Submicron fabrication by local anodic oxidation of germanium thin films
Autor(a) principal: | |
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Data de Publicação: | 2009 |
Outros Autores: | , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UFRN |
Texto Completo: | https://repositorio.ufrn.br/jspui/handle/123456789/28845 |
Resumo: | Here we describe a lithography scheme based on the local anodic oxidation of germanium film by a scanning atomic force microscope in a humidity-controlled atmosphere. The oxidation kinetics of the Ge film were investigated by a tapping mode, in which a pulsed bias voltage was synchronized and applied with the resonance frequency of the cantilever, and by a contact mode, in which a continuous voltage was applied. In the tapping mode we clearly identified two regimes of oxidation as a function of the applied voltage: the trench width increased linearly during the vertical growth and increased exponentially during the lateral growth. Both regimes of growth were interpreted taking into consideration the Cabrera–Mott mechanism of oxidation applied to the oxide/Ge interface. We also show the feasibility of the bottom-up fabrication process presented in this work by showing a Cu nanowire fabricated on top of a silicon substrate. |
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Oliveira, Alexandre Barbosa deRibeiro, Gilberto MedeirosCosta, Antonio Azevedo da2020-04-29T21:39:45Z2020-04-29T21:39:45Z2009-08-04OLIVEIRA, Alexandre Barbosa de; Medeiros-Ribeiro, G ; Azevedo, A. Submicron fabrication by local anodic oxidation of germanium thin films. Nanotechnology (Bristol), v. 20, p. 345301, 2009. ISSN 1742-6596 versão online. DOI https://doi.org/10.1088/0957-4484/20/34/345301. Disponível em: https://iopscience.iop.org/article/10.1088/0957-4484/20/34/345301. Acesso em: 29 abr. 2020.1742-6588 (print), 1742-6596 (online)https://repositorio.ufrn.br/jspui/handle/123456789/2884510.1088/0957-4484/20/34/345301IOP PUBLISHINGSubmicron fabricationAnodic oxidationGermanium thin filmsSubmicron fabrication by local anodic oxidation of germanium thin filmsinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleHere we describe a lithography scheme based on the local anodic oxidation of germanium film by a scanning atomic force microscope in a humidity-controlled atmosphere. The oxidation kinetics of the Ge film were investigated by a tapping mode, in which a pulsed bias voltage was synchronized and applied with the resonance frequency of the cantilever, and by a contact mode, in which a continuous voltage was applied. In the tapping mode we clearly identified two regimes of oxidation as a function of the applied voltage: the trench width increased linearly during the vertical growth and increased exponentially during the lateral growth. Both regimes of growth were interpreted taking into consideration the Cabrera–Mott mechanism of oxidation applied to the oxide/Ge interface. We also show the feasibility of the bottom-up fabrication process presented in this work by showing a Cu nanowire fabricated on top of a silicon substrate.engreponame:Repositório Institucional da UFRNinstname:Universidade Federal do Rio Grande do Norte (UFRN)instacron:UFRNinfo:eu-repo/semantics/openAccessLICENSElicense.txtlicense.txttext/plain; charset=utf-81484https://repositorio.ufrn.br/bitstream/123456789/28845/2/license.txte9597aa2854d128fd968be5edc8a28d9MD52TEXTSubmicron fabrication by local anodic oxidation of germanium thin films_oliveira_2009.pdf.txtSubmicron fabrication by local anodic oxidation of germanium thin films_oliveira_2009.pdf.txtExtracted texttext/plain26419https://repositorio.ufrn.br/bitstream/123456789/28845/3/Submicron%20fabrication%20by%20local%20anodic%20oxidation%20of%20germanium%20thin%20films_oliveira_2009.pdf.txtf62cd49787ac351959fa548a2f2ec39aMD53THUMBNAILSubmicron fabrication by local anodic oxidation of germanium thin films_oliveira_2009.pdf.jpgSubmicron fabrication by local anodic oxidation of germanium thin films_oliveira_2009.pdf.jpgGenerated Thumbnailimage/jpeg1374https://repositorio.ufrn.br/bitstream/123456789/28845/4/Submicron%20fabrication%20by%20local%20anodic%20oxidation%20of%20germanium%20thin%20films_oliveira_2009.pdf.jpgea7efa8c65d9a8438875db9f247373b9MD54123456789/288452022-10-20 17:53:13.651oai:https://repositorio.ufrn.br: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Repositório de PublicaçõesPUBhttp://repositorio.ufrn.br/oai/opendoar:2022-10-20T20:53:13Repositório Institucional da UFRN - Universidade Federal do Rio Grande do Norte (UFRN)false |
dc.title.pt_BR.fl_str_mv |
Submicron fabrication by local anodic oxidation of germanium thin films |
title |
Submicron fabrication by local anodic oxidation of germanium thin films |
spellingShingle |
Submicron fabrication by local anodic oxidation of germanium thin films Oliveira, Alexandre Barbosa de Submicron fabrication Anodic oxidation Germanium thin films |
title_short |
Submicron fabrication by local anodic oxidation of germanium thin films |
title_full |
Submicron fabrication by local anodic oxidation of germanium thin films |
title_fullStr |
Submicron fabrication by local anodic oxidation of germanium thin films |
title_full_unstemmed |
Submicron fabrication by local anodic oxidation of germanium thin films |
title_sort |
Submicron fabrication by local anodic oxidation of germanium thin films |
author |
Oliveira, Alexandre Barbosa de |
author_facet |
Oliveira, Alexandre Barbosa de Ribeiro, Gilberto Medeiros Costa, Antonio Azevedo da |
author_role |
author |
author2 |
Ribeiro, Gilberto Medeiros Costa, Antonio Azevedo da |
author2_role |
author author |
dc.contributor.author.fl_str_mv |
Oliveira, Alexandre Barbosa de Ribeiro, Gilberto Medeiros Costa, Antonio Azevedo da |
dc.subject.por.fl_str_mv |
Submicron fabrication Anodic oxidation Germanium thin films |
topic |
Submicron fabrication Anodic oxidation Germanium thin films |
description |
Here we describe a lithography scheme based on the local anodic oxidation of germanium film by a scanning atomic force microscope in a humidity-controlled atmosphere. The oxidation kinetics of the Ge film were investigated by a tapping mode, in which a pulsed bias voltage was synchronized and applied with the resonance frequency of the cantilever, and by a contact mode, in which a continuous voltage was applied. In the tapping mode we clearly identified two regimes of oxidation as a function of the applied voltage: the trench width increased linearly during the vertical growth and increased exponentially during the lateral growth. Both regimes of growth were interpreted taking into consideration the Cabrera–Mott mechanism of oxidation applied to the oxide/Ge interface. We also show the feasibility of the bottom-up fabrication process presented in this work by showing a Cu nanowire fabricated on top of a silicon substrate. |
publishDate |
2009 |
dc.date.issued.fl_str_mv |
2009-08-04 |
dc.date.accessioned.fl_str_mv |
2020-04-29T21:39:45Z |
dc.date.available.fl_str_mv |
2020-04-29T21:39:45Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.citation.fl_str_mv |
OLIVEIRA, Alexandre Barbosa de; Medeiros-Ribeiro, G ; Azevedo, A. Submicron fabrication by local anodic oxidation of germanium thin films. Nanotechnology (Bristol), v. 20, p. 345301, 2009. ISSN 1742-6596 versão online. DOI https://doi.org/10.1088/0957-4484/20/34/345301. Disponível em: https://iopscience.iop.org/article/10.1088/0957-4484/20/34/345301. Acesso em: 29 abr. 2020. |
dc.identifier.uri.fl_str_mv |
https://repositorio.ufrn.br/jspui/handle/123456789/28845 |
dc.identifier.issn.none.fl_str_mv |
1742-6588 (print), 1742-6596 (online) |
dc.identifier.doi.none.fl_str_mv |
10.1088/0957-4484/20/34/345301 |
identifier_str_mv |
OLIVEIRA, Alexandre Barbosa de; Medeiros-Ribeiro, G ; Azevedo, A. Submicron fabrication by local anodic oxidation of germanium thin films. Nanotechnology (Bristol), v. 20, p. 345301, 2009. ISSN 1742-6596 versão online. DOI https://doi.org/10.1088/0957-4484/20/34/345301. Disponível em: https://iopscience.iop.org/article/10.1088/0957-4484/20/34/345301. Acesso em: 29 abr. 2020. 1742-6588 (print), 1742-6596 (online) 10.1088/0957-4484/20/34/345301 |
url |
https://repositorio.ufrn.br/jspui/handle/123456789/28845 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.publisher.none.fl_str_mv |
IOP PUBLISHING |
publisher.none.fl_str_mv |
IOP PUBLISHING |
dc.source.none.fl_str_mv |
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Universidade Federal do Rio Grande do Norte (UFRN) |
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UFRN |
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UFRN |
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Repositório Institucional da UFRN |
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Repositório Institucional da UFRN |
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