Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films
Autor(a) principal: | |
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Data de Publicação: | 2020 |
Outros Autores: | , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | https://doi.org/10.34624/nmse.v2i1.8485 |
Resumo: | This work reports the temperature and electric field effects on the electrical properties of BiFeO3 thin films. The increase in temperature promotes an increase in the dielectric permittivity of the studied film in the range of 100 Hz to 1 MHz, with a dielectric dispersion at the lower frequencies (∼ 100 Hz), but no pronounced effects of the electric field on dielectric permittivity in the same frequency range were observed. The effects of temperature and electric on the electrical conductivity were also studied. Based on the obtained activation energy E = 0.40 eV, the conduction mechanism in the studied BiFeO3 film was associated to the first ionization of oxygen vacancies. |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
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7160 |
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Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin filmsThis work reports the temperature and electric field effects on the electrical properties of BiFeO3 thin films. The increase in temperature promotes an increase in the dielectric permittivity of the studied film in the range of 100 Hz to 1 MHz, with a dielectric dispersion at the lower frequencies (∼ 100 Hz), but no pronounced effects of the electric field on dielectric permittivity in the same frequency range were observed. The effects of temperature and electric on the electrical conductivity were also studied. Based on the obtained activation energy E = 0.40 eV, the conduction mechanism in the studied BiFeO3 film was associated to the first ionization of oxygen vacancies.UA Editora2020-03-09T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttps://doi.org/10.34624/nmse.v2i1.8485oai:proa.ua.pt:article/8485Nanomaterials Science & Engineering; Vol 2 No 1 (2020): Nanomaterials Science & Engineering; 25-34Journal of Nanomaterials Science and Nanotechnology; Vol. 2 Núm. 1 (2020): Nanomaterials Science & Engineering; 25-34Journal of Nanomaterials Science and Nanotechnology; Vol. 2 No 1 (2020): Nanomaterials Science & Engineering; 25-34Nanomaterials Science & Engineering; vol. 2 n.º 1 (2020): Nanomaterials Science & Engineering; 25-342184-70022184-7002reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAPenghttps://proa.ua.pt/index.php/nmse/article/view/8485https://doi.org/10.34624/nmse.v2i1.8485https://proa.ua.pt/index.php/nmse/article/view/8485/9007Copyright (c) 2020 Nanomaterials Science & Engineeringhttp://creativecommons.org/licenses/by-nc/4.0info:eu-repo/semantics/openAccessdos Reis, Saulo PortesMinussi, Fernando BrondaniAraujo, Eudes B.2022-09-06T02:15:14Zoai:proa.ua.pt:article/8485Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T15:47:51.363517Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films |
title |
Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films |
spellingShingle |
Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films dos Reis, Saulo Portes |
title_short |
Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films |
title_full |
Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films |
title_fullStr |
Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films |
title_full_unstemmed |
Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films |
title_sort |
Thermally activated processes and bias field effects on the electrical properties of BiFeO3 thin films |
author |
dos Reis, Saulo Portes |
author_facet |
dos Reis, Saulo Portes Minussi, Fernando Brondani Araujo, Eudes B. |
author_role |
author |
author2 |
Minussi, Fernando Brondani Araujo, Eudes B. |
author2_role |
author author |
dc.contributor.author.fl_str_mv |
dos Reis, Saulo Portes Minussi, Fernando Brondani Araujo, Eudes B. |
description |
This work reports the temperature and electric field effects on the electrical properties of BiFeO3 thin films. The increase in temperature promotes an increase in the dielectric permittivity of the studied film in the range of 100 Hz to 1 MHz, with a dielectric dispersion at the lower frequencies (∼ 100 Hz), but no pronounced effects of the electric field on dielectric permittivity in the same frequency range were observed. The effects of temperature and electric on the electrical conductivity were also studied. Based on the obtained activation energy E = 0.40 eV, the conduction mechanism in the studied BiFeO3 film was associated to the first ionization of oxygen vacancies. |
publishDate |
2020 |
dc.date.none.fl_str_mv |
2020-03-09T00:00:00Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
https://doi.org/10.34624/nmse.v2i1.8485 oai:proa.ua.pt:article/8485 |
url |
https://doi.org/10.34624/nmse.v2i1.8485 |
identifier_str_mv |
oai:proa.ua.pt:article/8485 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
https://proa.ua.pt/index.php/nmse/article/view/8485 https://doi.org/10.34624/nmse.v2i1.8485 https://proa.ua.pt/index.php/nmse/article/view/8485/9007 |
dc.rights.driver.fl_str_mv |
Copyright (c) 2020 Nanomaterials Science & Engineering http://creativecommons.org/licenses/by-nc/4.0 info:eu-repo/semantics/openAccess |
rights_invalid_str_mv |
Copyright (c) 2020 Nanomaterials Science & Engineering http://creativecommons.org/licenses/by-nc/4.0 |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
UA Editora |
publisher.none.fl_str_mv |
UA Editora |
dc.source.none.fl_str_mv |
Nanomaterials Science & Engineering; Vol 2 No 1 (2020): Nanomaterials Science & Engineering; 25-34 Journal of Nanomaterials Science and Nanotechnology; Vol. 2 Núm. 1 (2020): Nanomaterials Science & Engineering; 25-34 Journal of Nanomaterials Science and Nanotechnology; Vol. 2 No 1 (2020): Nanomaterials Science & Engineering; 25-34 Nanomaterials Science & Engineering; vol. 2 n.º 1 (2020): Nanomaterials Science & Engineering; 25-34 2184-7002 2184-7002 reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
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1799130345548808192 |