Thin film deposition with time-varying temperature

Detalhes bibliográficos
Autor(a) principal: Assis, Thiago Albuquerque de
Data de Publicação: 2013
Outros Autores: Reis, F. D. A. Aarão
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFBA
Texto Completo: http://repositorio.ufba.br/ri/handle/ri/15019
Resumo: Texto completo: acesso restrito. p. 1-19
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spelling Assis, Thiago Albuquerque deReis, F. D. A. AarãoAssis, Thiago Albuquerque deReis, F. D. A. Aarão2014-05-26T13:51:27Z20131742-5468http://repositorio.ufba.br/ri/handle/ri/15019Texto completo: acesso restrito. p. 1-19We study the effects of time-dependent substrate/film temperature in the deposition of a mesoscopically thick film using a statistical model that accounts for diffusion of adatoms without lateral neighbors whose coefficients depend on an activation energy and temperature. Dynamic scaling with fixed temperature is extended to predict conditions in which the temperature variation significantly affects surface roughness scaling. It agrees with computer simulation results for deposition of up to 104 atomic layers and maximal temperature changes of 30 K, near or below room temperature. If the temperature decreases during the growth, the global roughness may have a rapid growth, with effective exponents larger than 1/2 due to the time-decreasing adatom mobility. The local roughness in small box size shows typical evidence of anomalous scaling, with anomaly exponents depending on the particular form of temperature decrease. If the temperature increases during the growth, a non-monotonic evolution of the global roughness may be observed, which is explained by the competition of kinetic roughening and the smoothing effect of increasing diffusion lengths. The extension of the theoretical approach to film deposition with other activation energy barriers shows that similar conditions on temperature variation may lead to the same morphological features. Equivalent results may also be observed by controlling the deposition flux.Submitted by Suelen Reis (suziy.ellen@gmail.com) on 2014-04-24T13:25:37Z No. of bitstreams: 1 1742-5468_2013_10_P10008.pdf: 1541353 bytes, checksum: eab8f746be2f308fadc90f5477cb2c20 (MD5)Approved for entry into archive by Alda Lima da Silva (sivalda@ufba.br) on 2014-05-26T13:51:27Z (GMT) No. of bitstreams: 1 1742-5468_2013_10_P10008.pdf: 1541353 bytes, checksum: eab8f746be2f308fadc90f5477cb2c20 (MD5)Made available in DSpace on 2014-05-26T13:51:27Z (GMT). No. of bitstreams: 1 1742-5468_2013_10_P10008.pdf: 1541353 bytes, checksum: eab8f746be2f308fadc90f5477cb2c20 (MD5) Previous issue date: 2013http://dx.doi.org/10.1088/1742-5468/2013/10/P10008reponame:Repositório Institucional da UFBAinstname:Universidade Federal da Bahia (UFBA)instacron:UFBAChemical vapor deposition (theory)Kinetic roughening (theory)Surface di usion (theory)Thin lm deposition (theory)Thin film deposition with time-varying temperatureJournal of Statistical Mechanics: Theory and Experimentinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article10000-01-01info:eu-repo/semantics/openAccessengORIGINAL1742-5468_2013_10_P10008.pdf1742-5468_2013_10_P10008.pdfapplication/pdf1541353https://repositorio.ufba.br/bitstream/ri/15019/1/1742-5468_2013_10_P10008.pdfeab8f746be2f308fadc90f5477cb2c20MD51LICENSElicense.txtlicense.txttext/plain1345https://repositorio.ufba.br/bitstream/ri/15019/2/license.txt0d4b811ef71182510d2015daa7c8a900MD52TEXT1742-5468_2013_10_P10008.pdf.txt1742-5468_2013_10_P10008.pdf.txtExtracted texttext/plain47069https://repositorio.ufba.br/bitstream/ri/15019/3/1742-5468_2013_10_P10008.pdf.txtbadd05f7f0d56eafab5822c8334911d9MD53ri/150192022-07-05 14:03:48.989oai:repositorio.ufba.br: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Repositório InstitucionalPUBhttp://192.188.11.11:8080/oai/requestopendoar:19322022-07-05T17:03:48Repositório Institucional da UFBA - Universidade Federal da Bahia (UFBA)false
dc.title.pt_BR.fl_str_mv Thin film deposition with time-varying temperature
dc.title.alternative.pt_BR.fl_str_mv Journal of Statistical Mechanics: Theory and Experiment
title Thin film deposition with time-varying temperature
spellingShingle Thin film deposition with time-varying temperature
Assis, Thiago Albuquerque de
Chemical vapor deposition (theory)
Kinetic roughening (theory)
Surface di usion (theory)
Thin lm deposition (theory)
title_short Thin film deposition with time-varying temperature
title_full Thin film deposition with time-varying temperature
title_fullStr Thin film deposition with time-varying temperature
title_full_unstemmed Thin film deposition with time-varying temperature
title_sort Thin film deposition with time-varying temperature
author Assis, Thiago Albuquerque de
author_facet Assis, Thiago Albuquerque de
Reis, F. D. A. Aarão
author_role author
author2 Reis, F. D. A. Aarão
author2_role author
dc.contributor.author.fl_str_mv Assis, Thiago Albuquerque de
Reis, F. D. A. Aarão
Assis, Thiago Albuquerque de
Reis, F. D. A. Aarão
dc.subject.por.fl_str_mv Chemical vapor deposition (theory)
Kinetic roughening (theory)
Surface di usion (theory)
Thin lm deposition (theory)
topic Chemical vapor deposition (theory)
Kinetic roughening (theory)
Surface di usion (theory)
Thin lm deposition (theory)
description Texto completo: acesso restrito. p. 1-19
publishDate 2013
dc.date.issued.fl_str_mv 2013
dc.date.accessioned.fl_str_mv 2014-05-26T13:51:27Z
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dc.identifier.issn.none.fl_str_mv 1742-5468
identifier_str_mv 1742-5468
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language eng
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