Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton

Detalhes bibliográficos
Autor(a) principal: Marques, Ana Cláudia
Data de Publicação: 2019
Outros Autores: Faria, Jaime, Perdigão, Patrícia, Faustino, Bruno M. M., Ritasalo, Riina, Costabello, Katiuscia, da Silva, Rui C., Ferreira, Isabel
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10362/103323
Resumo: H2020-ICT-2014-1 ERC-CoG-2014 CapTherPV, 647596
id RCAP_cfe9f513a57520b5fb637d1f2745d404
oai_identifier_str oai:run.unl.pt:10362/103323
network_acronym_str RCAP
network_name_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository_id_str 7160
spelling Stability under humidity, UV-light and bending of AZO films deposited by ALD on KaptonGeneralH2020-ICT-2014-1 ERC-CoG-2014 CapTherPV, 647596Aluminium doped zinc oxide (AZO) films were grown by Atomic Layer Deposition (ALD) on yellow Kapton and transparent Kapton (type CS) substrates for large area flexible transparent thermoelectric applications, which performance relies on the thermoelectric properties of the transparent AZO films. Therefore, their adhesion to Kapton, environmental and bending stability were accessed. Plasma treatment on Kapton substrates improved films adhesion, reduced cracks formation, and enhanced electrical resistance stability over time, of importance for long term thermoelectric applications in external environment. While exposure to UV light intensity caused the films electrical resistance to vary, and therefore their maximum power density outputs (0.3–0.4 mW/cm3) for a constant temperature difference (∼10 °C), humidity exposure and consecutive bending up to a curvature radius above the critical one (∼18 mm) not. Testing whether the films can benefit from encapsulation revealed that this can provide extra bending stability and prevent contacts deterioration in the long term.DCM - Departamento de Ciência dos MateriaisCENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N)RUNMarques, Ana CláudiaFaria, JaimePerdigão, PatríciaFaustino, Bruno M. M.Ritasalo, RiinaCostabello, Katiusciada Silva, Rui C.Ferreira, Isabel2020-09-03T23:12:14Z2019-12-012019-12-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10362/103323eng2045-2322PURE: 19004325https://doi.org/10.1038/s41598-019-54451-0info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-03-11T04:48:45Zoai:run.unl.pt:10362/103323Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T03:39:51.008626Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton
title Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton
spellingShingle Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton
Marques, Ana Cláudia
General
title_short Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton
title_full Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton
title_fullStr Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton
title_full_unstemmed Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton
title_sort Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton
author Marques, Ana Cláudia
author_facet Marques, Ana Cláudia
Faria, Jaime
Perdigão, Patrícia
Faustino, Bruno M. M.
Ritasalo, Riina
Costabello, Katiuscia
da Silva, Rui C.
Ferreira, Isabel
author_role author
author2 Faria, Jaime
Perdigão, Patrícia
Faustino, Bruno M. M.
Ritasalo, Riina
Costabello, Katiuscia
da Silva, Rui C.
Ferreira, Isabel
author2_role author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv DCM - Departamento de Ciência dos Materiais
CENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N)
RUN
dc.contributor.author.fl_str_mv Marques, Ana Cláudia
Faria, Jaime
Perdigão, Patrícia
Faustino, Bruno M. M.
Ritasalo, Riina
Costabello, Katiuscia
da Silva, Rui C.
Ferreira, Isabel
dc.subject.por.fl_str_mv General
topic General
description H2020-ICT-2014-1 ERC-CoG-2014 CapTherPV, 647596
publishDate 2019
dc.date.none.fl_str_mv 2019-12-01
2019-12-01T00:00:00Z
2020-09-03T23:12:14Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10362/103323
url http://hdl.handle.net/10362/103323
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 2045-2322
PURE: 19004325
https://doi.org/10.1038/s41598-019-54451-0
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv
_version_ 1799138014973132800

Registros relacionados