Cuticle of 'Gala' and 'Galaxy' apples cultivars under different environmental conditions

Detalhes bibliográficos
Autor(a) principal: Tessmer,Magda Andréia
Data de Publicação: 2012
Outros Autores: Antoniolli,Lucimara Rogéria, Appezzato-da-Glória,Beatriz
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Brazilian Archives of Biology and Technology
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-89132012000500010
Resumo: This study aimed to analyze the cuticle thickness and pattern of epicuticular wax deposition in 'Gala' and 'Galaxy' apple cultivars (Malus domestica Borkh,) from three Brazilian producing areas: Vacaria (RS), Fraiburgo (SC) and São Joaquim (SC) with altitudes of 971, 1,048 and 1,353m, respectively. Harvested fruit were kept under two storage conditions: regular atmosphere (RA) (0 ºC and 90% RH) and controlled atmosphere (CA) (1.5% O2, 2.5% CO2, 0ºC and 90% RH). Cuticle thickness measurements were made using LM and the deposition pattern of epicuticular wax observed with a SEM. Altitude among the apple producing areas was not a factor in deposition pattern of waxes between the cultivars but at higher altitudes, the cuticle was thicker in both the cultivars. In the freshly-harvested fruits, waxes deposition in the form of platelets and the mechanism of “tear and repair” were observed. Severity of microcracks in the cuticle was more evident on the fruits from CA.
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spelling Cuticle of 'Gala' and 'Galaxy' apples cultivars under different environmental conditionsMalus domestica Borkhaltitudecold storagecontrolled atmospherelight microscopeThis study aimed to analyze the cuticle thickness and pattern of epicuticular wax deposition in 'Gala' and 'Galaxy' apple cultivars (Malus domestica Borkh,) from three Brazilian producing areas: Vacaria (RS), Fraiburgo (SC) and São Joaquim (SC) with altitudes of 971, 1,048 and 1,353m, respectively. Harvested fruit were kept under two storage conditions: regular atmosphere (RA) (0 ºC and 90% RH) and controlled atmosphere (CA) (1.5% O2, 2.5% CO2, 0ºC and 90% RH). Cuticle thickness measurements were made using LM and the deposition pattern of epicuticular wax observed with a SEM. Altitude among the apple producing areas was not a factor in deposition pattern of waxes between the cultivars but at higher altitudes, the cuticle was thicker in both the cultivars. In the freshly-harvested fruits, waxes deposition in the form of platelets and the mechanism of “tear and repair” were observed. Severity of microcracks in the cuticle was more evident on the fruits from CA.Instituto de Tecnologia do Paraná - Tecpar2012-10-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-89132012000500010Brazilian Archives of Biology and Technology v.55 n.5 2012reponame:Brazilian Archives of Biology and Technologyinstname:Instituto de Tecnologia do Paraná (Tecpar)instacron:TECPAR10.1590/S1516-89132012000500010info:eu-repo/semantics/openAccessTessmer,Magda AndréiaAntoniolli,Lucimara RogériaAppezzato-da-Glória,Beatrizeng2012-10-09T00:00:00Zoai:scielo:S1516-89132012000500010Revistahttps://www.scielo.br/j/babt/https://old.scielo.br/oai/scielo-oai.phpbabt@tecpar.br||babt@tecpar.br1678-43241516-8913opendoar:2012-10-09T00:00Brazilian Archives of Biology and Technology - Instituto de Tecnologia do Paraná (Tecpar)false
dc.title.none.fl_str_mv Cuticle of 'Gala' and 'Galaxy' apples cultivars under different environmental conditions
title Cuticle of 'Gala' and 'Galaxy' apples cultivars under different environmental conditions
spellingShingle Cuticle of 'Gala' and 'Galaxy' apples cultivars under different environmental conditions
Tessmer,Magda Andréia
Malus domestica Borkh
altitude
cold storage
controlled atmosphere
light microscope
title_short Cuticle of 'Gala' and 'Galaxy' apples cultivars under different environmental conditions
title_full Cuticle of 'Gala' and 'Galaxy' apples cultivars under different environmental conditions
title_fullStr Cuticle of 'Gala' and 'Galaxy' apples cultivars under different environmental conditions
title_full_unstemmed Cuticle of 'Gala' and 'Galaxy' apples cultivars under different environmental conditions
title_sort Cuticle of 'Gala' and 'Galaxy' apples cultivars under different environmental conditions
author Tessmer,Magda Andréia
author_facet Tessmer,Magda Andréia
Antoniolli,Lucimara Rogéria
Appezzato-da-Glória,Beatriz
author_role author
author2 Antoniolli,Lucimara Rogéria
Appezzato-da-Glória,Beatriz
author2_role author
author
dc.contributor.author.fl_str_mv Tessmer,Magda Andréia
Antoniolli,Lucimara Rogéria
Appezzato-da-Glória,Beatriz
dc.subject.por.fl_str_mv Malus domestica Borkh
altitude
cold storage
controlled atmosphere
light microscope
topic Malus domestica Borkh
altitude
cold storage
controlled atmosphere
light microscope
description This study aimed to analyze the cuticle thickness and pattern of epicuticular wax deposition in 'Gala' and 'Galaxy' apple cultivars (Malus domestica Borkh,) from three Brazilian producing areas: Vacaria (RS), Fraiburgo (SC) and São Joaquim (SC) with altitudes of 971, 1,048 and 1,353m, respectively. Harvested fruit were kept under two storage conditions: regular atmosphere (RA) (0 ºC and 90% RH) and controlled atmosphere (CA) (1.5% O2, 2.5% CO2, 0ºC and 90% RH). Cuticle thickness measurements were made using LM and the deposition pattern of epicuticular wax observed with a SEM. Altitude among the apple producing areas was not a factor in deposition pattern of waxes between the cultivars but at higher altitudes, the cuticle was thicker in both the cultivars. In the freshly-harvested fruits, waxes deposition in the form of platelets and the mechanism of “tear and repair” were observed. Severity of microcracks in the cuticle was more evident on the fruits from CA.
publishDate 2012
dc.date.none.fl_str_mv 2012-10-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-89132012000500010
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-89132012000500010
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/S1516-89132012000500010
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv Instituto de Tecnologia do Paraná - Tecpar
publisher.none.fl_str_mv Instituto de Tecnologia do Paraná - Tecpar
dc.source.none.fl_str_mv Brazilian Archives of Biology and Technology v.55 n.5 2012
reponame:Brazilian Archives of Biology and Technology
instname:Instituto de Tecnologia do Paraná (Tecpar)
instacron:TECPAR
instname_str Instituto de Tecnologia do Paraná (Tecpar)
instacron_str TECPAR
institution TECPAR
reponame_str Brazilian Archives of Biology and Technology
collection Brazilian Archives of Biology and Technology
repository.name.fl_str_mv Brazilian Archives of Biology and Technology - Instituto de Tecnologia do Paraná (Tecpar)
repository.mail.fl_str_mv babt@tecpar.br||babt@tecpar.br
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