Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons
Autor(a) principal: | |
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Data de Publicação: | 2021 |
Outros Autores: | , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | https://hdl.handle.net/1822/75473 |
Resumo: | In this work, we explore the addition of Ti ribbons on the racetrack of a Zr target to prepare Zr-O-N films including Ti, by reactive magnetron sputtering with a mixture of N2 and O2 as reactive gases. This approach is simple and not invasive, it avoids the modification of the target and minimizes its contamination. These films were compared in terms of chemical composition, density, film growth and crystallographic structure with others prepared in identical conditions without Ti ribbons. In addition, the composition and density of the films were correlated with crystallographic references from literature. The color and electrical properties of the films were evaluated as well. It was observed that poisoning of the Zr target is promoted by the increase of the N2 + O2 flow and the reduction of magnetron current, but it is retarded by the introduction of the Ti ribbons. This effect was particularly remarkable at lower target current, since the sputtering is confined in areas nearer to the racetrack, where the Ti ribbons are located. To account for the poisoning of the target and compare it among the different samples, a ‘poisoning parameter’ was defined, using a combination of the chemical composition of the films and the deposition rates. The color and electrical properties of the films correlate surprisingly well with their oxygen-to-metal ratio, while the concentration of N does not seem to play any significant role. |
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Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbonsOxynitrideSputteringTitaniumZirconiumColorEngenharia e Tecnologia::Engenharia dos MateriaisScience & TechnologyIn this work, we explore the addition of Ti ribbons on the racetrack of a Zr target to prepare Zr-O-N films including Ti, by reactive magnetron sputtering with a mixture of N2 and O2 as reactive gases. This approach is simple and not invasive, it avoids the modification of the target and minimizes its contamination. These films were compared in terms of chemical composition, density, film growth and crystallographic structure with others prepared in identical conditions without Ti ribbons. In addition, the composition and density of the films were correlated with crystallographic references from literature. The color and electrical properties of the films were evaluated as well. It was observed that poisoning of the Zr target is promoted by the increase of the N2 + O2 flow and the reduction of magnetron current, but it is retarded by the introduction of the Ti ribbons. This effect was particularly remarkable at lower target current, since the sputtering is confined in areas nearer to the racetrack, where the Ti ribbons are located. To account for the poisoning of the target and compare it among the different samples, a ‘poisoning parameter’ was defined, using a combination of the chemical composition of the films and the deposition rates. The color and electrical properties of the films correlate surprisingly well with their oxygen-to-metal ratio, while the concentration of N does not seem to play any significant role.The financial support of Portuguese Foundation of Science and Technology (FCT), under the projects IF/00671/2013, M-ERA-NET2/0012/2016, and Strategic Funding UIDB/04650/2020 are gratefully acknowledged. The financial support from the Basque Government Industry Department under the ELKARTEK program is also acknowledged.ElsevierUniversidade do Minhoda Silva Oliveira, C.I.Martínez Martinez, DiegoCunha, L.Lanceros-Méndez, S.Martins, Pedro Libânio AbreuAlves, E.Barradas, N. P.Apreutesei, M.20212021-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttps://hdl.handle.net/1822/75473engda Silva Oliveira, C. I., Martínez-Martínez, D., Cunha, L., Lanceros-Mendez, S., Martins, P., Alves, E., . . . Apreutesei, M. (2021). Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons. Surface and Coatings Technology, 409, 126737. doi: https://doi.org/10.1016/j.surfcoat.2020.1267370257-897210.1016/j.surfcoat.2020.126737https://www.sciencedirect.com/science/article/pii/S0257897220314079info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T12:53:04Zoai:repositorium.sdum.uminho.pt:1822/75473Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T19:52:21.709561Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons |
title |
Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons |
spellingShingle |
Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons da Silva Oliveira, C.I. Oxynitride Sputtering Titanium Zirconium Color Engenharia e Tecnologia::Engenharia dos Materiais Science & Technology |
title_short |
Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons |
title_full |
Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons |
title_fullStr |
Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons |
title_full_unstemmed |
Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons |
title_sort |
Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons |
author |
da Silva Oliveira, C.I. |
author_facet |
da Silva Oliveira, C.I. Martínez Martinez, Diego Cunha, L. Lanceros-Méndez, S. Martins, Pedro Libânio Abreu Alves, E. Barradas, N. P. Apreutesei, M. |
author_role |
author |
author2 |
Martínez Martinez, Diego Cunha, L. Lanceros-Méndez, S. Martins, Pedro Libânio Abreu Alves, E. Barradas, N. P. Apreutesei, M. |
author2_role |
author author author author author author author |
dc.contributor.none.fl_str_mv |
Universidade do Minho |
dc.contributor.author.fl_str_mv |
da Silva Oliveira, C.I. Martínez Martinez, Diego Cunha, L. Lanceros-Méndez, S. Martins, Pedro Libânio Abreu Alves, E. Barradas, N. P. Apreutesei, M. |
dc.subject.por.fl_str_mv |
Oxynitride Sputtering Titanium Zirconium Color Engenharia e Tecnologia::Engenharia dos Materiais Science & Technology |
topic |
Oxynitride Sputtering Titanium Zirconium Color Engenharia e Tecnologia::Engenharia dos Materiais Science & Technology |
description |
In this work, we explore the addition of Ti ribbons on the racetrack of a Zr target to prepare Zr-O-N films including Ti, by reactive magnetron sputtering with a mixture of N2 and O2 as reactive gases. This approach is simple and not invasive, it avoids the modification of the target and minimizes its contamination. These films were compared in terms of chemical composition, density, film growth and crystallographic structure with others prepared in identical conditions without Ti ribbons. In addition, the composition and density of the films were correlated with crystallographic references from literature. The color and electrical properties of the films were evaluated as well. It was observed that poisoning of the Zr target is promoted by the increase of the N2 + O2 flow and the reduction of magnetron current, but it is retarded by the introduction of the Ti ribbons. This effect was particularly remarkable at lower target current, since the sputtering is confined in areas nearer to the racetrack, where the Ti ribbons are located. To account for the poisoning of the target and compare it among the different samples, a ‘poisoning parameter’ was defined, using a combination of the chemical composition of the films and the deposition rates. The color and electrical properties of the films correlate surprisingly well with their oxygen-to-metal ratio, while the concentration of N does not seem to play any significant role. |
publishDate |
2021 |
dc.date.none.fl_str_mv |
2021 2021-01-01T00:00:00Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
https://hdl.handle.net/1822/75473 |
url |
https://hdl.handle.net/1822/75473 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
da Silva Oliveira, C. I., Martínez-Martínez, D., Cunha, L., Lanceros-Mendez, S., Martins, P., Alves, E., . . . Apreutesei, M. (2021). Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons. Surface and Coatings Technology, 409, 126737. doi: https://doi.org/10.1016/j.surfcoat.2020.126737 0257-8972 10.1016/j.surfcoat.2020.126737 https://www.sciencedirect.com/science/article/pii/S0257897220314079 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
Elsevier |
publisher.none.fl_str_mv |
Elsevier |
dc.source.none.fl_str_mv |
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Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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RCAAP |
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RCAAP |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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