Processability and electrical characteristics of glass substrates for RF wafer-level chip-scale packages
Autor(a) principal: | |
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Data de Publicação: | 2003 |
Outros Autores: | , , , , , |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/1822/1950 |
Resumo: | Various types of glass substrates have been compared with respect to their suitability as a low-loss substrate in wafer-level chip-scale packaging for RF applications. Processability has been evaluated by fabrication of shallow and deep recesses using wet etching in HF (/H3PO4) solutions. Electrical characteristics (dielectric constant and attenuation) have been extracted from measurements on coplanar wave guides (CPWs) up to 10 GHz. Results show that Coming Pyrex #7740 glass provides optical quality of wet-etched deep recesses, but exhibit about 2 times higher electrical attenuation than Hoya SD-2. Pyrex #7740 and SD-2 are thermally matched to silicon and due to some alkali content, they are suitable for anodic bonding. The relatively high content of AL2O3 (~20%) in SD-2 is favorable for its electrical properties, but makes wet etching of deep recesses more difficult. The non-alkaline AF45, with CTE almost 2 times of Si (CTEAF45=4.5x10-6 k-1), is suitable for adhesive bonding and is difficult to pattern using wet etching. Its electrical attenuation is close to that of SD-2. The measured dielectric constants (at 6 GHz) for SD-2, Pyrex #7740 and AF45 are 4.7,5.9 and 6.1, respectively. |
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Processability and electrical characteristics of glass substrates for RF wafer-level chip-scale packagesWafer level packagingWafer bondingGlass wafer processingVarious types of glass substrates have been compared with respect to their suitability as a low-loss substrate in wafer-level chip-scale packaging for RF applications. Processability has been evaluated by fabrication of shallow and deep recesses using wet etching in HF (/H3PO4) solutions. Electrical characteristics (dielectric constant and attenuation) have been extracted from measurements on coplanar wave guides (CPWs) up to 10 GHz. Results show that Coming Pyrex #7740 glass provides optical quality of wet-etched deep recesses, but exhibit about 2 times higher electrical attenuation than Hoya SD-2. Pyrex #7740 and SD-2 are thermally matched to silicon and due to some alkali content, they are suitable for anodic bonding. The relatively high content of AL2O3 (~20%) in SD-2 is favorable for its electrical properties, but makes wet etching of deep recesses more difficult. The non-alkaline AF45, with CTE almost 2 times of Si (CTEAF45=4.5x10-6 k-1), is suitable for adhesive bonding and is difficult to pattern using wet etching. Its electrical attenuation is close to that of SD-2. The measured dielectric constants (at 6 GHz) for SD-2, Pyrex #7740 and AF45 are 4.7,5.9 and 6.1, respectively.Fundação para a Ciência e a Tecnologia (FCT), European Comission, Philips Research.IEEEUniversidade do MinhoPolyakov, A.Mendes, P. M.Sinaga, S. M.Bartek, M.Rejaei, B.Correia, J. H.Burghartz, J. N.2003-052003-05-01T00:00:00Zconference paperinfo:eu-repo/semantics/publishedVersionapplication/pdfhttp://hdl.handle.net/1822/1950engELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE, 53, New Orleans, 2003 - "Proceedings". New Orleans : IEEE, 2003. ISBN 0-7803-7430-4. p. 875-880.0-7803-7430-40569-5503info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-05-11T07:07:52Zoai:repositorium.sdum.uminho.pt:1822/1950Portal AgregadorONGhttps://www.rcaap.pt/oai/openairemluisa.alvim@gmail.comopendoar:71602024-05-11T07:07:52Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Processability and electrical characteristics of glass substrates for RF wafer-level chip-scale packages |
title |
Processability and electrical characteristics of glass substrates for RF wafer-level chip-scale packages |
spellingShingle |
Processability and electrical characteristics of glass substrates for RF wafer-level chip-scale packages Polyakov, A. Wafer level packaging Wafer bonding Glass wafer processing |
title_short |
Processability and electrical characteristics of glass substrates for RF wafer-level chip-scale packages |
title_full |
Processability and electrical characteristics of glass substrates for RF wafer-level chip-scale packages |
title_fullStr |
Processability and electrical characteristics of glass substrates for RF wafer-level chip-scale packages |
title_full_unstemmed |
Processability and electrical characteristics of glass substrates for RF wafer-level chip-scale packages |
title_sort |
Processability and electrical characteristics of glass substrates for RF wafer-level chip-scale packages |
author |
Polyakov, A. |
author_facet |
Polyakov, A. Mendes, P. M. Sinaga, S. M. Bartek, M. Rejaei, B. Correia, J. H. Burghartz, J. N. |
author_role |
author |
author2 |
Mendes, P. M. Sinaga, S. M. Bartek, M. Rejaei, B. Correia, J. H. Burghartz, J. N. |
author2_role |
author author author author author author |
dc.contributor.none.fl_str_mv |
Universidade do Minho |
dc.contributor.author.fl_str_mv |
Polyakov, A. Mendes, P. M. Sinaga, S. M. Bartek, M. Rejaei, B. Correia, J. H. Burghartz, J. N. |
dc.subject.por.fl_str_mv |
Wafer level packaging Wafer bonding Glass wafer processing |
topic |
Wafer level packaging Wafer bonding Glass wafer processing |
description |
Various types of glass substrates have been compared with respect to their suitability as a low-loss substrate in wafer-level chip-scale packaging for RF applications. Processability has been evaluated by fabrication of shallow and deep recesses using wet etching in HF (/H3PO4) solutions. Electrical characteristics (dielectric constant and attenuation) have been extracted from measurements on coplanar wave guides (CPWs) up to 10 GHz. Results show that Coming Pyrex #7740 glass provides optical quality of wet-etched deep recesses, but exhibit about 2 times higher electrical attenuation than Hoya SD-2. Pyrex #7740 and SD-2 are thermally matched to silicon and due to some alkali content, they are suitable for anodic bonding. The relatively high content of AL2O3 (~20%) in SD-2 is favorable for its electrical properties, but makes wet etching of deep recesses more difficult. The non-alkaline AF45, with CTE almost 2 times of Si (CTEAF45=4.5x10-6 k-1), is suitable for adhesive bonding and is difficult to pattern using wet etching. Its electrical attenuation is close to that of SD-2. The measured dielectric constants (at 6 GHz) for SD-2, Pyrex #7740 and AF45 are 4.7,5.9 and 6.1, respectively. |
publishDate |
2003 |
dc.date.none.fl_str_mv |
2003-05 2003-05-01T00:00:00Z |
dc.type.driver.fl_str_mv |
conference paper |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/1822/1950 |
url |
http://hdl.handle.net/1822/1950 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE, 53, New Orleans, 2003 - "Proceedings". New Orleans : IEEE, 2003. ISBN 0-7803-7430-4. p. 875-880. 0-7803-7430-4 0569-5503 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
IEEE |
publisher.none.fl_str_mv |
IEEE |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
mluisa.alvim@gmail.com |
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1817545214815895552 |