Simple general purpose ion beam deceleration system using a single electrode lens

Detalhes bibliográficos
Autor(a) principal: Lopes, J.
Data de Publicação: 2015
Outros Autores: Rocha, J.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10400.21/8270
Resumo: Ion beam deceleration properties of a newly developed low-energy ion beam implantation system were studied. The objective of this system was to produce general purpose low-energy (5 to 15 keV) implantations with high current beam of hundreds of μA level, providing the most wide implantation area possible and allowing continuously magnetic scanning of the beam over the sample(s). This paper describes the developed system installed in the high-current ion implanter at the Laboratory of Accelerators and Radiation Technologies of the Nuclear and Technological Campus, Sacavém, Portugal (CTN).
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spelling Simple general purpose ion beam deceleration system using a single electrode lensDecelerationLow energyPositive ion beamIon beam deceleration properties of a newly developed low-energy ion beam implantation system were studied. The objective of this system was to produce general purpose low-energy (5 to 15 keV) implantations with high current beam of hundreds of μA level, providing the most wide implantation area possible and allowing continuously magnetic scanning of the beam over the sample(s). This paper describes the developed system installed in the high-current ion implanter at the Laboratory of Accelerators and Radiation Technologies of the Nuclear and Technological Campus, Sacavém, Portugal (CTN).Scientific Research PublishingRCIPLLopes, J.Rocha, J.2018-03-21T10:00:23Z20152015-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10400.21/8270engLOPES, J.; ROCHA, J. – Simple general purpose ion beam deceleration system using a single electrode lens. World Journal of Engineering and Technology. ISSN 2331-4222. Vol. 3, (2015), pp. 127-133.2331-4222http://dx.doi.org/10.4236/wjet.2015.33014metadata only accessinfo:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-08-03T09:55:25Zoai:repositorio.ipl.pt:10400.21/8270Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T20:17:03.571525Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Simple general purpose ion beam deceleration system using a single electrode lens
title Simple general purpose ion beam deceleration system using a single electrode lens
spellingShingle Simple general purpose ion beam deceleration system using a single electrode lens
Lopes, J.
Deceleration
Low energy
Positive ion beam
title_short Simple general purpose ion beam deceleration system using a single electrode lens
title_full Simple general purpose ion beam deceleration system using a single electrode lens
title_fullStr Simple general purpose ion beam deceleration system using a single electrode lens
title_full_unstemmed Simple general purpose ion beam deceleration system using a single electrode lens
title_sort Simple general purpose ion beam deceleration system using a single electrode lens
author Lopes, J.
author_facet Lopes, J.
Rocha, J.
author_role author
author2 Rocha, J.
author2_role author
dc.contributor.none.fl_str_mv RCIPL
dc.contributor.author.fl_str_mv Lopes, J.
Rocha, J.
dc.subject.por.fl_str_mv Deceleration
Low energy
Positive ion beam
topic Deceleration
Low energy
Positive ion beam
description Ion beam deceleration properties of a newly developed low-energy ion beam implantation system were studied. The objective of this system was to produce general purpose low-energy (5 to 15 keV) implantations with high current beam of hundreds of μA level, providing the most wide implantation area possible and allowing continuously magnetic scanning of the beam over the sample(s). This paper describes the developed system installed in the high-current ion implanter at the Laboratory of Accelerators and Radiation Technologies of the Nuclear and Technological Campus, Sacavém, Portugal (CTN).
publishDate 2015
dc.date.none.fl_str_mv 2015
2015-01-01T00:00:00Z
2018-03-21T10:00:23Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10400.21/8270
url http://hdl.handle.net/10400.21/8270
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv LOPES, J.; ROCHA, J. – Simple general purpose ion beam deceleration system using a single electrode lens. World Journal of Engineering and Technology. ISSN 2331-4222. Vol. 3, (2015), pp. 127-133.
2331-4222
http://dx.doi.org/10.4236/wjet.2015.33014
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dc.publisher.none.fl_str_mv Scientific Research Publishing
publisher.none.fl_str_mv Scientific Research Publishing
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
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instacron:RCAAP
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