Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films

Detalhes bibliográficos
Autor(a) principal: Santos,Jonh Yago Erikson
Data de Publicação: 2021
Outros Autores: Terto,André Romão, Ramirez,Daniel Angel, Santos,Júlio César Valeriano dos, Brito,Beatriz dos Santos Silva, Sabino,Luís Fernando, Dias,Iago Lemos, Hübler,Roberto, Tentardini,Eduardo Kirinus
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Matéria (Rio de Janeiro. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762021000400350
Resumo: ABSTRACT Ta1-xZrxN thin films were deposited by reactive magnetron sputtering aiming to investigate the influence of zirconium addition on the microstructure, hardness and high temperature oxidation resistance of the coatings. GAXRD showed that all Ta1-xZrxN thin films maintained ZrN crystalline structure, forming a TaZrN solid solution. Zr incorporation did not alter hardness values of Ta1-xZrxN coatings, however, promoted significant improvements in the oxidation resistance when compared to pure TaN thin films.
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spelling Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin filmsThin filmsMagnetron sputteringTantalum nitrideNanohardnessHigh temperature oxidationABSTRACT Ta1-xZrxN thin films were deposited by reactive magnetron sputtering aiming to investigate the influence of zirconium addition on the microstructure, hardness and high temperature oxidation resistance of the coatings. GAXRD showed that all Ta1-xZrxN thin films maintained ZrN crystalline structure, forming a TaZrN solid solution. Zr incorporation did not alter hardness values of Ta1-xZrxN coatings, however, promoted significant improvements in the oxidation resistance when compared to pure TaN thin films.Laboratório de Hidrogênio, Coppe - Universidade Federal do Rio de Janeiroem cooperação com a Associação Brasileira do Hidrogênio, ABH22021-01-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762021000400350Matéria (Rio de Janeiro) v.26 n.4 2021reponame:Matéria (Rio de Janeiro. Online)instname:Matéria (Rio de Janeiro. Online)instacron:RLAM10.1590/s1517-707620210004.1311info:eu-repo/semantics/openAccessSantos,Jonh Yago EriksonTerto,André RomãoRamirez,Daniel AngelSantos,Júlio César Valeriano dosBrito,Beatriz dos Santos SilvaSabino,Luís FernandoDias,Iago LemosHübler,RobertoTentardini,Eduardo Kirinuseng2021-12-20T00:00:00Zoai:scielo:S1517-70762021000400350Revistahttp://www.materia.coppe.ufrj.br/https://old.scielo.br/oai/scielo-oai.php||materia@labh2.coppe.ufrj.br1517-70761517-7076opendoar:2021-12-20T00:00Matéria (Rio de Janeiro. Online) - Matéria (Rio de Janeiro. Online)false
dc.title.none.fl_str_mv Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films
title Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films
spellingShingle Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films
Santos,Jonh Yago Erikson
Thin films
Magnetron sputtering
Tantalum nitride
Nanohardness
High temperature oxidation
title_short Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films
title_full Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films
title_fullStr Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films
title_full_unstemmed Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films
title_sort Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films
author Santos,Jonh Yago Erikson
author_facet Santos,Jonh Yago Erikson
Terto,André Romão
Ramirez,Daniel Angel
Santos,Júlio César Valeriano dos
Brito,Beatriz dos Santos Silva
Sabino,Luís Fernando
Dias,Iago Lemos
Hübler,Roberto
Tentardini,Eduardo Kirinus
author_role author
author2 Terto,André Romão
Ramirez,Daniel Angel
Santos,Júlio César Valeriano dos
Brito,Beatriz dos Santos Silva
Sabino,Luís Fernando
Dias,Iago Lemos
Hübler,Roberto
Tentardini,Eduardo Kirinus
author2_role author
author
author
author
author
author
author
author
dc.contributor.author.fl_str_mv Santos,Jonh Yago Erikson
Terto,André Romão
Ramirez,Daniel Angel
Santos,Júlio César Valeriano dos
Brito,Beatriz dos Santos Silva
Sabino,Luís Fernando
Dias,Iago Lemos
Hübler,Roberto
Tentardini,Eduardo Kirinus
dc.subject.por.fl_str_mv Thin films
Magnetron sputtering
Tantalum nitride
Nanohardness
High temperature oxidation
topic Thin films
Magnetron sputtering
Tantalum nitride
Nanohardness
High temperature oxidation
description ABSTRACT Ta1-xZrxN thin films were deposited by reactive magnetron sputtering aiming to investigate the influence of zirconium addition on the microstructure, hardness and high temperature oxidation resistance of the coatings. GAXRD showed that all Ta1-xZrxN thin films maintained ZrN crystalline structure, forming a TaZrN solid solution. Zr incorporation did not alter hardness values of Ta1-xZrxN coatings, however, promoted significant improvements in the oxidation resistance when compared to pure TaN thin films.
publishDate 2021
dc.date.none.fl_str_mv 2021-01-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762021000400350
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762021000400350
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/s1517-707620210004.1311
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv Laboratório de Hidrogênio, Coppe - Universidade Federal do Rio de Janeiro
em cooperação com a Associação Brasileira do Hidrogênio, ABH2
publisher.none.fl_str_mv Laboratório de Hidrogênio, Coppe - Universidade Federal do Rio de Janeiro
em cooperação com a Associação Brasileira do Hidrogênio, ABH2
dc.source.none.fl_str_mv Matéria (Rio de Janeiro) v.26 n.4 2021
reponame:Matéria (Rio de Janeiro. Online)
instname:Matéria (Rio de Janeiro. Online)
instacron:RLAM
instname_str Matéria (Rio de Janeiro. Online)
instacron_str RLAM
institution RLAM
reponame_str Matéria (Rio de Janeiro. Online)
collection Matéria (Rio de Janeiro. Online)
repository.name.fl_str_mv Matéria (Rio de Janeiro. Online) - Matéria (Rio de Janeiro. Online)
repository.mail.fl_str_mv ||materia@labh2.coppe.ufrj.br
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