Analysis and measurement of the non-linear refractive index of SiOx Ny using pedestal waveguides

Detalhes bibliográficos
Autor(a) principal: Sierra, Julian H.
Data de Publicação: 2019
Outros Autores: Carvalho, Daniel O. [UNESP], Samad, Ricardo E., Rangel, Ricardo C., Alayo, Marco I.
Tipo de documento: Artigo de conferência
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://dx.doi.org/10.1109/SBMicro.2019.8919392
http://hdl.handle.net/11449/198340
Resumo: In this work, the non-linear refractive index (n2) of silicon oxynitride (SiOx Ny) is determined, obtaining a value for this material of n2 = 2.11×10-19 m2/W. The results demonstrate that this material has interesting properties for the development of non-linear optical devices. The paper presents in detail the waveguide fabrication process using the pedestal technique, which allows using different materials since it does not require etching to define the sidewalls of the waveguides. We show the results of the measurement of the n2 employing the non-linear optical phenomena of Self-Phase Modulation (SPM).
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spelling Analysis and measurement of the non-linear refractive index of SiOx Ny using pedestal waveguidesintegrated photonicsmicroelectronicsnon-linear photonicsnon-linear refractive indexoptical devicesself-phase modulationsilicon oxynitrideIn this work, the non-linear refractive index (n2) of silicon oxynitride (SiOx Ny) is determined, obtaining a value for this material of n2 = 2.11×10-19 m2/W. The results demonstrate that this material has interesting properties for the development of non-linear optical devices. The paper presents in detail the waveguide fabrication process using the pedestal technique, which allows using different materials since it does not require etching to define the sidewalls of the waveguides. We show the results of the measurement of the n2 employing the non-linear optical phenomena of Self-Phase Modulation (SPM).University of São Paulo Polytechnic SchoolSão Paulo State University (UNESP) São João de Boa Vista Telecommunications DepartmentCenter for Lasers and Applications IPEN-CNEN/SPSão Paulo State Technological College (FATEC)São Paulo State University (UNESP) São João de Boa Vista Telecommunications DepartmentUniversidade de São Paulo (USP)Universidade Estadual Paulista (Unesp)IPEN-CNEN/SPSão Paulo State Technological College (FATEC)Sierra, Julian H.Carvalho, Daniel O. [UNESP]Samad, Ricardo E.Rangel, Ricardo C.Alayo, Marco I.2020-12-12T01:10:09Z2020-12-12T01:10:09Z2019-08-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObjecthttp://dx.doi.org/10.1109/SBMicro.2019.8919392SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices.http://hdl.handle.net/11449/19834010.1109/SBMicro.2019.89193922-s2.0-85077217233Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengSBMicro 2019 - 34th Symposium on Microelectronics Technology and Devicesinfo:eu-repo/semantics/openAccess2021-10-23T10:11:14Zoai:repositorio.unesp.br:11449/198340Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T16:27:09.653161Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Analysis and measurement of the non-linear refractive index of SiOx Ny using pedestal waveguides
title Analysis and measurement of the non-linear refractive index of SiOx Ny using pedestal waveguides
spellingShingle Analysis and measurement of the non-linear refractive index of SiOx Ny using pedestal waveguides
Sierra, Julian H.
integrated photonics
microelectronics
non-linear photonics
non-linear refractive index
optical devices
self-phase modulation
silicon oxynitride
title_short Analysis and measurement of the non-linear refractive index of SiOx Ny using pedestal waveguides
title_full Analysis and measurement of the non-linear refractive index of SiOx Ny using pedestal waveguides
title_fullStr Analysis and measurement of the non-linear refractive index of SiOx Ny using pedestal waveguides
title_full_unstemmed Analysis and measurement of the non-linear refractive index of SiOx Ny using pedestal waveguides
title_sort Analysis and measurement of the non-linear refractive index of SiOx Ny using pedestal waveguides
author Sierra, Julian H.
author_facet Sierra, Julian H.
Carvalho, Daniel O. [UNESP]
Samad, Ricardo E.
Rangel, Ricardo C.
Alayo, Marco I.
author_role author
author2 Carvalho, Daniel O. [UNESP]
Samad, Ricardo E.
Rangel, Ricardo C.
Alayo, Marco I.
author2_role author
author
author
author
dc.contributor.none.fl_str_mv Universidade de São Paulo (USP)
Universidade Estadual Paulista (Unesp)
IPEN-CNEN/SP
São Paulo State Technological College (FATEC)
dc.contributor.author.fl_str_mv Sierra, Julian H.
Carvalho, Daniel O. [UNESP]
Samad, Ricardo E.
Rangel, Ricardo C.
Alayo, Marco I.
dc.subject.por.fl_str_mv integrated photonics
microelectronics
non-linear photonics
non-linear refractive index
optical devices
self-phase modulation
silicon oxynitride
topic integrated photonics
microelectronics
non-linear photonics
non-linear refractive index
optical devices
self-phase modulation
silicon oxynitride
description In this work, the non-linear refractive index (n2) of silicon oxynitride (SiOx Ny) is determined, obtaining a value for this material of n2 = 2.11×10-19 m2/W. The results demonstrate that this material has interesting properties for the development of non-linear optical devices. The paper presents in detail the waveguide fabrication process using the pedestal technique, which allows using different materials since it does not require etching to define the sidewalls of the waveguides. We show the results of the measurement of the n2 employing the non-linear optical phenomena of Self-Phase Modulation (SPM).
publishDate 2019
dc.date.none.fl_str_mv 2019-08-01
2020-12-12T01:10:09Z
2020-12-12T01:10:09Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/conferenceObject
format conferenceObject
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://dx.doi.org/10.1109/SBMicro.2019.8919392
SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices.
http://hdl.handle.net/11449/198340
10.1109/SBMicro.2019.8919392
2-s2.0-85077217233
url http://dx.doi.org/10.1109/SBMicro.2019.8919392
http://hdl.handle.net/11449/198340
identifier_str_mv SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices.
10.1109/SBMicro.2019.8919392
2-s2.0-85077217233
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv SBMicro 2019 - 34th Symposium on Microelectronics Technology and Devices
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.source.none.fl_str_mv Scopus
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
_version_ 1808128654184546304

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