Electronic transport in low-temperature silicon nitride
Autor(a) principal: | |
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Data de Publicação: | 2002 |
Outros Autores: | , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/1822/5552 |
Resumo: | Perpendicular current transport through thin silicon nitride films deposited at 100 degreesC by radio frequency chemical vapor deposition (RF) is measured between patterned square contacts with side lengths between 5 and 200 mum. Hydrogen dilution, silane-to-ammonia ratio, and total gas flow were varied to achieve control of film properties. The dependence of the current on the applied field and measurement temperature are correlated to structural parameters such as the index of refraction, etching rate in buffered hydrofluoric acid and infrared vibrational band strengths. Using the appropriate deposition parameters, it is possible to prepare, at 100 degreesC, silicon nitride dielectric films with electronic properties compatible with use as gate dielectrics of thin-film transistors. |
id |
RCAP_806119839d580f8498c3f48366425584 |
---|---|
oai_identifier_str |
oai:repositorium.sdum.uminho.pt:1822/5552 |
network_acronym_str |
RCAP |
network_name_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository_id_str |
7160 |
spelling |
Electronic transport in low-temperature silicon nitrideChemical-vapor-depositionHydrogen contentFilmsPerpendicular current transport through thin silicon nitride films deposited at 100 degreesC by radio frequency chemical vapor deposition (RF) is measured between patterned square contacts with side lengths between 5 and 200 mum. Hydrogen dilution, silane-to-ammonia ratio, and total gas flow were varied to achieve control of film properties. The dependence of the current on the applied field and measurement temperature are correlated to structural parameters such as the index of refraction, etching rate in buffered hydrofluoric acid and infrared vibrational band strengths. Using the appropriate deposition parameters, it is possible to prepare, at 100 degreesC, silicon nitride dielectric films with electronic properties compatible with use as gate dielectrics of thin-film transistors.Fundação para a Ciência e Tecnologia (FCT) Universidade do Minho (UM)Elsevier ScienceUniversidade do MinhoAlpuim, P.Ferreira, P.Chu, V.Conde, J. P.2002-04-012002-04-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/5552eng"Journal of non-cristalline solids". ISSN 0022-3093. 299-302 Part 1 (Apr. 2002) 434-438.0022-309310.1016/S0022-3093(01)01017-1http://www.sciencedirect.cominfo:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T12:32:56Zoai:repositorium.sdum.uminho.pt:1822/5552Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T19:28:22.619328Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Electronic transport in low-temperature silicon nitride |
title |
Electronic transport in low-temperature silicon nitride |
spellingShingle |
Electronic transport in low-temperature silicon nitride Alpuim, P. Chemical-vapor-deposition Hydrogen content Films |
title_short |
Electronic transport in low-temperature silicon nitride |
title_full |
Electronic transport in low-temperature silicon nitride |
title_fullStr |
Electronic transport in low-temperature silicon nitride |
title_full_unstemmed |
Electronic transport in low-temperature silicon nitride |
title_sort |
Electronic transport in low-temperature silicon nitride |
author |
Alpuim, P. |
author_facet |
Alpuim, P. Ferreira, P. Chu, V. Conde, J. P. |
author_role |
author |
author2 |
Ferreira, P. Chu, V. Conde, J. P. |
author2_role |
author author author |
dc.contributor.none.fl_str_mv |
Universidade do Minho |
dc.contributor.author.fl_str_mv |
Alpuim, P. Ferreira, P. Chu, V. Conde, J. P. |
dc.subject.por.fl_str_mv |
Chemical-vapor-deposition Hydrogen content Films |
topic |
Chemical-vapor-deposition Hydrogen content Films |
description |
Perpendicular current transport through thin silicon nitride films deposited at 100 degreesC by radio frequency chemical vapor deposition (RF) is measured between patterned square contacts with side lengths between 5 and 200 mum. Hydrogen dilution, silane-to-ammonia ratio, and total gas flow were varied to achieve control of film properties. The dependence of the current on the applied field and measurement temperature are correlated to structural parameters such as the index of refraction, etching rate in buffered hydrofluoric acid and infrared vibrational band strengths. Using the appropriate deposition parameters, it is possible to prepare, at 100 degreesC, silicon nitride dielectric films with electronic properties compatible with use as gate dielectrics of thin-film transistors. |
publishDate |
2002 |
dc.date.none.fl_str_mv |
2002-04-01 2002-04-01T00:00:00Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/1822/5552 |
url |
http://hdl.handle.net/1822/5552 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
"Journal of non-cristalline solids". ISSN 0022-3093. 299-302 Part 1 (Apr. 2002) 434-438. 0022-3093 10.1016/S0022-3093(01)01017-1 http://www.sciencedirect.com |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
Elsevier Science |
publisher.none.fl_str_mv |
Elsevier Science |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
|
_version_ |
1799132778878468096 |