Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films

Detalhes bibliográficos
Autor(a) principal: dos Reis, Saulo Portes
Data de Publicação: 2020
Outros Autores: Minussi, Fernando Brondani, Araujo, Eudes B.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: https://doi.org/10.34624/nmse.v2i1.8485
Resumo: This work reports the temperature and electric field effects on the electrical properties of BiFeO3 thin films. The increase in temperature promotes an increase in the dielectric permittivity of the studied film in the range of 100 Hz to 1 MHz, with a dielectric dispersion at the lower frequencies (∼ 100 Hz), but no pronounced effects of the electric field on dielectric permittivity in the same frequency range were observed. The effects of temperature and electric on the electrical conductivity were also studied. Based on the obtained activation energy E = 0.40 eV, the conduction mechanism in the studied BiFeO3 film was associated to the first ionization of oxygen vacancies.
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spelling Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin filmsThis work reports the temperature and electric field effects on the electrical properties of BiFeO3 thin films. The increase in temperature promotes an increase in the dielectric permittivity of the studied film in the range of 100 Hz to 1 MHz, with a dielectric dispersion at the lower frequencies (∼ 100 Hz), but no pronounced effects of the electric field on dielectric permittivity in the same frequency range were observed. The effects of temperature and electric on the electrical conductivity were also studied. Based on the obtained activation energy E = 0.40 eV, the conduction mechanism in the studied BiFeO3 film was associated to the first ionization of oxygen vacancies.UA Editora2020-03-09T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttps://doi.org/10.34624/nmse.v2i1.8485oai:proa.ua.pt:article/8485Nanomaterials Science & Engineering; Vol 2 No 1 (2020): Nanomaterials Science & Engineering; 25-34Journal of Nanomaterials Science and Nanotechnology; Vol. 2 Núm. 1 (2020): Nanomaterials Science & Engineering; 25-34Journal of Nanomaterials Science and Nanotechnology; Vol. 2 No 1 (2020): Nanomaterials Science & Engineering; 25-34Nanomaterials Science & Engineering; vol. 2 n.º 1 (2020): Nanomaterials Science & Engineering; 25-342184-70022184-7002reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAPenghttps://proa.ua.pt/index.php/nmse/article/view/8485https://doi.org/10.34624/nmse.v2i1.8485https://proa.ua.pt/index.php/nmse/article/view/8485/9007Copyright (c) 2020 Nanomaterials Science & Engineeringhttp://creativecommons.org/licenses/by-nc/4.0info:eu-repo/semantics/openAccessdos Reis, Saulo PortesMinussi, Fernando BrondaniAraujo, Eudes B.2022-09-06T02:15:14Zoai:proa.ua.pt:article/8485Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T15:47:51.363517Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films
title Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films
spellingShingle Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films
dos Reis, Saulo Portes
title_short Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films
title_full Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films
title_fullStr Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films
title_full_unstemmed Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films
title_sort Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films
author dos Reis, Saulo Portes
author_facet dos Reis, Saulo Portes
Minussi, Fernando Brondani
Araujo, Eudes B.
author_role author
author2 Minussi, Fernando Brondani
Araujo, Eudes B.
author2_role author
author
dc.contributor.author.fl_str_mv dos Reis, Saulo Portes
Minussi, Fernando Brondani
Araujo, Eudes B.
description This work reports the temperature and electric field effects on the electrical properties of BiFeO3 thin films. The increase in temperature promotes an increase in the dielectric permittivity of the studied film in the range of 100 Hz to 1 MHz, with a dielectric dispersion at the lower frequencies (∼ 100 Hz), but no pronounced effects of the electric field on dielectric permittivity in the same frequency range were observed. The effects of temperature and electric on the electrical conductivity were also studied. Based on the obtained activation energy E = 0.40 eV, the conduction mechanism in the studied BiFeO3 film was associated to the first ionization of oxygen vacancies.
publishDate 2020
dc.date.none.fl_str_mv 2020-03-09T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv https://doi.org/10.34624/nmse.v2i1.8485
oai:proa.ua.pt:article/8485
url https://doi.org/10.34624/nmse.v2i1.8485
identifier_str_mv oai:proa.ua.pt:article/8485
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv https://proa.ua.pt/index.php/nmse/article/view/8485
https://doi.org/10.34624/nmse.v2i1.8485
https://proa.ua.pt/index.php/nmse/article/view/8485/9007
dc.rights.driver.fl_str_mv Copyright (c) 2020 Nanomaterials Science & Engineering
http://creativecommons.org/licenses/by-nc/4.0
info:eu-repo/semantics/openAccess
rights_invalid_str_mv Copyright (c) 2020 Nanomaterials Science & Engineering
http://creativecommons.org/licenses/by-nc/4.0
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv UA Editora
publisher.none.fl_str_mv UA Editora
dc.source.none.fl_str_mv Nanomaterials Science & Engineering; Vol 2 No 1 (2020): Nanomaterials Science & Engineering; 25-34
Journal of Nanomaterials Science and Nanotechnology; Vol. 2 Núm. 1 (2020): Nanomaterials Science & Engineering; 25-34
Journal of Nanomaterials Science and Nanotechnology; Vol. 2 No 1 (2020): Nanomaterials Science & Engineering; 25-34
Nanomaterials Science & Engineering; vol. 2 n.º 1 (2020): Nanomaterials Science & Engineering; 25-34
2184-7002
2184-7002
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
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instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
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repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
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