Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering

Detalhes bibliográficos
Autor(a) principal: Mori, Thiago J. A.
Data de Publicação: 2017
Outros Autores: Mouls, Caroline L., Morgado, Felipe F. [UNESP], Schio, Pedro, Cezar, Júlio C.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://dx.doi.org/10.1063/1.5003764
http://hdl.handle.net/11449/220926
Resumo: A series of epitaxial BiFeO3 thin films has been grown under high partial pressure in a pure O2 atmosphere, which leads to a low deposition rate. The samples grown under these conditions have presented an evolution of the quality of the epitaxy as the deposition temperature increases, however, spurious β-Bi2O3 and supertetragonal BiFeO3 phases are present in the films grown at higher temperatures. The presence of γ-Fe2O3 is reported in one growing condition, and has been attributed to the origin of hysteretic ferromagnetic behavior. A second kind of magnetism, with higher magnetic moment and anhysteretic behaviour, is attributed to the presence of mixed phases of BiFeO3.
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spelling Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputteringA series of epitaxial BiFeO3 thin films has been grown under high partial pressure in a pure O2 atmosphere, which leads to a low deposition rate. The samples grown under these conditions have presented an evolution of the quality of the epitaxy as the deposition temperature increases, however, spurious β-Bi2O3 and supertetragonal BiFeO3 phases are present in the films grown at higher temperatures. The presence of γ-Fe2O3 is reported in one growing condition, and has been attributed to the origin of hysteretic ferromagnetic behavior. A second kind of magnetism, with higher magnetic moment and anhysteretic behaviour, is attributed to the presence of mixed phases of BiFeO3.Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Laboratório Nacional de Luz Síncrotron Centro Nacional de Pesquisa em Energia e MateriaisInstituto de Física Gleb Wataghin Universidade Estadual de CampinasInstituto de Física de São Carlos Universidade Estadual de São PauloInstituto de Física de São Carlos Universidade Estadual de São PauloFAPESP: 2012/18397-1FAPESP: 2012/51198-2CNPq: 309354/2015-3Centro Nacional de Pesquisa em Energia e MateriaisUniversidade Estadual de Campinas (UNICAMP)Universidade Estadual Paulista (UNESP)Mori, Thiago J. A.Mouls, Caroline L.Morgado, Felipe F. [UNESP]Schio, PedroCezar, Júlio C.2022-04-28T19:06:58Z2022-04-28T19:06:58Z2017-09-28info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articlehttp://dx.doi.org/10.1063/1.5003764Journal of Applied Physics, v. 122, n. 12, 2017.1089-75500021-8979http://hdl.handle.net/11449/22092610.1063/1.50037642-s2.0-85029897727Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengJournal of Applied Physicsinfo:eu-repo/semantics/openAccess2022-04-28T19:06:58Zoai:repositorio.unesp.br:11449/220926Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T19:14:58.946634Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering
title Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering
spellingShingle Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering
Mori, Thiago J. A.
title_short Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering
title_full Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering
title_fullStr Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering
title_full_unstemmed Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering
title_sort Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering
author Mori, Thiago J. A.
author_facet Mori, Thiago J. A.
Mouls, Caroline L.
Morgado, Felipe F. [UNESP]
Schio, Pedro
Cezar, Júlio C.
author_role author
author2 Mouls, Caroline L.
Morgado, Felipe F. [UNESP]
Schio, Pedro
Cezar, Júlio C.
author2_role author
author
author
author
dc.contributor.none.fl_str_mv Centro Nacional de Pesquisa em Energia e Materiais
Universidade Estadual de Campinas (UNICAMP)
Universidade Estadual Paulista (UNESP)
dc.contributor.author.fl_str_mv Mori, Thiago J. A.
Mouls, Caroline L.
Morgado, Felipe F. [UNESP]
Schio, Pedro
Cezar, Júlio C.
description A series of epitaxial BiFeO3 thin films has been grown under high partial pressure in a pure O2 atmosphere, which leads to a low deposition rate. The samples grown under these conditions have presented an evolution of the quality of the epitaxy as the deposition temperature increases, however, spurious β-Bi2O3 and supertetragonal BiFeO3 phases are present in the films grown at higher temperatures. The presence of γ-Fe2O3 is reported in one growing condition, and has been attributed to the origin of hysteretic ferromagnetic behavior. A second kind of magnetism, with higher magnetic moment and anhysteretic behaviour, is attributed to the presence of mixed phases of BiFeO3.
publishDate 2017
dc.date.none.fl_str_mv 2017-09-28
2022-04-28T19:06:58Z
2022-04-28T19:06:58Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://dx.doi.org/10.1063/1.5003764
Journal of Applied Physics, v. 122, n. 12, 2017.
1089-7550
0021-8979
http://hdl.handle.net/11449/220926
10.1063/1.5003764
2-s2.0-85029897727
url http://dx.doi.org/10.1063/1.5003764
http://hdl.handle.net/11449/220926
identifier_str_mv Journal of Applied Physics, v. 122, n. 12, 2017.
1089-7550
0021-8979
10.1063/1.5003764
2-s2.0-85029897727
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Journal of Applied Physics
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.source.none.fl_str_mv Scopus
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
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