Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition

Detalhes bibliográficos
Autor(a) principal: Riascos,H.
Data de Publicação: 2004
Outros Autores: Zambrano,G., Prieto,P.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Brazilian Journal of Physics
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332004000800014
Resumo: An in situ Optical Emission Spectroscopy (OES) characterization was performed on Pulsed-Laser Ablation (PLA) process used for fullerene-like CNx thin film deposition at nitrogen pressures within the 5 - 100 mTorr range. Plumes were generated by ablation of pyrolytic graphite (99.99%) target using a (500 mJ, 7 ns, 1064 nm) Nd: YAG-pulsed laser. The spectra from the plume show, essentially, the presence of the band heads of CN Violet vibrational/rotational B²sigma+ - X²sigma+ system and the characteristic C2 emission lines, belonging to the Swan A³pig - X'3piu system. These excited CN and C2 molecules were generated by laser ablation and by collisions of the plume with the substrate surface. Their vibrational temperatures were strongly dependent on nitrogen pressure during the deposition process and presented a decrease between 2.64 and 1.23 eV, as pressure increased from 5 to 100 mTorr. Synthesis of fullerene-like structures required high molecular temperatures at the condensation surface. High concentrations of CN radicals in the plasma promoted nitrogen incorporation into the films. The OES plasma characterization allowed for a correlation of the concentration and vibrational temperatures of CN and C2 species present in the plasma with the fullerene-like CNx film composition and bonding, determined by XPS, IR, and Raman spectroscopy.
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spelling Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film depositionAn in situ Optical Emission Spectroscopy (OES) characterization was performed on Pulsed-Laser Ablation (PLA) process used for fullerene-like CNx thin film deposition at nitrogen pressures within the 5 - 100 mTorr range. Plumes were generated by ablation of pyrolytic graphite (99.99%) target using a (500 mJ, 7 ns, 1064 nm) Nd: YAG-pulsed laser. The spectra from the plume show, essentially, the presence of the band heads of CN Violet vibrational/rotational B²sigma+ - X²sigma+ system and the characteristic C2 emission lines, belonging to the Swan A³pig - X'3piu system. These excited CN and C2 molecules were generated by laser ablation and by collisions of the plume with the substrate surface. Their vibrational temperatures were strongly dependent on nitrogen pressure during the deposition process and presented a decrease between 2.64 and 1.23 eV, as pressure increased from 5 to 100 mTorr. Synthesis of fullerene-like structures required high molecular temperatures at the condensation surface. High concentrations of CN radicals in the plasma promoted nitrogen incorporation into the films. The OES plasma characterization allowed for a correlation of the concentration and vibrational temperatures of CN and C2 species present in the plasma with the fullerene-like CNx film composition and bonding, determined by XPS, IR, and Raman spectroscopy.Sociedade Brasileira de Física2004-12-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332004000800014Brazilian Journal of Physics v.34 n.4b 2004reponame:Brazilian Journal of Physicsinstname:Sociedade Brasileira de Física (SBF)instacron:SBF10.1590/S0103-97332004000800014info:eu-repo/semantics/openAccessRiascos,H.Zambrano,G.Prieto,P.eng2005-03-01T00:00:00Zoai:scielo:S0103-97332004000800014Revistahttp://www.sbfisica.org.br/v1/home/index.php/pt/ONGhttps://old.scielo.br/oai/scielo-oai.phpsbfisica@sbfisica.org.br||sbfisica@sbfisica.org.br1678-44480103-9733opendoar:2005-03-01T00:00Brazilian Journal of Physics - Sociedade Brasileira de Física (SBF)false
dc.title.none.fl_str_mv Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition
title Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition
spellingShingle Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition
Riascos,H.
title_short Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition
title_full Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition
title_fullStr Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition
title_full_unstemmed Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition
title_sort Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition
author Riascos,H.
author_facet Riascos,H.
Zambrano,G.
Prieto,P.
author_role author
author2 Zambrano,G.
Prieto,P.
author2_role author
author
dc.contributor.author.fl_str_mv Riascos,H.
Zambrano,G.
Prieto,P.
description An in situ Optical Emission Spectroscopy (OES) characterization was performed on Pulsed-Laser Ablation (PLA) process used for fullerene-like CNx thin film deposition at nitrogen pressures within the 5 - 100 mTorr range. Plumes were generated by ablation of pyrolytic graphite (99.99%) target using a (500 mJ, 7 ns, 1064 nm) Nd: YAG-pulsed laser. The spectra from the plume show, essentially, the presence of the band heads of CN Violet vibrational/rotational B²sigma+ - X²sigma+ system and the characteristic C2 emission lines, belonging to the Swan A³pig - X'3piu system. These excited CN and C2 molecules were generated by laser ablation and by collisions of the plume with the substrate surface. Their vibrational temperatures were strongly dependent on nitrogen pressure during the deposition process and presented a decrease between 2.64 and 1.23 eV, as pressure increased from 5 to 100 mTorr. Synthesis of fullerene-like structures required high molecular temperatures at the condensation surface. High concentrations of CN radicals in the plasma promoted nitrogen incorporation into the films. The OES plasma characterization allowed for a correlation of the concentration and vibrational temperatures of CN and C2 species present in the plasma with the fullerene-like CNx film composition and bonding, determined by XPS, IR, and Raman spectroscopy.
publishDate 2004
dc.date.none.fl_str_mv 2004-12-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332004000800014
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332004000800014
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/S0103-97332004000800014
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv Sociedade Brasileira de Física
publisher.none.fl_str_mv Sociedade Brasileira de Física
dc.source.none.fl_str_mv Brazilian Journal of Physics v.34 n.4b 2004
reponame:Brazilian Journal of Physics
instname:Sociedade Brasileira de Física (SBF)
instacron:SBF
instname_str Sociedade Brasileira de Física (SBF)
instacron_str SBF
institution SBF
reponame_str Brazilian Journal of Physics
collection Brazilian Journal of Physics
repository.name.fl_str_mv Brazilian Journal of Physics - Sociedade Brasileira de Física (SBF)
repository.mail.fl_str_mv sbfisica@sbfisica.org.br||sbfisica@sbfisica.org.br
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