A negative-bias-temperature-instability study on omega-gate silicon nanowire SOI pMOSFETs
Autor(a) principal: | |
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Data de Publicação: | 2019 |
Outros Autores: | , , |
Tipo de documento: | Artigo de conferência |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1109/SBMicro.2019.8919276 http://hdl.handle.net/11449/198333 |
Resumo: | The Negative-Bias-Temperature-Instability (NBTI) is an important reliability parameter for advanced technology nodes. This work presents an experimental study of NBTI in omega-gate nanowire (NW) pMOSFET. The 3D-numerical simulations were performed in order to better understand the NBTI effect in NW transistors. The results shows that NBTI in NW is high (Δ VT≈200-300mV-for W = 10nm) due to the higher gate oxide electric field accelerating the NBTI effect providing a higher degradation. This study was performed for different channel widths and lengths. |
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Repositório Institucional da UNESP |
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spelling |
A negative-bias-temperature-instability study on omega-gate silicon nanowire SOI pMOSFETsMOSFETNBTINWSOIThe Negative-Bias-Temperature-Instability (NBTI) is an important reliability parameter for advanced technology nodes. This work presents an experimental study of NBTI in omega-gate nanowire (NW) pMOSFET. The 3D-numerical simulations were performed in order to better understand the NBTI effect in NW transistors. The results shows that NBTI in NW is high (Δ VT≈200-300mV-for W = 10nm) due to the higher gate oxide electric field accelerating the NBTI effect providing a higher degradation. This study was performed for different channel widths and lengths.University of Sao Paulo LSI/PSI/USPRio Grande Do sul Federal University UFRGSUNESP Sao Paulo State UniversityUNESP Sao Paulo State UniversityUniversidade de São Paulo (USP)UFRGSUniversidade Estadual Paulista (Unesp)Silva, Vanessa C. P.Wirth, Gilson I.Martino, Joao A.Agopian, Paula G. D. [UNESP]2020-12-12T01:09:54Z2020-12-12T01:09:54Z2019-08-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObjecthttp://dx.doi.org/10.1109/SBMicro.2019.8919276SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices.http://hdl.handle.net/11449/19833310.1109/SBMicro.2019.89192762-s2.0-85077200437Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengSBMicro 2019 - 34th Symposium on Microelectronics Technology and Devicesinfo:eu-repo/semantics/openAccess2021-10-23T10:02:24Zoai:repositorio.unesp.br:11449/198333Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T17:33:20.864965Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
A negative-bias-temperature-instability study on omega-gate silicon nanowire SOI pMOSFETs |
title |
A negative-bias-temperature-instability study on omega-gate silicon nanowire SOI pMOSFETs |
spellingShingle |
A negative-bias-temperature-instability study on omega-gate silicon nanowire SOI pMOSFETs Silva, Vanessa C. P. MOSFET NBTI NW SOI |
title_short |
A negative-bias-temperature-instability study on omega-gate silicon nanowire SOI pMOSFETs |
title_full |
A negative-bias-temperature-instability study on omega-gate silicon nanowire SOI pMOSFETs |
title_fullStr |
A negative-bias-temperature-instability study on omega-gate silicon nanowire SOI pMOSFETs |
title_full_unstemmed |
A negative-bias-temperature-instability study on omega-gate silicon nanowire SOI pMOSFETs |
title_sort |
A negative-bias-temperature-instability study on omega-gate silicon nanowire SOI pMOSFETs |
author |
Silva, Vanessa C. P. |
author_facet |
Silva, Vanessa C. P. Wirth, Gilson I. Martino, Joao A. Agopian, Paula G. D. [UNESP] |
author_role |
author |
author2 |
Wirth, Gilson I. Martino, Joao A. Agopian, Paula G. D. [UNESP] |
author2_role |
author author author |
dc.contributor.none.fl_str_mv |
Universidade de São Paulo (USP) UFRGS Universidade Estadual Paulista (Unesp) |
dc.contributor.author.fl_str_mv |
Silva, Vanessa C. P. Wirth, Gilson I. Martino, Joao A. Agopian, Paula G. D. [UNESP] |
dc.subject.por.fl_str_mv |
MOSFET NBTI NW SOI |
topic |
MOSFET NBTI NW SOI |
description |
The Negative-Bias-Temperature-Instability (NBTI) is an important reliability parameter for advanced technology nodes. This work presents an experimental study of NBTI in omega-gate nanowire (NW) pMOSFET. The 3D-numerical simulations were performed in order to better understand the NBTI effect in NW transistors. The results shows that NBTI in NW is high (Δ VT≈200-300mV-for W = 10nm) due to the higher gate oxide electric field accelerating the NBTI effect providing a higher degradation. This study was performed for different channel widths and lengths. |
publishDate |
2019 |
dc.date.none.fl_str_mv |
2019-08-01 2020-12-12T01:09:54Z 2020-12-12T01:09:54Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/conferenceObject |
format |
conferenceObject |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1109/SBMicro.2019.8919276 SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices. http://hdl.handle.net/11449/198333 10.1109/SBMicro.2019.8919276 2-s2.0-85077200437 |
url |
http://dx.doi.org/10.1109/SBMicro.2019.8919276 http://hdl.handle.net/11449/198333 |
identifier_str_mv |
SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices. 10.1109/SBMicro.2019.8919276 2-s2.0-85077200437 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1808128826047201280 |