Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition
Autor(a) principal: | |
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Data de Publicação: | 2004 |
Outros Autores: | , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Brazilian Journal of Physics |
Texto Completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332004000800014 |
Resumo: | An in situ Optical Emission Spectroscopy (OES) characterization was performed on Pulsed-Laser Ablation (PLA) process used for fullerene-like CNx thin film deposition at nitrogen pressures within the 5 - 100 mTorr range. Plumes were generated by ablation of pyrolytic graphite (99.99%) target using a (500 mJ, 7 ns, 1064 nm) Nd: YAG-pulsed laser. The spectra from the plume show, essentially, the presence of the band heads of CN Violet vibrational/rotational B²sigma+ - X²sigma+ system and the characteristic C2 emission lines, belonging to the Swan A³pig - X'3piu system. These excited CN and C2 molecules were generated by laser ablation and by collisions of the plume with the substrate surface. Their vibrational temperatures were strongly dependent on nitrogen pressure during the deposition process and presented a decrease between 2.64 and 1.23 eV, as pressure increased from 5 to 100 mTorr. Synthesis of fullerene-like structures required high molecular temperatures at the condensation surface. High concentrations of CN radicals in the plasma promoted nitrogen incorporation into the films. The OES plasma characterization allowed for a correlation of the concentration and vibrational temperatures of CN and C2 species present in the plasma with the fullerene-like CNx film composition and bonding, determined by XPS, IR, and Raman spectroscopy. |
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Brazilian Journal of Physics |
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Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film depositionAn in situ Optical Emission Spectroscopy (OES) characterization was performed on Pulsed-Laser Ablation (PLA) process used for fullerene-like CNx thin film deposition at nitrogen pressures within the 5 - 100 mTorr range. Plumes were generated by ablation of pyrolytic graphite (99.99%) target using a (500 mJ, 7 ns, 1064 nm) Nd: YAG-pulsed laser. The spectra from the plume show, essentially, the presence of the band heads of CN Violet vibrational/rotational B²sigma+ - X²sigma+ system and the characteristic C2 emission lines, belonging to the Swan A³pig - X'3piu system. These excited CN and C2 molecules were generated by laser ablation and by collisions of the plume with the substrate surface. Their vibrational temperatures were strongly dependent on nitrogen pressure during the deposition process and presented a decrease between 2.64 and 1.23 eV, as pressure increased from 5 to 100 mTorr. Synthesis of fullerene-like structures required high molecular temperatures at the condensation surface. High concentrations of CN radicals in the plasma promoted nitrogen incorporation into the films. The OES plasma characterization allowed for a correlation of the concentration and vibrational temperatures of CN and C2 species present in the plasma with the fullerene-like CNx film composition and bonding, determined by XPS, IR, and Raman spectroscopy.Sociedade Brasileira de Física2004-12-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332004000800014Brazilian Journal of Physics v.34 n.4b 2004reponame:Brazilian Journal of Physicsinstname:Sociedade Brasileira de Física (SBF)instacron:SBF10.1590/S0103-97332004000800014info:eu-repo/semantics/openAccessRiascos,H.Zambrano,G.Prieto,P.eng2005-03-01T00:00:00Zoai:scielo:S0103-97332004000800014Revistahttp://www.sbfisica.org.br/v1/home/index.php/pt/ONGhttps://old.scielo.br/oai/scielo-oai.phpsbfisica@sbfisica.org.br||sbfisica@sbfisica.org.br1678-44480103-9733opendoar:2005-03-01T00:00Brazilian Journal of Physics - Sociedade Brasileira de Física (SBF)false |
dc.title.none.fl_str_mv |
Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition |
title |
Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition |
spellingShingle |
Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition Riascos,H. |
title_short |
Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition |
title_full |
Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition |
title_fullStr |
Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition |
title_full_unstemmed |
Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition |
title_sort |
Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition |
author |
Riascos,H. |
author_facet |
Riascos,H. Zambrano,G. Prieto,P. |
author_role |
author |
author2 |
Zambrano,G. Prieto,P. |
author2_role |
author author |
dc.contributor.author.fl_str_mv |
Riascos,H. Zambrano,G. Prieto,P. |
description |
An in situ Optical Emission Spectroscopy (OES) characterization was performed on Pulsed-Laser Ablation (PLA) process used for fullerene-like CNx thin film deposition at nitrogen pressures within the 5 - 100 mTorr range. Plumes were generated by ablation of pyrolytic graphite (99.99%) target using a (500 mJ, 7 ns, 1064 nm) Nd: YAG-pulsed laser. The spectra from the plume show, essentially, the presence of the band heads of CN Violet vibrational/rotational B²sigma+ - X²sigma+ system and the characteristic C2 emission lines, belonging to the Swan A³pig - X'3piu system. These excited CN and C2 molecules were generated by laser ablation and by collisions of the plume with the substrate surface. Their vibrational temperatures were strongly dependent on nitrogen pressure during the deposition process and presented a decrease between 2.64 and 1.23 eV, as pressure increased from 5 to 100 mTorr. Synthesis of fullerene-like structures required high molecular temperatures at the condensation surface. High concentrations of CN radicals in the plasma promoted nitrogen incorporation into the films. The OES plasma characterization allowed for a correlation of the concentration and vibrational temperatures of CN and C2 species present in the plasma with the fullerene-like CNx film composition and bonding, determined by XPS, IR, and Raman spectroscopy. |
publishDate |
2004 |
dc.date.none.fl_str_mv |
2004-12-01 |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332004000800014 |
url |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332004000800014 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1590/S0103-97332004000800014 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
text/html |
dc.publisher.none.fl_str_mv |
Sociedade Brasileira de Física |
publisher.none.fl_str_mv |
Sociedade Brasileira de Física |
dc.source.none.fl_str_mv |
Brazilian Journal of Physics v.34 n.4b 2004 reponame:Brazilian Journal of Physics instname:Sociedade Brasileira de Física (SBF) instacron:SBF |
instname_str |
Sociedade Brasileira de Física (SBF) |
instacron_str |
SBF |
institution |
SBF |
reponame_str |
Brazilian Journal of Physics |
collection |
Brazilian Journal of Physics |
repository.name.fl_str_mv |
Brazilian Journal of Physics - Sociedade Brasileira de Física (SBF) |
repository.mail.fl_str_mv |
sbfisica@sbfisica.org.br||sbfisica@sbfisica.org.br |
_version_ |
1754734861597278208 |