Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers
Autor(a) principal: | |
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Data de Publicação: | 2014 |
Outros Autores: | , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/1822/32819 |
Resumo: | The reliability and stability are key issues for the commercial utilization of organic photovoltaic devices based on flexible polymer substrates. To increase the shelf-lifetime of these devices, transparent moisture barriers of silicon nitride (SiNx) films are deposited at low temperature by hot wire CVD (HW-CVD) process. Instead of the conventional route based on organic/inorganic hybrid structures, this work defines a new route consisting in depositing multilayer stacks of SiNx thin films, each single layer being treated by argon plasma. The plasma treatment allows creating smoother surface and surface atom rearrangement. We define a critical thickness of the single layer film and focus our attention on the effect of increasing the number of SiNx single-layers on the barrier properties. A water vapor transmission rate (WVTR) of 2 x 10-4 g/(m2 day) is reported for SiNx multilayer stack and a physical interpretation of the plasma treatment effect is given. |
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Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayersSilicon nitrideAr-plasma treatmentPermeation barrierHW-CVDEngenharia e Tecnologia::Engenharia dos MateriaisScience & TechnologyThe reliability and stability are key issues for the commercial utilization of organic photovoltaic devices based on flexible polymer substrates. To increase the shelf-lifetime of these devices, transparent moisture barriers of silicon nitride (SiNx) films are deposited at low temperature by hot wire CVD (HW-CVD) process. Instead of the conventional route based on organic/inorganic hybrid structures, this work defines a new route consisting in depositing multilayer stacks of SiNx thin films, each single layer being treated by argon plasma. The plasma treatment allows creating smoother surface and surface atom rearrangement. We define a critical thickness of the single layer film and focus our attention on the effect of increasing the number of SiNx single-layers on the barrier properties. A water vapor transmission rate (WVTR) of 2 x 10-4 g/(m2 day) is reported for SiNx multilayer stack and a physical interpretation of the plasma treatment effect is given.Direction des Relations Extérieures, Ecole PolytechniquePICS (French–Portuguese No. 5336) projectIOP PublishingUniversidade do MinhoMajee, SubimalCerqueira, M. F.Tondelier, DenisGeffroy, BernardBonnassieux, YvanAlpuim, P.Bourée, Jean Eric20142014-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/32819eng1347-406510.7567/JJAP.53.05FM05http://dx.doi.org/10.7567/JJAP.53.05FM05info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-05-11T07:26:34Zoai:repositorium.sdum.uminho.pt:1822/32819Portal AgregadorONGhttps://www.rcaap.pt/oai/openairemluisa.alvim@gmail.comopendoar:71602024-05-11T07:26:34Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers |
title |
Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers |
spellingShingle |
Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers Majee, Subimal Silicon nitride Ar-plasma treatment Permeation barrier HW-CVD Engenharia e Tecnologia::Engenharia dos Materiais Science & Technology |
title_short |
Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers |
title_full |
Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers |
title_fullStr |
Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers |
title_full_unstemmed |
Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers |
title_sort |
Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers |
author |
Majee, Subimal |
author_facet |
Majee, Subimal Cerqueira, M. F. Tondelier, Denis Geffroy, Bernard Bonnassieux, Yvan Alpuim, P. Bourée, Jean Eric |
author_role |
author |
author2 |
Cerqueira, M. F. Tondelier, Denis Geffroy, Bernard Bonnassieux, Yvan Alpuim, P. Bourée, Jean Eric |
author2_role |
author author author author author author |
dc.contributor.none.fl_str_mv |
Universidade do Minho |
dc.contributor.author.fl_str_mv |
Majee, Subimal Cerqueira, M. F. Tondelier, Denis Geffroy, Bernard Bonnassieux, Yvan Alpuim, P. Bourée, Jean Eric |
dc.subject.por.fl_str_mv |
Silicon nitride Ar-plasma treatment Permeation barrier HW-CVD Engenharia e Tecnologia::Engenharia dos Materiais Science & Technology |
topic |
Silicon nitride Ar-plasma treatment Permeation barrier HW-CVD Engenharia e Tecnologia::Engenharia dos Materiais Science & Technology |
description |
The reliability and stability are key issues for the commercial utilization of organic photovoltaic devices based on flexible polymer substrates. To increase the shelf-lifetime of these devices, transparent moisture barriers of silicon nitride (SiNx) films are deposited at low temperature by hot wire CVD (HW-CVD) process. Instead of the conventional route based on organic/inorganic hybrid structures, this work defines a new route consisting in depositing multilayer stacks of SiNx thin films, each single layer being treated by argon plasma. The plasma treatment allows creating smoother surface and surface atom rearrangement. We define a critical thickness of the single layer film and focus our attention on the effect of increasing the number of SiNx single-layers on the barrier properties. A water vapor transmission rate (WVTR) of 2 x 10-4 g/(m2 day) is reported for SiNx multilayer stack and a physical interpretation of the plasma treatment effect is given. |
publishDate |
2014 |
dc.date.none.fl_str_mv |
2014 2014-01-01T00:00:00Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/1822/32819 |
url |
http://hdl.handle.net/1822/32819 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
1347-4065 10.7567/JJAP.53.05FM05 http://dx.doi.org/10.7567/JJAP.53.05FM05 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
IOP Publishing |
publisher.none.fl_str_mv |
IOP Publishing |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
mluisa.alvim@gmail.com |
_version_ |
1817545317326782464 |