Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas

Detalhes bibliográficos
Autor(a) principal: Borges, Bruno Gabriel Alves Leite
Data de Publicação: 2012
Outros Autores: Rocco, Maria Luiza Miranda, Pinho, Roberto Rosas, Lima, Carlos Raimundo
Tipo de documento: Artigo
Idioma: por
Título da fonte: Repositório Institucional da UFJF
Texto Completo: http://dx.doi.org/10.1590/S0100-40422012000200016
https://repositorio.ufjf.br/jspui/handle/ufjf/8306
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spelling 2018-12-18T13:05:10Z2018-12-182018-12-18T13:05:10Z2012352319322http://dx.doi.org/10.1590/S0100-40422012000200016https://repositorio.ufjf.br/jspui/handle/ufjf/8306-Positive photoresists are widely used in lithographic process in microelectronics and in optics for the fabrication of relief components. With the aim of identifying molecular modifications among positive photoresists unexposed and previously exposed to ultraviolet light the electron stimulated ion desorption technique coupled to time-of-flight mass spectrometry was employed in the study of the AZ-1518 photoresist. Mass spectra were obtained as a function of the electron beam energy, showing specific changes related to the photochemical decomposition of the photoresist. This reinforces the applicability of the technique to investigate and characterize structural changes in photosensitive materials.por--BrasilQuímica Nova-AZ-1518 photoresistPhotolysisTime-of-flight mass spectrometryEstudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivasPhotodecomposition by ultraviolet exposure of positive photoresistsinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleBorges, Bruno Gabriel Alves LeiteRocco, Maria Luiza MirandaPinho, Roberto RosasLima, Carlos Raimundoinfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFJFinstname:Universidade Federal de Juiz de Fora (UFJF)instacron:UFJFTHUMBNAILEstudo da decomposição fotoquímica por exposição à luz.pdf.jpgEstudo da decomposição fotoquímica por exposição à luz.pdf.jpgGenerated Thumbnailimage/jpeg1642https://repositorio.ufjf.br/jspui/bitstream/ufjf/8306/4/Estudo%20da%20decomposi%c3%a7%c3%a3o%20fotoqu%c3%admica%20por%20exposi%c3%a7%c3%a3o%20%c3%a0%20luz.pdf.jpg91eb1ccaa710a4de5e29a618ed10ef1cMD54ORIGINALEstudo da decomposição fotoquímica por exposição à luz.pdfEstudo da decomposição fotoquímica por exposição à luz.pdfapplication/pdf395516https://repositorio.ufjf.br/jspui/bitstream/ufjf/8306/1/Estudo%20da%20decomposi%c3%a7%c3%a3o%20fotoqu%c3%admica%20por%20exposi%c3%a7%c3%a3o%20%c3%a0%20luz.pdfe0f0d76855c69197d73471b89bc8d3e8MD51LICENSElicense.txtlicense.txttext/plain; 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dc.title.pt_BR.fl_str_mv Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
dc.title.alternative.pt_BR.fl_str_mv Photodecomposition by ultraviolet exposure of positive photoresists
title Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
spellingShingle Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
Borges, Bruno Gabriel Alves Leite
-
AZ-1518 photoresist
Photolysis
Time-of-flight mass spectrometry
title_short Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
title_full Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
title_fullStr Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
title_full_unstemmed Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
title_sort Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
author Borges, Bruno Gabriel Alves Leite
author_facet Borges, Bruno Gabriel Alves Leite
Rocco, Maria Luiza Miranda
Pinho, Roberto Rosas
Lima, Carlos Raimundo
author_role author
author2 Rocco, Maria Luiza Miranda
Pinho, Roberto Rosas
Lima, Carlos Raimundo
author2_role author
author
author
dc.contributor.author.fl_str_mv Borges, Bruno Gabriel Alves Leite
Rocco, Maria Luiza Miranda
Pinho, Roberto Rosas
Lima, Carlos Raimundo
dc.subject.cnpq.fl_str_mv -
topic -
AZ-1518 photoresist
Photolysis
Time-of-flight mass spectrometry
dc.subject.por.fl_str_mv AZ-1518 photoresist
Photolysis
Time-of-flight mass spectrometry
description -
publishDate 2012
dc.date.issued.fl_str_mv 2012
dc.date.accessioned.fl_str_mv 2018-12-18T13:05:10Z
dc.date.available.fl_str_mv 2018-12-18
2018-12-18T13:05:10Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
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status_str publishedVersion
dc.identifier.uri.fl_str_mv https://repositorio.ufjf.br/jspui/handle/ufjf/8306
dc.identifier.doi.pt_BR.fl_str_mv http://dx.doi.org/10.1590/S0100-40422012000200016
url http://dx.doi.org/10.1590/S0100-40422012000200016
https://repositorio.ufjf.br/jspui/handle/ufjf/8306
dc.language.iso.fl_str_mv por
language por
dc.relation.ispartof.pt_BR.fl_str_mv Química Nova
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.publisher.none.fl_str_mv -
dc.publisher.initials.fl_str_mv -
dc.publisher.country.fl_str_mv Brasil
publisher.none.fl_str_mv -
dc.source.none.fl_str_mv reponame:Repositório Institucional da UFJF
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