The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers
Autor(a) principal: | |
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Data de Publicação: | 2013 |
Outros Autores: | , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | https://hdl.handle.net/1822/27344 |
Resumo: | In this work we produce and study silicon nitride (SiNx) thin films deposited by Hot Wire Chemical Vapor Depo- sition (HW-CVD) to be used as encapsulation barriers for flexible organic photovoltaic cells fabricated on poly- ethylene terephthalate (PET) substrates in order to increase their shelf lifetime. We report on the results of SiNx double-layers and on the equivalent double-layer stack where an Ar-plasma surface treatment was performed on the first SiNx layer. The Ar-plasma treatment may under certain conditions influences the structure of the interface between the two subsequent layers and thus the barrier properties of the whole system. We focus our attention on the effect of plasma treatment time on the final barrier properties. We assess the encapsulation barrier properties of these layers, using the calcium degradation test where changes in the electrical conductance of encapsulated Ca sensors are monitored with time. The water vapor transmission rate (WVTR) is found to be ~3 × 10−3 g/m2·day for stacked SiNx double-layer with 8 min Ar plasma surface treatment. |
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The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layersSilicon nitrideAr plasma treatmentPermeation barrierHW-CVDScience & TechnologyIn this work we produce and study silicon nitride (SiNx) thin films deposited by Hot Wire Chemical Vapor Depo- sition (HW-CVD) to be used as encapsulation barriers for flexible organic photovoltaic cells fabricated on poly- ethylene terephthalate (PET) substrates in order to increase their shelf lifetime. We report on the results of SiNx double-layers and on the equivalent double-layer stack where an Ar-plasma surface treatment was performed on the first SiNx layer. The Ar-plasma treatment may under certain conditions influences the structure of the interface between the two subsequent layers and thus the barrier properties of the whole system. We focus our attention on the effect of plasma treatment time on the final barrier properties. We assess the encapsulation barrier properties of these layers, using the calcium degradation test where changes in the electrical conductance of encapsulated Ca sensors are monitored with time. The water vapor transmission rate (WVTR) is found to be ~3 × 10−3 g/m2·day for stacked SiNx double-layer with 8 min Ar plasma surface treatment.FCT - CNRS PICS (French–Portuguese no: 5336) projectDirection des Relations Extérieures, Ecole PolytechniqueElsevier 1Universidade do MinhoMajee, SubimalCerqueira, M. F.Tondelier, D.Geffroy, B.Bonnassieux, Y.Alpuim, P.Bourée, J. E.2013-08-032013-08-03T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttps://hdl.handle.net/1822/27344eng0257-897210.1016/j.surfcoat.2013.07.067www.elsevier.com/locate/surfcoatinfo:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-05-25T01:50:08Zoai:repositorium.sdum.uminho.pt:1822/27344Portal AgregadorONGhttps://www.rcaap.pt/oai/openairemluisa.alvim@gmail.comopendoar:71602024-05-25T01:50:08Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers |
title |
The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers |
spellingShingle |
The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers Majee, Subimal Silicon nitride Ar plasma treatment Permeation barrier HW-CVD Science & Technology |
title_short |
The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers |
title_full |
The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers |
title_fullStr |
The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers |
title_full_unstemmed |
The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers |
title_sort |
The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers |
author |
Majee, Subimal |
author_facet |
Majee, Subimal Cerqueira, M. F. Tondelier, D. Geffroy, B. Bonnassieux, Y. Alpuim, P. Bourée, J. E. |
author_role |
author |
author2 |
Cerqueira, M. F. Tondelier, D. Geffroy, B. Bonnassieux, Y. Alpuim, P. Bourée, J. E. |
author2_role |
author author author author author author |
dc.contributor.none.fl_str_mv |
Universidade do Minho |
dc.contributor.author.fl_str_mv |
Majee, Subimal Cerqueira, M. F. Tondelier, D. Geffroy, B. Bonnassieux, Y. Alpuim, P. Bourée, J. E. |
dc.subject.por.fl_str_mv |
Silicon nitride Ar plasma treatment Permeation barrier HW-CVD Science & Technology |
topic |
Silicon nitride Ar plasma treatment Permeation barrier HW-CVD Science & Technology |
description |
In this work we produce and study silicon nitride (SiNx) thin films deposited by Hot Wire Chemical Vapor Depo- sition (HW-CVD) to be used as encapsulation barriers for flexible organic photovoltaic cells fabricated on poly- ethylene terephthalate (PET) substrates in order to increase their shelf lifetime. We report on the results of SiNx double-layers and on the equivalent double-layer stack where an Ar-plasma surface treatment was performed on the first SiNx layer. The Ar-plasma treatment may under certain conditions influences the structure of the interface between the two subsequent layers and thus the barrier properties of the whole system. We focus our attention on the effect of plasma treatment time on the final barrier properties. We assess the encapsulation barrier properties of these layers, using the calcium degradation test where changes in the electrical conductance of encapsulated Ca sensors are monitored with time. The water vapor transmission rate (WVTR) is found to be ~3 × 10−3 g/m2·day for stacked SiNx double-layer with 8 min Ar plasma surface treatment. |
publishDate |
2013 |
dc.date.none.fl_str_mv |
2013-08-03 2013-08-03T00:00:00Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
https://hdl.handle.net/1822/27344 |
url |
https://hdl.handle.net/1822/27344 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
0257-8972 10.1016/j.surfcoat.2013.07.067 www.elsevier.com/locate/surfcoat |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
Elsevier 1 |
publisher.none.fl_str_mv |
Elsevier 1 |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
mluisa.alvim@gmail.com |
_version_ |
1817544268591398912 |