Electron field emission measurements from boron-doped CVD diamond on tantalum
Autor(a) principal: | |
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Data de Publicação: | 2003 |
Outros Autores: | , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Brazilian Journal of Physics |
Texto Completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332003000100006 |
Resumo: | Boron-doped polycrystaline diamond films grown by hot-filament-assisted chemical vapor deposition were studied with ultraviolet photoemission spectroscopy (UPS), Raman spectroscopy, X-ray diffractometry and current voltage measurements. The UPS measurement shows that the work function (phi) without electric field is about 3.9 eV . The field-emission current-voltage measurements indicate a threshold voltage ranging from 8.97x106 to 9.64x106 V=m and a work function (phi) about 0.3 eV . These results show that boron doped diamond films exhibit a negative electron affinity in high electric field. |
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Brazilian Journal of Physics |
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Electron field emission measurements from boron-doped CVD diamond on tantalumBoron-doped polycrystaline diamond films grown by hot-filament-assisted chemical vapor deposition were studied with ultraviolet photoemission spectroscopy (UPS), Raman spectroscopy, X-ray diffractometry and current voltage measurements. The UPS measurement shows that the work function (phi) without electric field is about 3.9 eV . The field-emission current-voltage measurements indicate a threshold voltage ranging from 8.97x106 to 9.64x106 V=m and a work function (phi) about 0.3 eV . These results show that boron doped diamond films exhibit a negative electron affinity in high electric field.Sociedade Brasileira de Física2003-03-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332003000100006Brazilian Journal of Physics v.33 n.1 2003reponame:Brazilian Journal of Physicsinstname:Sociedade Brasileira de Física (SBF)instacron:SBF10.1590/S0103-97332003000100006info:eu-repo/semantics/openAccessGonçalves,J. A. N.Sandonato,G. M.Iha,K.eng2003-04-23T00:00:00Zoai:scielo:S0103-97332003000100006Revistahttp://www.sbfisica.org.br/v1/home/index.php/pt/ONGhttps://old.scielo.br/oai/scielo-oai.phpsbfisica@sbfisica.org.br||sbfisica@sbfisica.org.br1678-44480103-9733opendoar:2003-04-23T00:00Brazilian Journal of Physics - Sociedade Brasileira de Física (SBF)false |
dc.title.none.fl_str_mv |
Electron field emission measurements from boron-doped CVD diamond on tantalum |
title |
Electron field emission measurements from boron-doped CVD diamond on tantalum |
spellingShingle |
Electron field emission measurements from boron-doped CVD diamond on tantalum Gonçalves,J. A. N. |
title_short |
Electron field emission measurements from boron-doped CVD diamond on tantalum |
title_full |
Electron field emission measurements from boron-doped CVD diamond on tantalum |
title_fullStr |
Electron field emission measurements from boron-doped CVD diamond on tantalum |
title_full_unstemmed |
Electron field emission measurements from boron-doped CVD diamond on tantalum |
title_sort |
Electron field emission measurements from boron-doped CVD diamond on tantalum |
author |
Gonçalves,J. A. N. |
author_facet |
Gonçalves,J. A. N. Sandonato,G. M. Iha,K. |
author_role |
author |
author2 |
Sandonato,G. M. Iha,K. |
author2_role |
author author |
dc.contributor.author.fl_str_mv |
Gonçalves,J. A. N. Sandonato,G. M. Iha,K. |
description |
Boron-doped polycrystaline diamond films grown by hot-filament-assisted chemical vapor deposition were studied with ultraviolet photoemission spectroscopy (UPS), Raman spectroscopy, X-ray diffractometry and current voltage measurements. The UPS measurement shows that the work function (phi) without electric field is about 3.9 eV . The field-emission current-voltage measurements indicate a threshold voltage ranging from 8.97x106 to 9.64x106 V=m and a work function (phi) about 0.3 eV . These results show that boron doped diamond films exhibit a negative electron affinity in high electric field. |
publishDate |
2003 |
dc.date.none.fl_str_mv |
2003-03-01 |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332003000100006 |
url |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332003000100006 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1590/S0103-97332003000100006 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
text/html |
dc.publisher.none.fl_str_mv |
Sociedade Brasileira de Física |
publisher.none.fl_str_mv |
Sociedade Brasileira de Física |
dc.source.none.fl_str_mv |
Brazilian Journal of Physics v.33 n.1 2003 reponame:Brazilian Journal of Physics instname:Sociedade Brasileira de Física (SBF) instacron:SBF |
instname_str |
Sociedade Brasileira de Física (SBF) |
instacron_str |
SBF |
institution |
SBF |
reponame_str |
Brazilian Journal of Physics |
collection |
Brazilian Journal of Physics |
repository.name.fl_str_mv |
Brazilian Journal of Physics - Sociedade Brasileira de Física (SBF) |
repository.mail.fl_str_mv |
sbfisica@sbfisica.org.br||sbfisica@sbfisica.org.br |
_version_ |
1754734860109348864 |