Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method

Detalhes bibliográficos
Autor(a) principal: Bernardi,M. I. B.
Data de Publicação: 2002
Outros Autores: Lee,E. J. H., Lisboa-Filho,P. N., Leite,E. R., Longo,E., Souza,A. G.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Cerâmica (São Paulo. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0366-69132002000100009
Resumo: The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.
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spelling Influence of the growth parameters of TiO2 thin films deposited by the MOCVD methodorganometallic compoundsthin filmsThe synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.Associação Brasileira de Cerâmica2002-03-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S0366-69132002000100009Cerâmica v.48 n.305 2002reponame:Cerâmica (São Paulo. Online)instname:Universidade de São Paulo (USP)instacron:USP10.1590/S0366-69132002000100009info:eu-repo/semantics/openAccessBernardi,M. I. B.Lee,E. J. H.Lisboa-Filho,P. N.Leite,E. R.Longo,E.Souza,A. G.eng2002-06-21T00:00:00Zoai:scielo:S0366-69132002000100009Revistahttps://www.scielo.br/j/ce/PUBhttps://old.scielo.br/oai/scielo-oai.phpceram.abc@gmail.com||ceram.abc@gmail.com1678-45530366-6913opendoar:2002-06-21T00:00Cerâmica (São Paulo. Online) - Universidade de São Paulo (USP)false
dc.title.none.fl_str_mv Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method
title Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method
spellingShingle Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method
Bernardi,M. I. B.
organometallic compounds
thin films
title_short Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method
title_full Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method
title_fullStr Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method
title_full_unstemmed Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method
title_sort Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method
author Bernardi,M. I. B.
author_facet Bernardi,M. I. B.
Lee,E. J. H.
Lisboa-Filho,P. N.
Leite,E. R.
Longo,E.
Souza,A. G.
author_role author
author2 Lee,E. J. H.
Lisboa-Filho,P. N.
Leite,E. R.
Longo,E.
Souza,A. G.
author2_role author
author
author
author
author
dc.contributor.author.fl_str_mv Bernardi,M. I. B.
Lee,E. J. H.
Lisboa-Filho,P. N.
Leite,E. R.
Longo,E.
Souza,A. G.
dc.subject.por.fl_str_mv organometallic compounds
thin films
topic organometallic compounds
thin films
description The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.
publishDate 2002
dc.date.none.fl_str_mv 2002-03-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0366-69132002000100009
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0366-69132002000100009
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/S0366-69132002000100009
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv Associação Brasileira de Cerâmica
publisher.none.fl_str_mv Associação Brasileira de Cerâmica
dc.source.none.fl_str_mv Cerâmica v.48 n.305 2002
reponame:Cerâmica (São Paulo. Online)
instname:Universidade de São Paulo (USP)
instacron:USP
instname_str Universidade de São Paulo (USP)
instacron_str USP
institution USP
reponame_str Cerâmica (São Paulo. Online)
collection Cerâmica (São Paulo. Online)
repository.name.fl_str_mv Cerâmica (São Paulo. Online) - Universidade de São Paulo (USP)
repository.mail.fl_str_mv ceram.abc@gmail.com||ceram.abc@gmail.com
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