Operational transconductance amplifier designed with nanowire tunnel-FET with Si, SiGe and Ge sources using experimental data

Detalhes bibliográficos
Autor(a) principal: Moraes Nogueira, Alexandro de
Data de Publicação: 2020
Outros Autores: Der Agopian, Paula Ghedini [UNESP], Martino, Joao Antonio
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://dx.doi.org/10.1088/1361-6641/ab9db5
http://hdl.handle.net/11449/195597
Resumo: In this paper operational transconductance amplifiers (OTA) were designed with nanowire (NW) tunnel field effect transistors (TFET) with different source materials (Si, SiGe, and Ge) and compared with NW Si MOSFET devices. Lookup tables with experimental data were used to model the transistors and simulate the OTAs. At the same dimensions and transistor efficiency region, the TFET OTAs have larger gain than the MOSFET circuit. The Ge-source TFET OTA presents the highest differential gain (105 dB), followed by the Si TFET (96 dB) and the SiGe-source TFET (90 dB), with the MOSFET presenting the lowest gain (51 dB). However, the MOSFET has the best gain-bandwidth product (GBW) (9.2 MHz) followed by the Ge-source TFET (1.6 MHz), the SiGe-source TFET (900 kHz) and the Si TFET (41 kHz). The second group of OTAs, where the same power consumption was considered and where the gain of the MOSFET OTA and the GBW of the TFETs' circuits were increased was also studied. The gain of the MOSFET OTA increased to 56 dB, but it is still lower than the TFET circuits (96, 90 and 102 dB for the Si TFET, SiGe-source TFET and Ge-source TFET, respectively). The GBW of the Si TFET, SiGe-source TFET and Ge-source TFET circuits increased to 71 kHz, 1 MHz, and 2 MHz, respectively. Nevertheless, the MOSFET OTA has the best GBW (4.7 MHz) again but being just 2.35 times the GBW of the Ge-source TFET case. Therefore, because of the high gain of the TFETs OTAs, they are indicated for low power, low-frequency applications, with the Ge-source TFET presenting a good compromise between gain and GBW. The circuits' linearity was also verified, and they demonstrate to be more dependent on bias choices than on the devices themselves.
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spelling Operational transconductance amplifier designed with nanowire tunnel-FET with Si, SiGe and Ge sources using experimental datatunnel field effect transistornanowireoperational transconductance amplifierMOSFETlookup tableanalog circuitVerilog-AIn this paper operational transconductance amplifiers (OTA) were designed with nanowire (NW) tunnel field effect transistors (TFET) with different source materials (Si, SiGe, and Ge) and compared with NW Si MOSFET devices. Lookup tables with experimental data were used to model the transistors and simulate the OTAs. At the same dimensions and transistor efficiency region, the TFET OTAs have larger gain than the MOSFET circuit. The Ge-source TFET OTA presents the highest differential gain (105 dB), followed by the Si TFET (96 dB) and the SiGe-source TFET (90 dB), with the MOSFET presenting the lowest gain (51 dB). However, the MOSFET has the best gain-bandwidth product (GBW) (9.2 MHz) followed by the Ge-source TFET (1.6 MHz), the SiGe-source TFET (900 kHz) and the Si TFET (41 kHz). The second group of OTAs, where the same power consumption was considered and where the gain of the MOSFET OTA and the GBW of the TFETs' circuits were increased was also studied. The gain of the MOSFET OTA increased to 56 dB, but it is still lower than the TFET circuits (96, 90 and 102 dB for the Si TFET, SiGe-source TFET and Ge-source TFET, respectively). The GBW of the Si TFET, SiGe-source TFET and Ge-source TFET circuits increased to 71 kHz, 1 MHz, and 2 MHz, respectively. Nevertheless, the MOSFET OTA has the best GBW (4.7 MHz) again but being just 2.35 times the GBW of the Ge-source TFET case. Therefore, because of the high gain of the TFETs OTAs, they are indicated for low power, low-frequency applications, with the Ge-source TFET presenting a good compromise between gain and GBW. The circuits' linearity was also verified, and they demonstrate to be more dependent on bias choices than on the devices themselves.Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)Univ Sao Paulo, LSI PSI USP, Sao Paulo, BrazilSao Paulo State Univ, UNESP, Sao Joao Da Boa Vista, BrazilSao Paulo State Univ, UNESP, Sao Joao Da Boa Vista, BrazilIop Publishing LtdUniversidade de São Paulo (USP)Universidade Estadual Paulista (Unesp)Moraes Nogueira, Alexandro deDer Agopian, Paula Ghedini [UNESP]Martino, Joao Antonio2020-12-10T17:40:00Z2020-12-10T17:40:00Z2020-09-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article9http://dx.doi.org/10.1088/1361-6641/ab9db5Semiconductor Science And Technology. Bristol: Iop Publishing Ltd, v. 35, n. 9, 9 p., 2020.0268-1242http://hdl.handle.net/11449/19559710.1088/1361-6641/ab9db5WOS:000560443900001Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengSemiconductor Science And Technologyinfo:eu-repo/semantics/openAccess2021-10-23T08:18:16Zoai:repositorio.unesp.br:11449/195597Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T18:48:27.932141Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Operational transconductance amplifier designed with nanowire tunnel-FET with Si, SiGe and Ge sources using experimental data
title Operational transconductance amplifier designed with nanowire tunnel-FET with Si, SiGe and Ge sources using experimental data
spellingShingle Operational transconductance amplifier designed with nanowire tunnel-FET with Si, SiGe and Ge sources using experimental data
Moraes Nogueira, Alexandro de
tunnel field effect transistor
nanowire
operational transconductance amplifier
MOSFET
lookup table
analog circuit
Verilog-A
title_short Operational transconductance amplifier designed with nanowire tunnel-FET with Si, SiGe and Ge sources using experimental data
title_full Operational transconductance amplifier designed with nanowire tunnel-FET with Si, SiGe and Ge sources using experimental data
title_fullStr Operational transconductance amplifier designed with nanowire tunnel-FET with Si, SiGe and Ge sources using experimental data
title_full_unstemmed Operational transconductance amplifier designed with nanowire tunnel-FET with Si, SiGe and Ge sources using experimental data
title_sort Operational transconductance amplifier designed with nanowire tunnel-FET with Si, SiGe and Ge sources using experimental data
author Moraes Nogueira, Alexandro de
author_facet Moraes Nogueira, Alexandro de
Der Agopian, Paula Ghedini [UNESP]
Martino, Joao Antonio
author_role author
author2 Der Agopian, Paula Ghedini [UNESP]
Martino, Joao Antonio
author2_role author
author
dc.contributor.none.fl_str_mv Universidade de São Paulo (USP)
Universidade Estadual Paulista (Unesp)
dc.contributor.author.fl_str_mv Moraes Nogueira, Alexandro de
Der Agopian, Paula Ghedini [UNESP]
Martino, Joao Antonio
dc.subject.por.fl_str_mv tunnel field effect transistor
nanowire
operational transconductance amplifier
MOSFET
lookup table
analog circuit
Verilog-A
topic tunnel field effect transistor
nanowire
operational transconductance amplifier
MOSFET
lookup table
analog circuit
Verilog-A
description In this paper operational transconductance amplifiers (OTA) were designed with nanowire (NW) tunnel field effect transistors (TFET) with different source materials (Si, SiGe, and Ge) and compared with NW Si MOSFET devices. Lookup tables with experimental data were used to model the transistors and simulate the OTAs. At the same dimensions and transistor efficiency region, the TFET OTAs have larger gain than the MOSFET circuit. The Ge-source TFET OTA presents the highest differential gain (105 dB), followed by the Si TFET (96 dB) and the SiGe-source TFET (90 dB), with the MOSFET presenting the lowest gain (51 dB). However, the MOSFET has the best gain-bandwidth product (GBW) (9.2 MHz) followed by the Ge-source TFET (1.6 MHz), the SiGe-source TFET (900 kHz) and the Si TFET (41 kHz). The second group of OTAs, where the same power consumption was considered and where the gain of the MOSFET OTA and the GBW of the TFETs' circuits were increased was also studied. The gain of the MOSFET OTA increased to 56 dB, but it is still lower than the TFET circuits (96, 90 and 102 dB for the Si TFET, SiGe-source TFET and Ge-source TFET, respectively). The GBW of the Si TFET, SiGe-source TFET and Ge-source TFET circuits increased to 71 kHz, 1 MHz, and 2 MHz, respectively. Nevertheless, the MOSFET OTA has the best GBW (4.7 MHz) again but being just 2.35 times the GBW of the Ge-source TFET case. Therefore, because of the high gain of the TFETs OTAs, they are indicated for low power, low-frequency applications, with the Ge-source TFET presenting a good compromise between gain and GBW. The circuits' linearity was also verified, and they demonstrate to be more dependent on bias choices than on the devices themselves.
publishDate 2020
dc.date.none.fl_str_mv 2020-12-10T17:40:00Z
2020-12-10T17:40:00Z
2020-09-01
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://dx.doi.org/10.1088/1361-6641/ab9db5
Semiconductor Science And Technology. Bristol: Iop Publishing Ltd, v. 35, n. 9, 9 p., 2020.
0268-1242
http://hdl.handle.net/11449/195597
10.1088/1361-6641/ab9db5
WOS:000560443900001
url http://dx.doi.org/10.1088/1361-6641/ab9db5
http://hdl.handle.net/11449/195597
identifier_str_mv Semiconductor Science And Technology. Bristol: Iop Publishing Ltd, v. 35, n. 9, 9 p., 2020.
0268-1242
10.1088/1361-6641/ab9db5
WOS:000560443900001
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Semiconductor Science And Technology
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 9
dc.publisher.none.fl_str_mv Iop Publishing Ltd
publisher.none.fl_str_mv Iop Publishing Ltd
dc.source.none.fl_str_mv Web of Science
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
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