Insulator materials for interface passivation of Cu(In,Ga)Se2 thin films

Detalhes bibliográficos
Autor(a) principal: Cunha, J. M. V.
Data de Publicação: 2018
Outros Autores: Fernandes, P. A., Hultqvist, A., Teixeira, J. P., Bose, S., Vermang, B., Garud, S., Buldu, D., Gaspar, J., Edoff, M., Leitão, J. P., Salomé, P. M. P.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10773/30539
Resumo: In this work, Metal-Insulator-Semiconductor (MIS) structures were fabricated in order to study different types of insulators, namely, aluminum oxide (Al2O3), silicon nitride (Si3Nx) and silicon oxide (SiOx) to be used as passivation layers in Cu(In,Ga)Se2 (CIGS) thin film solar cells. The investigated stacks consisted of SLG/Mo/CIGS/insulator/Al. Raman scattering and Photoluminescence measurements were done to verify the insulator deposition influence on the CIGS surface. In order to study the electrical properties of the CIGS-insulator interface, capacitance vs. conductance and voltage (C-G-V) measurements were done to estimate the number and polarity of fixed insulator charges (Qf). The density of interface defects (Dit) was estimated from capacitance vs. conductance and frequency (C-G-f) measurements. This study evidences that the deposition of the insulators at high temperatures (300 ºC) and the use of sputtering technique cause surface modification on the CIGS surface. We found that, by varying the SiOx deposition parameters, it is possible to have opposite charges inside the insulator, which would allow its use in different device architectures. The material with lower Dit values was Al2O3 when deposited by sputtering.
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spelling Insulator materials for interface passivation of Cu(In,Ga)Se2 thin filmsChemical passivationCu(In,Ga)Se2 (CIGS)Field-effect passivationInterfacePassivationSolar cellsThin filmsIn this work, Metal-Insulator-Semiconductor (MIS) structures were fabricated in order to study different types of insulators, namely, aluminum oxide (Al2O3), silicon nitride (Si3Nx) and silicon oxide (SiOx) to be used as passivation layers in Cu(In,Ga)Se2 (CIGS) thin film solar cells. The investigated stacks consisted of SLG/Mo/CIGS/insulator/Al. Raman scattering and Photoluminescence measurements were done to verify the insulator deposition influence on the CIGS surface. In order to study the electrical properties of the CIGS-insulator interface, capacitance vs. conductance and voltage (C-G-V) measurements were done to estimate the number and polarity of fixed insulator charges (Qf). The density of interface defects (Dit) was estimated from capacitance vs. conductance and frequency (C-G-f) measurements. This study evidences that the deposition of the insulators at high temperatures (300 ºC) and the use of sputtering technique cause surface modification on the CIGS surface. We found that, by varying the SiOx deposition parameters, it is possible to have opposite charges inside the insulator, which would allow its use in different device architectures. The material with lower Dit values was Al2O3 when deposited by sputtering.IEEE2021-02-08T16:12:59Z2018-09-01T00:00:00Z2018-09info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10773/30539eng2156-338110.1109/JPHOTOV.2018.2846674Cunha, J. M. V.Fernandes, P. A.Hultqvist, A.Teixeira, J. P.Bose, S.Vermang, B.Garud, S.Buldu, D.Gaspar, J.Edoff, M.Leitão, J. P.Salomé, P. M. P.info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-02-22T11:58:59Zoai:ria.ua.pt:10773/30539Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T03:02:35.814157Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Insulator materials for interface passivation of Cu(In,Ga)Se2 thin films
title Insulator materials for interface passivation of Cu(In,Ga)Se2 thin films
spellingShingle Insulator materials for interface passivation of Cu(In,Ga)Se2 thin films
Cunha, J. M. V.
Chemical passivation
Cu(In,Ga)Se2 (CIGS)
Field-effect passivation
Interface
Passivation
Solar cells
Thin films
title_short Insulator materials for interface passivation of Cu(In,Ga)Se2 thin films
title_full Insulator materials for interface passivation of Cu(In,Ga)Se2 thin films
title_fullStr Insulator materials for interface passivation of Cu(In,Ga)Se2 thin films
title_full_unstemmed Insulator materials for interface passivation of Cu(In,Ga)Se2 thin films
title_sort Insulator materials for interface passivation of Cu(In,Ga)Se2 thin films
author Cunha, J. M. V.
author_facet Cunha, J. M. V.
Fernandes, P. A.
Hultqvist, A.
Teixeira, J. P.
Bose, S.
Vermang, B.
Garud, S.
Buldu, D.
Gaspar, J.
Edoff, M.
Leitão, J. P.
Salomé, P. M. P.
author_role author
author2 Fernandes, P. A.
Hultqvist, A.
Teixeira, J. P.
Bose, S.
Vermang, B.
Garud, S.
Buldu, D.
Gaspar, J.
Edoff, M.
Leitão, J. P.
Salomé, P. M. P.
author2_role author
author
author
author
author
author
author
author
author
author
author
dc.contributor.author.fl_str_mv Cunha, J. M. V.
Fernandes, P. A.
Hultqvist, A.
Teixeira, J. P.
Bose, S.
Vermang, B.
Garud, S.
Buldu, D.
Gaspar, J.
Edoff, M.
Leitão, J. P.
Salomé, P. M. P.
dc.subject.por.fl_str_mv Chemical passivation
Cu(In,Ga)Se2 (CIGS)
Field-effect passivation
Interface
Passivation
Solar cells
Thin films
topic Chemical passivation
Cu(In,Ga)Se2 (CIGS)
Field-effect passivation
Interface
Passivation
Solar cells
Thin films
description In this work, Metal-Insulator-Semiconductor (MIS) structures were fabricated in order to study different types of insulators, namely, aluminum oxide (Al2O3), silicon nitride (Si3Nx) and silicon oxide (SiOx) to be used as passivation layers in Cu(In,Ga)Se2 (CIGS) thin film solar cells. The investigated stacks consisted of SLG/Mo/CIGS/insulator/Al. Raman scattering and Photoluminescence measurements were done to verify the insulator deposition influence on the CIGS surface. In order to study the electrical properties of the CIGS-insulator interface, capacitance vs. conductance and voltage (C-G-V) measurements were done to estimate the number and polarity of fixed insulator charges (Qf). The density of interface defects (Dit) was estimated from capacitance vs. conductance and frequency (C-G-f) measurements. This study evidences that the deposition of the insulators at high temperatures (300 ºC) and the use of sputtering technique cause surface modification on the CIGS surface. We found that, by varying the SiOx deposition parameters, it is possible to have opposite charges inside the insulator, which would allow its use in different device architectures. The material with lower Dit values was Al2O3 when deposited by sputtering.
publishDate 2018
dc.date.none.fl_str_mv 2018-09-01T00:00:00Z
2018-09
2021-02-08T16:12:59Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10773/30539
url http://hdl.handle.net/10773/30539
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 2156-3381
10.1109/JPHOTOV.2018.2846674
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv IEEE
publisher.none.fl_str_mv IEEE
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
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