XPS study of the thermal vapour sulfurization of tungsten thin films

Detalhes bibliográficos
Autor(a) principal: Otero-Irurueta, Gonzalo
Data de Publicação: 2019
Outros Autores: Hortigüela, María J.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: https://doi.org/10.34624/nmse.v1i1.6757
Resumo: Here we report the XPS spectra of thermally sulfurized tungsten thin films on SiO2 at different temperatures. The sulfurization was performed in a chemical vapour deposition system at 400 ºC, 500 ºC, 550 ºC, 600 ºC and 750 ºC. Below 500 ºC XPS showed that the tungsten layer was oxidized (W6+) and only carbon-sulfur compounds were detected. On the other hand, from 600 ºC the sulfurization process was complete by forming WS2, while at the intermediate temperature of 550 ºC the films were partially oxidized and partially sulfurized.
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spelling XPS study of the thermal vapour sulfurization of tungsten thin filmsXPS study of the thermal vapour sulfurization of tungsten thin filmsHere we report the XPS spectra of thermally sulfurized tungsten thin films on SiO2 at different temperatures. The sulfurization was performed in a chemical vapour deposition system at 400 ºC, 500 ºC, 550 ºC, 600 ºC and 750 ºC. Below 500 ºC XPS showed that the tungsten layer was oxidized (W6+) and only carbon-sulfur compounds were detected. On the other hand, from 600 ºC the sulfurization process was complete by forming WS2, while at the intermediate temperature of 550 ºC the films were partially oxidized and partially sulfurized.UA Editora2019-12-18T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttps://doi.org/10.34624/nmse.v1i1.6757oai:proa.ua.pt:article/6757Nanomaterials Science & Engineering; Vol 1 No 1 (2019): Nanomaterials Science & Engineering; 6-9Journal of Nanomaterials Science and Nanotechnology; Vol. 1 Núm. 1 (2019): Nanomaterials Science & Engineering; 6-9Journal of Nanomaterials Science and Nanotechnology; Vol. 1 No 1 (2019): Nanomaterials Science & Engineering; 6-9Nanomaterials Science & Engineering; vol. 1 n.º 1 (2019): Nanomaterials Science & Engineering; 6-92184-70022184-7002reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAPenghttps://proa.ua.pt/index.php/nmse/article/view/6757https://doi.org/10.34624/nmse.v1i1.6757https://proa.ua.pt/index.php/nmse/article/view/6757/6881Copyright (c) 2019 Nanomaterials Science & Engineeringhttp://creativecommons.org/licenses/by-nc/4.0info:eu-repo/semantics/openAccessOtero-Irurueta, GonzaloHortigüela, María J.2022-09-06T02:15:14Zoai:proa.ua.pt:article/6757Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T15:47:51.259516Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv XPS study of the thermal vapour sulfurization of tungsten thin films
XPS study of the thermal vapour sulfurization of tungsten thin films
title XPS study of the thermal vapour sulfurization of tungsten thin films
spellingShingle XPS study of the thermal vapour sulfurization of tungsten thin films
Otero-Irurueta, Gonzalo
title_short XPS study of the thermal vapour sulfurization of tungsten thin films
title_full XPS study of the thermal vapour sulfurization of tungsten thin films
title_fullStr XPS study of the thermal vapour sulfurization of tungsten thin films
title_full_unstemmed XPS study of the thermal vapour sulfurization of tungsten thin films
title_sort XPS study of the thermal vapour sulfurization of tungsten thin films
author Otero-Irurueta, Gonzalo
author_facet Otero-Irurueta, Gonzalo
Hortigüela, María J.
author_role author
author2 Hortigüela, María J.
author2_role author
dc.contributor.author.fl_str_mv Otero-Irurueta, Gonzalo
Hortigüela, María J.
description Here we report the XPS spectra of thermally sulfurized tungsten thin films on SiO2 at different temperatures. The sulfurization was performed in a chemical vapour deposition system at 400 ºC, 500 ºC, 550 ºC, 600 ºC and 750 ºC. Below 500 ºC XPS showed that the tungsten layer was oxidized (W6+) and only carbon-sulfur compounds were detected. On the other hand, from 600 ºC the sulfurization process was complete by forming WS2, while at the intermediate temperature of 550 ºC the films were partially oxidized and partially sulfurized.
publishDate 2019
dc.date.none.fl_str_mv 2019-12-18T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv https://doi.org/10.34624/nmse.v1i1.6757
oai:proa.ua.pt:article/6757
url https://doi.org/10.34624/nmse.v1i1.6757
identifier_str_mv oai:proa.ua.pt:article/6757
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv https://proa.ua.pt/index.php/nmse/article/view/6757
https://doi.org/10.34624/nmse.v1i1.6757
https://proa.ua.pt/index.php/nmse/article/view/6757/6881
dc.rights.driver.fl_str_mv Copyright (c) 2019 Nanomaterials Science & Engineering
http://creativecommons.org/licenses/by-nc/4.0
info:eu-repo/semantics/openAccess
rights_invalid_str_mv Copyright (c) 2019 Nanomaterials Science & Engineering
http://creativecommons.org/licenses/by-nc/4.0
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv UA Editora
publisher.none.fl_str_mv UA Editora
dc.source.none.fl_str_mv Nanomaterials Science & Engineering; Vol 1 No 1 (2019): Nanomaterials Science & Engineering; 6-9
Journal of Nanomaterials Science and Nanotechnology; Vol. 1 Núm. 1 (2019): Nanomaterials Science & Engineering; 6-9
Journal of Nanomaterials Science and Nanotechnology; Vol. 1 No 1 (2019): Nanomaterials Science & Engineering; 6-9
Nanomaterials Science & Engineering; vol. 1 n.º 1 (2019): Nanomaterials Science & Engineering; 6-9
2184-7002
2184-7002
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