Improving positive and negative bias illumination stress stability in parylene passivated IGZO transistors
Autor(a) principal: | |
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Data de Publicação: | 2016 |
Outros Autores: | , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/10400.1/9363 |
Resumo: | The impact of a parylene top-coating layer on the illumination and bias stress instabilities of indium-gallium-zinc oxide thin-film transistors (TFTs) is presented and discussed. The parylene coating substantially reduces the threshold voltage shift caused by continuous application of a gate bias and light exposure. The operational stability improves by 75%, and the light induced instability is reduced by 35%. The operational stability is quantified by fitting the threshold voltage shift with a stretched exponential model. Storage time as long as 7 months does not cause any measurable degradation on the electrical performance. It is proposed that parylene plays not only the role of an encapsulation layer but also of a defect passivation on the top semiconductor surface. It is also reported that depletion-mode TFTs are less sensitive to light induced instabilities. This is attributed to a defect neutralization process in the presence of free electrons. Published by AIP Publishing. |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
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7160 |
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Improving positive and negative bias illumination stress stability in parylene passivated IGZO transistorsThe impact of a parylene top-coating layer on the illumination and bias stress instabilities of indium-gallium-zinc oxide thin-film transistors (TFTs) is presented and discussed. The parylene coating substantially reduces the threshold voltage shift caused by continuous application of a gate bias and light exposure. The operational stability improves by 75%, and the light induced instability is reduced by 35%. The operational stability is quantified by fitting the threshold voltage shift with a stretched exponential model. Storage time as long as 7 months does not cause any measurable degradation on the electrical performance. It is proposed that parylene plays not only the role of an encapsulation layer but also of a defect passivation on the top semiconductor surface. It is also reported that depletion-mode TFTs are less sensitive to light induced instabilities. This is attributed to a defect neutralization process in the presence of free electrons. Published by AIP Publishing.SapientiaKiazadeh, AsalGomes, Henrique L.Barquinha, PedroMartins, JorgeRovisco, AnaPinto, Joana V.Martins, RodrigoFortunato, Elvira2017-04-07T15:56:16Z2016-082016-08-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10400.1/9363eng0003-6951AUT: HGO00803;10.1063/1.4960200info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-24T10:20:47Zoai:sapientia.ualg.pt:10400.1/9363Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T20:01:19.796348Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Improving positive and negative bias illumination stress stability in parylene passivated IGZO transistors |
title |
Improving positive and negative bias illumination stress stability in parylene passivated IGZO transistors |
spellingShingle |
Improving positive and negative bias illumination stress stability in parylene passivated IGZO transistors Kiazadeh, Asal |
title_short |
Improving positive and negative bias illumination stress stability in parylene passivated IGZO transistors |
title_full |
Improving positive and negative bias illumination stress stability in parylene passivated IGZO transistors |
title_fullStr |
Improving positive and negative bias illumination stress stability in parylene passivated IGZO transistors |
title_full_unstemmed |
Improving positive and negative bias illumination stress stability in parylene passivated IGZO transistors |
title_sort |
Improving positive and negative bias illumination stress stability in parylene passivated IGZO transistors |
author |
Kiazadeh, Asal |
author_facet |
Kiazadeh, Asal Gomes, Henrique L. Barquinha, Pedro Martins, Jorge Rovisco, Ana Pinto, Joana V. Martins, Rodrigo Fortunato, Elvira |
author_role |
author |
author2 |
Gomes, Henrique L. Barquinha, Pedro Martins, Jorge Rovisco, Ana Pinto, Joana V. Martins, Rodrigo Fortunato, Elvira |
author2_role |
author author author author author author author |
dc.contributor.none.fl_str_mv |
Sapientia |
dc.contributor.author.fl_str_mv |
Kiazadeh, Asal Gomes, Henrique L. Barquinha, Pedro Martins, Jorge Rovisco, Ana Pinto, Joana V. Martins, Rodrigo Fortunato, Elvira |
description |
The impact of a parylene top-coating layer on the illumination and bias stress instabilities of indium-gallium-zinc oxide thin-film transistors (TFTs) is presented and discussed. The parylene coating substantially reduces the threshold voltage shift caused by continuous application of a gate bias and light exposure. The operational stability improves by 75%, and the light induced instability is reduced by 35%. The operational stability is quantified by fitting the threshold voltage shift with a stretched exponential model. Storage time as long as 7 months does not cause any measurable degradation on the electrical performance. It is proposed that parylene plays not only the role of an encapsulation layer but also of a defect passivation on the top semiconductor surface. It is also reported that depletion-mode TFTs are less sensitive to light induced instabilities. This is attributed to a defect neutralization process in the presence of free electrons. Published by AIP Publishing. |
publishDate |
2016 |
dc.date.none.fl_str_mv |
2016-08 2016-08-01T00:00:00Z 2017-04-07T15:56:16Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/10400.1/9363 |
url |
http://hdl.handle.net/10400.1/9363 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
0003-6951 AUT: HGO00803; 10.1063/1.4960200 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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1799133241538510848 |