XPS study of the thermal vapour sulfurization of tungsten thin films
Autor(a) principal: | |
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Data de Publicação: | 2019 |
Outros Autores: | |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | https://doi.org/10.34624/nmse.v1i1.6757 |
Resumo: | Here we report the XPS spectra of thermally sulfurized tungsten thin films on SiO2 at different temperatures. The sulfurization was performed in a chemical vapour deposition system at 400 ºC, 500 ºC, 550 ºC, 600 ºC and 750 ºC. Below 500 ºC XPS showed that the tungsten layer was oxidized (W6+) and only carbon-sulfur compounds were detected. On the other hand, from 600 ºC the sulfurization process was complete by forming WS2, while at the intermediate temperature of 550 ºC the films were partially oxidized and partially sulfurized. |
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XPS study of the thermal vapour sulfurization of tungsten thin filmsXPS study of the thermal vapour sulfurization of tungsten thin filmsHere we report the XPS spectra of thermally sulfurized tungsten thin films on SiO2 at different temperatures. The sulfurization was performed in a chemical vapour deposition system at 400 ºC, 500 ºC, 550 ºC, 600 ºC and 750 ºC. Below 500 ºC XPS showed that the tungsten layer was oxidized (W6+) and only carbon-sulfur compounds were detected. On the other hand, from 600 ºC the sulfurization process was complete by forming WS2, while at the intermediate temperature of 550 ºC the films were partially oxidized and partially sulfurized.UA Editora2019-12-18T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttps://doi.org/10.34624/nmse.v1i1.6757oai:proa.ua.pt:article/6757Nanomaterials Science & Engineering; Vol 1 No 1 (2019): Nanomaterials Science & Engineering; 6-9Journal of Nanomaterials Science and Nanotechnology; Vol. 1 Núm. 1 (2019): Nanomaterials Science & Engineering; 6-9Journal of Nanomaterials Science and Nanotechnology; Vol. 1 No 1 (2019): Nanomaterials Science & Engineering; 6-9Nanomaterials Science & Engineering; vol. 1 n.º 1 (2019): Nanomaterials Science & Engineering; 6-92184-70022184-7002reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAPenghttps://proa.ua.pt/index.php/nmse/article/view/6757https://doi.org/10.34624/nmse.v1i1.6757https://proa.ua.pt/index.php/nmse/article/view/6757/6881Copyright (c) 2019 Nanomaterials Science & Engineeringhttp://creativecommons.org/licenses/by-nc/4.0info:eu-repo/semantics/openAccessOtero-Irurueta, GonzaloHortigüela, María J.2022-09-06T02:15:14Zoai:proa.ua.pt:article/6757Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T15:47:51.259516Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
XPS study of the thermal vapour sulfurization of tungsten thin films XPS study of the thermal vapour sulfurization of tungsten thin films |
title |
XPS study of the thermal vapour sulfurization of tungsten thin films |
spellingShingle |
XPS study of the thermal vapour sulfurization of tungsten thin films Otero-Irurueta, Gonzalo |
title_short |
XPS study of the thermal vapour sulfurization of tungsten thin films |
title_full |
XPS study of the thermal vapour sulfurization of tungsten thin films |
title_fullStr |
XPS study of the thermal vapour sulfurization of tungsten thin films |
title_full_unstemmed |
XPS study of the thermal vapour sulfurization of tungsten thin films |
title_sort |
XPS study of the thermal vapour sulfurization of tungsten thin films |
author |
Otero-Irurueta, Gonzalo |
author_facet |
Otero-Irurueta, Gonzalo Hortigüela, María J. |
author_role |
author |
author2 |
Hortigüela, María J. |
author2_role |
author |
dc.contributor.author.fl_str_mv |
Otero-Irurueta, Gonzalo Hortigüela, María J. |
description |
Here we report the XPS spectra of thermally sulfurized tungsten thin films on SiO2 at different temperatures. The sulfurization was performed in a chemical vapour deposition system at 400 ºC, 500 ºC, 550 ºC, 600 ºC and 750 ºC. Below 500 ºC XPS showed that the tungsten layer was oxidized (W6+) and only carbon-sulfur compounds were detected. On the other hand, from 600 ºC the sulfurization process was complete by forming WS2, while at the intermediate temperature of 550 ºC the films were partially oxidized and partially sulfurized. |
publishDate |
2019 |
dc.date.none.fl_str_mv |
2019-12-18T00:00:00Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
https://doi.org/10.34624/nmse.v1i1.6757 oai:proa.ua.pt:article/6757 |
url |
https://doi.org/10.34624/nmse.v1i1.6757 |
identifier_str_mv |
oai:proa.ua.pt:article/6757 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
https://proa.ua.pt/index.php/nmse/article/view/6757 https://doi.org/10.34624/nmse.v1i1.6757 https://proa.ua.pt/index.php/nmse/article/view/6757/6881 |
dc.rights.driver.fl_str_mv |
Copyright (c) 2019 Nanomaterials Science & Engineering http://creativecommons.org/licenses/by-nc/4.0 info:eu-repo/semantics/openAccess |
rights_invalid_str_mv |
Copyright (c) 2019 Nanomaterials Science & Engineering http://creativecommons.org/licenses/by-nc/4.0 |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
UA Editora |
publisher.none.fl_str_mv |
UA Editora |
dc.source.none.fl_str_mv |
Nanomaterials Science & Engineering; Vol 1 No 1 (2019): Nanomaterials Science & Engineering; 6-9 Journal of Nanomaterials Science and Nanotechnology; Vol. 1 Núm. 1 (2019): Nanomaterials Science & Engineering; 6-9 Journal of Nanomaterials Science and Nanotechnology; Vol. 1 No 1 (2019): Nanomaterials Science & Engineering; 6-9 Nanomaterials Science & Engineering; vol. 1 n.º 1 (2019): Nanomaterials Science & Engineering; 6-9 2184-7002 2184-7002 reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
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1799130345544613888 |