Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering
Autor(a) principal: | |
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Data de Publicação: | 2017 |
Outros Autores: | , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1063/1.5003764 http://hdl.handle.net/11449/220926 |
Resumo: | A series of epitaxial BiFeO3 thin films has been grown under high partial pressure in a pure O2 atmosphere, which leads to a low deposition rate. The samples grown under these conditions have presented an evolution of the quality of the epitaxy as the deposition temperature increases, however, spurious β-Bi2O3 and supertetragonal BiFeO3 phases are present in the films grown at higher temperatures. The presence of γ-Fe2O3 is reported in one growing condition, and has been attributed to the origin of hysteretic ferromagnetic behavior. A second kind of magnetism, with higher magnetic moment and anhysteretic behaviour, is attributed to the presence of mixed phases of BiFeO3. |
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Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputteringA series of epitaxial BiFeO3 thin films has been grown under high partial pressure in a pure O2 atmosphere, which leads to a low deposition rate. The samples grown under these conditions have presented an evolution of the quality of the epitaxy as the deposition temperature increases, however, spurious β-Bi2O3 and supertetragonal BiFeO3 phases are present in the films grown at higher temperatures. The presence of γ-Fe2O3 is reported in one growing condition, and has been attributed to the origin of hysteretic ferromagnetic behavior. A second kind of magnetism, with higher magnetic moment and anhysteretic behaviour, is attributed to the presence of mixed phases of BiFeO3.Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Laboratório Nacional de Luz Síncrotron Centro Nacional de Pesquisa em Energia e MateriaisInstituto de Física Gleb Wataghin Universidade Estadual de CampinasInstituto de Física de São Carlos Universidade Estadual de São PauloInstituto de Física de São Carlos Universidade Estadual de São PauloFAPESP: 2012/18397-1FAPESP: 2012/51198-2CNPq: 309354/2015-3Centro Nacional de Pesquisa em Energia e MateriaisUniversidade Estadual de Campinas (UNICAMP)Universidade Estadual Paulista (UNESP)Mori, Thiago J. A.Mouls, Caroline L.Morgado, Felipe F. [UNESP]Schio, PedroCezar, Júlio C.2022-04-28T19:06:58Z2022-04-28T19:06:58Z2017-09-28info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articlehttp://dx.doi.org/10.1063/1.5003764Journal of Applied Physics, v. 122, n. 12, 2017.1089-75500021-8979http://hdl.handle.net/11449/22092610.1063/1.50037642-s2.0-85029897727Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengJournal of Applied Physicsinfo:eu-repo/semantics/openAccess2022-04-28T19:06:58Zoai:repositorio.unesp.br:11449/220926Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T19:14:58.946634Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering |
title |
Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering |
spellingShingle |
Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering Mori, Thiago J. A. |
title_short |
Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering |
title_full |
Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering |
title_fullStr |
Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering |
title_full_unstemmed |
Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering |
title_sort |
Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering |
author |
Mori, Thiago J. A. |
author_facet |
Mori, Thiago J. A. Mouls, Caroline L. Morgado, Felipe F. [UNESP] Schio, Pedro Cezar, Júlio C. |
author_role |
author |
author2 |
Mouls, Caroline L. Morgado, Felipe F. [UNESP] Schio, Pedro Cezar, Júlio C. |
author2_role |
author author author author |
dc.contributor.none.fl_str_mv |
Centro Nacional de Pesquisa em Energia e Materiais Universidade Estadual de Campinas (UNICAMP) Universidade Estadual Paulista (UNESP) |
dc.contributor.author.fl_str_mv |
Mori, Thiago J. A. Mouls, Caroline L. Morgado, Felipe F. [UNESP] Schio, Pedro Cezar, Júlio C. |
description |
A series of epitaxial BiFeO3 thin films has been grown under high partial pressure in a pure O2 atmosphere, which leads to a low deposition rate. The samples grown under these conditions have presented an evolution of the quality of the epitaxy as the deposition temperature increases, however, spurious β-Bi2O3 and supertetragonal BiFeO3 phases are present in the films grown at higher temperatures. The presence of γ-Fe2O3 is reported in one growing condition, and has been attributed to the origin of hysteretic ferromagnetic behavior. A second kind of magnetism, with higher magnetic moment and anhysteretic behaviour, is attributed to the presence of mixed phases of BiFeO3. |
publishDate |
2017 |
dc.date.none.fl_str_mv |
2017-09-28 2022-04-28T19:06:58Z 2022-04-28T19:06:58Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1063/1.5003764 Journal of Applied Physics, v. 122, n. 12, 2017. 1089-7550 0021-8979 http://hdl.handle.net/11449/220926 10.1063/1.5003764 2-s2.0-85029897727 |
url |
http://dx.doi.org/10.1063/1.5003764 http://hdl.handle.net/11449/220926 |
identifier_str_mv |
Journal of Applied Physics, v. 122, n. 12, 2017. 1089-7550 0021-8979 10.1063/1.5003764 2-s2.0-85029897727 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Journal of Applied Physics |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.source.none.fl_str_mv |
Scopus reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1808129042138791936 |