared in terms of chemical composition, density, film growth and crystallographic structure with others prepared in identical conditions without Ti ribbons. In addition, the composition and density of the films were correlated with crystallographic references from literature. The color and electrical properties of the films were evaluated as well. It was observed that poisoning of the Zr target is promoted by the increase of the N2 + O2 flow and the reduction of magnetron current, but it is retarded by the introduction of the Ti ribbons. This effect was particularly remarkable at lower target current, since the sputtering is confined in areas nearer to the racetrack, where the Ti ribbons are located. To account for the poisoning of the target and compare it among the different samples, a ‘poisoning parameter’ was defined, using a combination of the chemical composition of the films and the deposition rates. The color and electrical properties of the films correlate surprisingly well with their oxygen-to-metal ratio, while the concentration of N does not seem to play any significant role.
publishDate 2021
dc.date.none.fl_str_mv 2021
2021-01-01T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv https://hdl.handle.net/1822/75473
url https://hdl.handle.net/1822/75473
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv da Silva Oliveira, C. I., Martínez-Martínez, D., Cunha, L., Lanceros-Mendez, S., Martins, P., Alves, E., . . . Apreutesei, M. (2021). Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons. Surface and Coatings Technology, 409, 126737. doi: https://doi.org/10.1016/j.surfcoat.2020.126737
0257-8972
10.1016/j.surfcoat.2020.126737
https://www.sciencedirect.com/science/article/pii/S0257897220314079
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
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instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
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institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
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