Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering
Autor(a) principal: | |
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Data de Publicação: | 2013 |
Outros Autores: | , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/10316/27181 https://doi.org/10.1016/j.jpcs.2013.01.023 |
Resumo: | Influence of annealing temperature on structural, compositional, surface morphology, electrical, and optical properties of pulsed magnetron sputtered nanocrystalline Au:Ag:SnO2 films was investigated by several analytical techniques. From the XRD results, the films were polycrystalline with the absence of impurity phases and the films were grown preferentially in the (110) orientation of SnO2 with tetragonal structure. The surface smoothness and grain size of the films increases with annealing temperature. Photoluminescence measurements show that the as deposited Au:Ag:SnO2 films exhibited a broad emission peak at 536 nm (2.31 eV). The lowest electrical resistivity of 0.005 Ω cm was obtained at the films annealed at 500 °C. The optical studies show that the visible transmittance and band gap of the films increases with annealing temperature. |
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Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputteringA. OxidesA. Thin filmsC. X-ray diffractionInfluence of annealing temperature on structural, compositional, surface morphology, electrical, and optical properties of pulsed magnetron sputtered nanocrystalline Au:Ag:SnO2 films was investigated by several analytical techniques. From the XRD results, the films were polycrystalline with the absence of impurity phases and the films were grown preferentially in the (110) orientation of SnO2 with tetragonal structure. The surface smoothness and grain size of the films increases with annealing temperature. Photoluminescence measurements show that the as deposited Au:Ag:SnO2 films exhibited a broad emission peak at 536 nm (2.31 eV). The lowest electrical resistivity of 0.005 Ω cm was obtained at the films annealed at 500 °C. The optical studies show that the visible transmittance and band gap of the films increases with annealing temperature.Elsevier2013-06info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articlehttp://hdl.handle.net/10316/27181http://hdl.handle.net/10316/27181https://doi.org/10.1016/j.jpcs.2013.01.023engREDDY, A. Sivasankar; FIGUEIREDO, N. M.; CAVALEIRO, A. - Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering. "Journal of Physics and Chemistry of Solids". ISSN 0022-3697. Vol. 74 Nº. 6 (2013) p. 825-8290022-3697http://www.sciencedirect.com/science/article/pii/S0022369713000437Reddy, A. SivasankarFigueiredo, N. M.Cavaleiro, A.info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2020-05-29T09:42:32Zoai:estudogeral.uc.pt:10316/27181Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T20:58:35.556341Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering |
title |
Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering |
spellingShingle |
Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering Reddy, A. Sivasankar A. Oxides A. Thin films C. X-ray diffraction |
title_short |
Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering |
title_full |
Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering |
title_fullStr |
Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering |
title_full_unstemmed |
Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering |
title_sort |
Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering |
author |
Reddy, A. Sivasankar |
author_facet |
Reddy, A. Sivasankar Figueiredo, N. M. Cavaleiro, A. |
author_role |
author |
author2 |
Figueiredo, N. M. Cavaleiro, A. |
author2_role |
author author |
dc.contributor.author.fl_str_mv |
Reddy, A. Sivasankar Figueiredo, N. M. Cavaleiro, A. |
dc.subject.por.fl_str_mv |
A. Oxides A. Thin films C. X-ray diffraction |
topic |
A. Oxides A. Thin films C. X-ray diffraction |
description |
Influence of annealing temperature on structural, compositional, surface morphology, electrical, and optical properties of pulsed magnetron sputtered nanocrystalline Au:Ag:SnO2 films was investigated by several analytical techniques. From the XRD results, the films were polycrystalline with the absence of impurity phases and the films were grown preferentially in the (110) orientation of SnO2 with tetragonal structure. The surface smoothness and grain size of the films increases with annealing temperature. Photoluminescence measurements show that the as deposited Au:Ag:SnO2 films exhibited a broad emission peak at 536 nm (2.31 eV). The lowest electrical resistivity of 0.005 Ω cm was obtained at the films annealed at 500 °C. The optical studies show that the visible transmittance and band gap of the films increases with annealing temperature. |
publishDate |
2013 |
dc.date.none.fl_str_mv |
2013-06 |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/10316/27181 http://hdl.handle.net/10316/27181 https://doi.org/10.1016/j.jpcs.2013.01.023 |
url |
http://hdl.handle.net/10316/27181 https://doi.org/10.1016/j.jpcs.2013.01.023 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
REDDY, A. Sivasankar; FIGUEIREDO, N. M.; CAVALEIRO, A. - Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering. "Journal of Physics and Chemistry of Solids". ISSN 0022-3697. Vol. 74 Nº. 6 (2013) p. 825-829 0022-3697 http://www.sciencedirect.com/science/article/pii/S0022369713000437 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.publisher.none.fl_str_mv |
Elsevier |
publisher.none.fl_str_mv |
Elsevier |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
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Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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RCAAP |
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RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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