Device-based threading dislocation assessment in germanium hetero-epitaxy
Autor(a) principal: | |
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Data de Publicação: | 2019 |
Outros Autores: | , , , , , , , , , , , |
Tipo de documento: | Artigo de conferência |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1109/SBMicro.2019.8919472 http://hdl.handle.net/11449/198334 |
Resumo: | A review on the electrical activity of extended defects and, more specifically, threading dislocations in germanium hetero-epitaxial layers is reported here. Focus is on the impact of some basic types of devices, like a p-n junction diode, a Metal-Oxide-Semiconductor (MOS) capacitor and a Fin-Field-Effect Transistor (FinFET) fabricated in Ge-on-Si. A good understanding of the impact on the leakage current and lifetime in p-n diodes will be shown. Deep-Level Transient Spectroscopy on Ge MOScaps enables the investigation of bulk and interface states related to threading dislocations Finally, the application of Generation-Recombination (GR) noise spectroscopy to the study of GR centers in strained and relaxed Ge-on-Si FinFETs will be illustrated. |
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Device-based threading dislocation assessment in germanium hetero-epitaxyDeep-Level Transient SpectroscopyExtended DefectsFinFETsGeneration-Recombination noiseGermanium-on-siliconleakage currentMOScapp-n junction diodeThreading DislocationsA review on the electrical activity of extended defects and, more specifically, threading dislocations in germanium hetero-epitaxial layers is reported here. Focus is on the impact of some basic types of devices, like a p-n junction diode, a Metal-Oxide-Semiconductor (MOS) capacitor and a Fin-Field-Effect Transistor (FinFET) fabricated in Ge-on-Si. A good understanding of the impact on the leakage current and lifetime in p-n diodes will be shown. Deep-Level Transient Spectroscopy on Ge MOScaps enables the investigation of bulk and interface states related to threading dislocations Finally, the application of Generation-Recombination (GR) noise spectroscopy to the study of GR centers in strained and relaxed Ge-on-Si FinFETs will be illustrated.ImecKyushu UniversityEE Departm. KU LeuvenUTFPR Campus ToledoUNESP Sao Paulo State UniversityUniversity of Sao PauloUNESP Sao Paulo State UniversityImecKyushu UniversityKU LeuvenUTFPRUniversidade Estadual Paulista (Unesp)Universidade de São Paulo (USP)Simoen, EddyClaeys, CorOliveira, AlbertoAgopian, Paula [UNESP]Martino, JoaoHsu, BrentEneman, GeertRosseel, EricLoo, RogerArimura, HiroakiHoriguchi, NaotoWen, Wei-ChenNakashima, Hiroshi2020-12-12T01:10:00Z2020-12-12T01:10:00Z2019-08-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObjecthttp://dx.doi.org/10.1109/SBMicro.2019.8919472SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices.http://hdl.handle.net/11449/19833410.1109/SBMicro.2019.89194722-s2.0-85077205701Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengSBMicro 2019 - 34th Symposium on Microelectronics Technology and Devicesinfo:eu-repo/semantics/openAccess2021-10-23T10:10:59Zoai:repositorio.unesp.br:11449/198334Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462021-10-23T10:10:59Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Device-based threading dislocation assessment in germanium hetero-epitaxy |
title |
Device-based threading dislocation assessment in germanium hetero-epitaxy |
spellingShingle |
Device-based threading dislocation assessment in germanium hetero-epitaxy Simoen, Eddy Deep-Level Transient Spectroscopy Extended Defects FinFETs Generation-Recombination noise Germanium-on-silicon leakage current MOScap p-n junction diode Threading Dislocations |
title_short |
Device-based threading dislocation assessment in germanium hetero-epitaxy |
title_full |
Device-based threading dislocation assessment in germanium hetero-epitaxy |
title_fullStr |
Device-based threading dislocation assessment in germanium hetero-epitaxy |
title_full_unstemmed |
Device-based threading dislocation assessment in germanium hetero-epitaxy |
title_sort |
Device-based threading dislocation assessment in germanium hetero-epitaxy |
author |
Simoen, Eddy |
author_facet |
Simoen, Eddy Claeys, Cor Oliveira, Alberto Agopian, Paula [UNESP] Martino, Joao Hsu, Brent Eneman, Geert Rosseel, Eric Loo, Roger Arimura, Hiroaki Horiguchi, Naoto Wen, Wei-Chen Nakashima, Hiroshi |
author_role |
author |
author2 |
Claeys, Cor Oliveira, Alberto Agopian, Paula [UNESP] Martino, Joao Hsu, Brent Eneman, Geert Rosseel, Eric Loo, Roger Arimura, Hiroaki Horiguchi, Naoto Wen, Wei-Chen Nakashima, Hiroshi |
author2_role |
author author author author author author author author author author author author |
dc.contributor.none.fl_str_mv |
Imec Kyushu University KU Leuven UTFPR Universidade Estadual Paulista (Unesp) Universidade de São Paulo (USP) |
dc.contributor.author.fl_str_mv |
Simoen, Eddy Claeys, Cor Oliveira, Alberto Agopian, Paula [UNESP] Martino, Joao Hsu, Brent Eneman, Geert Rosseel, Eric Loo, Roger Arimura, Hiroaki Horiguchi, Naoto Wen, Wei-Chen Nakashima, Hiroshi |
dc.subject.por.fl_str_mv |
Deep-Level Transient Spectroscopy Extended Defects FinFETs Generation-Recombination noise Germanium-on-silicon leakage current MOScap p-n junction diode Threading Dislocations |
topic |
Deep-Level Transient Spectroscopy Extended Defects FinFETs Generation-Recombination noise Germanium-on-silicon leakage current MOScap p-n junction diode Threading Dislocations |
description |
A review on the electrical activity of extended defects and, more specifically, threading dislocations in germanium hetero-epitaxial layers is reported here. Focus is on the impact of some basic types of devices, like a p-n junction diode, a Metal-Oxide-Semiconductor (MOS) capacitor and a Fin-Field-Effect Transistor (FinFET) fabricated in Ge-on-Si. A good understanding of the impact on the leakage current and lifetime in p-n diodes will be shown. Deep-Level Transient Spectroscopy on Ge MOScaps enables the investigation of bulk and interface states related to threading dislocations Finally, the application of Generation-Recombination (GR) noise spectroscopy to the study of GR centers in strained and relaxed Ge-on-Si FinFETs will be illustrated. |
publishDate |
2019 |
dc.date.none.fl_str_mv |
2019-08-01 2020-12-12T01:10:00Z 2020-12-12T01:10:00Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/conferenceObject |
format |
conferenceObject |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1109/SBMicro.2019.8919472 SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices. http://hdl.handle.net/11449/198334 10.1109/SBMicro.2019.8919472 2-s2.0-85077205701 |
url |
http://dx.doi.org/10.1109/SBMicro.2019.8919472 http://hdl.handle.net/11449/198334 |
identifier_str_mv |
SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices. 10.1109/SBMicro.2019.8919472 2-s2.0-85077205701 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1803046941590814720 |