Effect of argon ion energy on the performance of silicon nitridemultilayer permeation barriers grown by hot-wire CVD on polymers

Detalhes bibliográficos
Autor(a) principal: Alpuim, P.
Data de Publicação: 2015
Outros Autores: Majee, S., Cerqueira, M. F., Tondelier, D., Geffroy, B., Bonnassieux, Y., Bourée, J. E.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/1822/39804
Resumo: One of the authors (S.M.) acknowledges Direction des Relations Extérieures of Ecole Polytechnique for financial support.
id RCAP_ac502a79ab1d978fd013005266cb4453
oai_identifier_str oai:repositorium.sdum.uminho.pt:1822/39804
network_acronym_str RCAP
network_name_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository_id_str 7160
spelling Effect of argon ion energy on the performance of silicon nitridemultilayer permeation barriers grown by hot-wire CVD on polymersSilicon nitrideHot-wire CVDLow-temperature depositionAr plasma treatmentPermeation barrierPolymer substrateCiências Naturais::Ciências FísicasScience & TechnologyOne of the authors (S.M.) acknowledges Direction des Relations Extérieures of Ecole Polytechnique for financial support.Permeation barriers for organic electronic devices on polymer flexible substrates were realized by combining stacked silicon nitride (SiNx) single layers (50 nm thick) deposited by hot-wire chemical vapor deposition process at low-temperature (~100°C) with a specific argon plasma treatment between two successive layers. Several plasma parameters (RF power density, pressure, treatment duration) as well as the number of single layers have been explored in order to improve the quality of permeation barriers deposited on polyethylene terephthalate. In this work, maximumion energy was highlighted as the crucial parameter making it possible to minimize water vapor transmission rate (WVTR), as determined by the electrical calcium test method, all the other parameters being kept fixed. Thus fixing the plasma treatment duration at 8 min for a stack of two SiNx single layers, a minimum WVTR of 5 × 10−4 g/(m2 day), measured at room temperature, was found for a maximum ion energy of ~30 eV. This minimum WVTR value was reduced to 7 × 10−5 g/(m2 day) for a stack of five SiNx single layers. The reduction in the permeability is interpreted as due to the rearrangement of atoms at the interfaces when average transferred ion energy to target atoms exceeds threshold displacement energy.The authors are grateful to Dr. R. Cortes (PMC, Ecole Polytechnique) for XRR analysis, to Dr. P. Chapon (HORIBA Jobin Yvon) for GD-OES analysis and Dr. J. Leroy (CEA Saclay) for XPS analysis. This work was partly supported by the PICS (FrenchPortuguese) project No. 5336. One of the authors (S.M.) acknowledges Direction des Relations Extérieures of Ecole Polytechnique for financial support.ElsevierUniversidade do MinhoAlpuim, P.Majee, S.Cerqueira, M. F.Tondelier, D.Geffroy, B.Bonnassieux, Y.Bourée, J. E.20152015-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/39804engAlpuim, P., Majee, S., Cerqueira, M. F., Tondelier, D., Geffroy, B., Bonnassieux, Y., & Bouree, J. E. (2015). Effect of argon ion energy on the performance of silicon nitride multilayer permeation barriers grown by hot-wire CVD on polymers. Thin Solid Films, 595, 258-265. doi: 10.1016/j.tsf.2015.09.0480040-609010.1016/j.tsf.2015.09.048http://www.sciencedirect.com/science/article/pii/S0040609015009268info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-05-11T05:05:58Zoai:repositorium.sdum.uminho.pt:1822/39804Portal AgregadorONGhttps://www.rcaap.pt/oai/openairemluisa.alvim@gmail.comopendoar:71602024-05-11T05:05:58Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Effect of argon ion energy on the performance of silicon nitridemultilayer permeation barriers grown by hot-wire CVD on polymers
title Effect of argon ion energy on the performance of silicon nitridemultilayer permeation barriers grown by hot-wire CVD on polymers
spellingShingle Effect of argon ion energy on the performance of silicon nitridemultilayer permeation barriers grown by hot-wire CVD on polymers
Alpuim, P.
Silicon nitride
Hot-wire CVD
Low-temperature deposition
Ar plasma treatment
Permeation barrier
Polymer substrate
Ciências Naturais::Ciências Físicas
Science & Technology
title_short Effect of argon ion energy on the performance of silicon nitridemultilayer permeation barriers grown by hot-wire CVD on polymers
title_full Effect of argon ion energy on the performance of silicon nitridemultilayer permeation barriers grown by hot-wire CVD on polymers
title_fullStr Effect of argon ion energy on the performance of silicon nitridemultilayer permeation barriers grown by hot-wire CVD on polymers
title_full_unstemmed Effect of argon ion energy on the performance of silicon nitridemultilayer permeation barriers grown by hot-wire CVD on polymers
title_sort Effect of argon ion energy on the performance of silicon nitridemultilayer permeation barriers grown by hot-wire CVD on polymers
author Alpuim, P.
author_facet Alpuim, P.
Majee, S.
Cerqueira, M. F.
Tondelier, D.
Geffroy, B.
Bonnassieux, Y.
Bourée, J. E.
author_role author
author2 Majee, S.
Cerqueira, M. F.
Tondelier, D.
Geffroy, B.
Bonnassieux, Y.
Bourée, J. E.
author2_role author
author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade do Minho
dc.contributor.author.fl_str_mv Alpuim, P.
Majee, S.
Cerqueira, M. F.
Tondelier, D.
Geffroy, B.
Bonnassieux, Y.
Bourée, J. E.
dc.subject.por.fl_str_mv Silicon nitride
Hot-wire CVD
Low-temperature deposition
Ar plasma treatment
Permeation barrier
Polymer substrate
Ciências Naturais::Ciências Físicas
Science & Technology
topic Silicon nitride
Hot-wire CVD
Low-temperature deposition
Ar plasma treatment
Permeation barrier
Polymer substrate
Ciências Naturais::Ciências Físicas
Science & Technology
description One of the authors (S.M.) acknowledges Direction des Relations Extérieures of Ecole Polytechnique for financial support.
publishDate 2015
dc.date.none.fl_str_mv 2015
2015-01-01T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/1822/39804
url http://hdl.handle.net/1822/39804
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Alpuim, P., Majee, S., Cerqueira, M. F., Tondelier, D., Geffroy, B., Bonnassieux, Y., & Bouree, J. E. (2015). Effect of argon ion energy on the performance of silicon nitride multilayer permeation barriers grown by hot-wire CVD on polymers. Thin Solid Films, 595, 258-265. doi: 10.1016/j.tsf.2015.09.048
0040-6090
10.1016/j.tsf.2015.09.048
http://www.sciencedirect.com/science/article/pii/S0040609015009268
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv mluisa.alvim@gmail.com
_version_ 1817544515095887872