Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma

Detalhes bibliográficos
Autor(a) principal: Majee, S.
Data de Publicação: 2015
Outros Autores: Cerqueira, M. F., Tondelier, D., Vanel, J. C., Geffroy, B., Bonnassieux, Y., Alpuim, P., Bourée, J. E.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: https://hdl.handle.net/1822/32811
Resumo: "Available online 12 October 2014"
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spelling Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasmaSilicon nitrideAr-plasma treatmentPermeation barrierHW-CVDEngenharia e Tecnologia::Engenharia dos MateriaisScience & Technology"Available online 12 October 2014"In this work SiNx thin films have been deposited by Hot-Wire Chemical Vapor Deposition (HW-CVD) technique to be used as encapsulation barriers for flexible organic electronic devices fabricated on polyethylene terephthalate (PET) substrates. First results of SiNx multilayers stacked and stacks of SiNx single-layers (50 nm each) separated by an Ar-plasma surface treatment are reported. The encapsulation barrier properties of these different multilayers are assessed using the electrical calcium degradation test by monitoring changes in the electrical conductance of encapsulated Ca sensors with time. The water vapor transmission rate is found to be slightly minimized (7 × 10− 3 g/m2day) for stacked SiNx single-layers exposed to argon plasma treatment during a short time (2 min) as compared to that for stacked SiNx single-layers without Ar plasma treatment.PICS (French-Portuguese) project no. 5336.Direction des Relations Extérieures, Ecole polytechniqueElsevier 1Universidade do MinhoMajee, S.Cerqueira, M. F.Tondelier, D.Vanel, J. C.Geffroy, B.Bonnassieux, Y.Alpuim, P.Bourée, J. E.20152015-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttps://hdl.handle.net/1822/32811engMajee, S., Cerqueira, M. F., Tondelier, D., Vanel, J. C., Geffroy, B., Bonnassieux, Y., . . . Bouree, J. E. (2015). Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma. Thin Solid Films, 575, 72-75. doi: 10.1016/j.tsf.2014.10.0090040-609010.1016/j.tsf.2014.10.009http://www.sciencedirect.com/science/article/pii/S0040609014009705#info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-05-25T02:08:40Zoai:repositorium.sdum.uminho.pt:1822/32811Portal AgregadorONGhttps://www.rcaap.pt/oai/openairemluisa.alvim@gmail.comopendoar:71602024-05-25T02:08:40Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma
title Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma
spellingShingle Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma
Majee, S.
Silicon nitride
Ar-plasma treatment
Permeation barrier
HW-CVD
Engenharia e Tecnologia::Engenharia dos Materiais
Science & Technology
title_short Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma
title_full Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma
title_fullStr Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma
title_full_unstemmed Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma
title_sort Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma
author Majee, S.
author_facet Majee, S.
Cerqueira, M. F.
Tondelier, D.
Vanel, J. C.
Geffroy, B.
Bonnassieux, Y.
Alpuim, P.
Bourée, J. E.
author_role author
author2 Cerqueira, M. F.
Tondelier, D.
Vanel, J. C.
Geffroy, B.
Bonnassieux, Y.
Alpuim, P.
Bourée, J. E.
author2_role author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade do Minho
dc.contributor.author.fl_str_mv Majee, S.
Cerqueira, M. F.
Tondelier, D.
Vanel, J. C.
Geffroy, B.
Bonnassieux, Y.
Alpuim, P.
Bourée, J. E.
dc.subject.por.fl_str_mv Silicon nitride
Ar-plasma treatment
Permeation barrier
HW-CVD
Engenharia e Tecnologia::Engenharia dos Materiais
Science & Technology
topic Silicon nitride
Ar-plasma treatment
Permeation barrier
HW-CVD
Engenharia e Tecnologia::Engenharia dos Materiais
Science & Technology
description "Available online 12 October 2014"
publishDate 2015
dc.date.none.fl_str_mv 2015
2015-01-01T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv https://hdl.handle.net/1822/32811
url https://hdl.handle.net/1822/32811
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Majee, S., Cerqueira, M. F., Tondelier, D., Vanel, J. C., Geffroy, B., Bonnassieux, Y., . . . Bouree, J. E. (2015). Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma. Thin Solid Films, 575, 72-75. doi: 10.1016/j.tsf.2014.10.009
0040-6090
10.1016/j.tsf.2014.10.009
http://www.sciencedirect.com/science/article/pii/S0040609014009705#
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Elsevier 1
publisher.none.fl_str_mv Elsevier 1
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv mluisa.alvim@gmail.com
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