Electrical properties of boron doped CVD diamond after plasma cleaning probed by capacitance-voltage profiling

Detalhes bibliográficos
Autor(a) principal: Araujo, Luana S.
Data de Publicação: 2014
Outros Autores: Berengue, Olivia [UNESP], Baldan, Maurício, Ferreira, Neidenei, Moro, João, Chiquito, Adenilson
Tipo de documento: Artigo de conferência
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://dx.doi.org/10.1557/opl.2014.701
http://hdl.handle.net/11449/220415
Resumo: Doped diamond films grown by chemical vapor techniques has been used to study hydrogen and oxygen terminated diamond. It is known that the electrical characteristics of metaldiamond interface are strongly affected by the diamond surface features. O<inf>2</inf> plasma treatment was used as a cleaning procedure for as grown diamond samples leading to changes in the capacitance measurements after treatment. The alteration in the characteristics of the samples can be attributed to the surface adsorbates like hydrogen and water vapor present in the atmosphere. The results indicates that the O<inf>2</inf> plasma treatment was effective in cleaning the surface revealing the expected features of a p-type diamond film.
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spelling Electrical properties of boron doped CVD diamond after plasma cleaning probed by capacitance-voltage profilingDoped diamond films grown by chemical vapor techniques has been used to study hydrogen and oxygen terminated diamond. It is known that the electrical characteristics of metaldiamond interface are strongly affected by the diamond surface features. O<inf>2</inf> plasma treatment was used as a cleaning procedure for as grown diamond samples leading to changes in the capacitance measurements after treatment. The alteration in the characteristics of the samples can be attributed to the surface adsorbates like hydrogen and water vapor present in the atmosphere. The results indicates that the O<inf>2</inf> plasma treatment was effective in cleaning the surface revealing the expected features of a p-type diamond film.Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)NanO LaB, Departamento de Física, Universidade Federal de São CarlosFaculdade de Engenharia de Guaratinguetá, Universidade Estadual Júlio de Mesquita FilhoLaboratório Associado de Sensores e Materiais, LAS, INPEInstitute Federal de Educação, Ciência e Tecnologia de São PauloFaculdade de Engenharia de Guaratinguetá, Universidade Estadual Júlio de Mesquita FilhoCNPq: 2010/302640-0Universidade Federal de São Carlos (UFSCar)Universidade Estadual Paulista (UNESP)Laboratório Associado de Sensores e Materiais, LAS, INPEInstitute Federal de Educação, Ciência e Tecnologia de São PauloAraujo, Luana S.Berengue, Olivia [UNESP]Baldan, MaurícioFerreira, NeideneiMoro, JoãoChiquito, Adenilson2022-04-28T19:01:26Z2022-04-28T19:01:26Z2014-01-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject1-6http://dx.doi.org/10.1557/opl.2014.701Materials Research Society Symposium Proceedings, v. 1634, n. January, p. 1-6, 2014.0272-9172http://hdl.handle.net/11449/22041510.1557/opl.2014.7012-s2.0-84938360068Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengMaterials Research Society Symposium Proceedingsinfo:eu-repo/semantics/openAccess2022-04-28T19:01:26Zoai:repositorio.unesp.br:11449/220415Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462022-04-28T19:01:26Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Electrical properties of boron doped CVD diamond after plasma cleaning probed by capacitance-voltage profiling
title Electrical properties of boron doped CVD diamond after plasma cleaning probed by capacitance-voltage profiling
spellingShingle Electrical properties of boron doped CVD diamond after plasma cleaning probed by capacitance-voltage profiling
Araujo, Luana S.
title_short Electrical properties of boron doped CVD diamond after plasma cleaning probed by capacitance-voltage profiling
title_full Electrical properties of boron doped CVD diamond after plasma cleaning probed by capacitance-voltage profiling
title_fullStr Electrical properties of boron doped CVD diamond after plasma cleaning probed by capacitance-voltage profiling
title_full_unstemmed Electrical properties of boron doped CVD diamond after plasma cleaning probed by capacitance-voltage profiling
title_sort Electrical properties of boron doped CVD diamond after plasma cleaning probed by capacitance-voltage profiling
author Araujo, Luana S.
author_facet Araujo, Luana S.
Berengue, Olivia [UNESP]
Baldan, Maurício
Ferreira, Neidenei
Moro, João
Chiquito, Adenilson
author_role author
author2 Berengue, Olivia [UNESP]
Baldan, Maurício
Ferreira, Neidenei
Moro, João
Chiquito, Adenilson
author2_role author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade Federal de São Carlos (UFSCar)
Universidade Estadual Paulista (UNESP)
Laboratório Associado de Sensores e Materiais, LAS, INPE
Institute Federal de Educação, Ciência e Tecnologia de São Paulo
dc.contributor.author.fl_str_mv Araujo, Luana S.
Berengue, Olivia [UNESP]
Baldan, Maurício
Ferreira, Neidenei
Moro, João
Chiquito, Adenilson
description Doped diamond films grown by chemical vapor techniques has been used to study hydrogen and oxygen terminated diamond. It is known that the electrical characteristics of metaldiamond interface are strongly affected by the diamond surface features. O<inf>2</inf> plasma treatment was used as a cleaning procedure for as grown diamond samples leading to changes in the capacitance measurements after treatment. The alteration in the characteristics of the samples can be attributed to the surface adsorbates like hydrogen and water vapor present in the atmosphere. The results indicates that the O<inf>2</inf> plasma treatment was effective in cleaning the surface revealing the expected features of a p-type diamond film.
publishDate 2014
dc.date.none.fl_str_mv 2014-01-01
2022-04-28T19:01:26Z
2022-04-28T19:01:26Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/conferenceObject
format conferenceObject
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://dx.doi.org/10.1557/opl.2014.701
Materials Research Society Symposium Proceedings, v. 1634, n. January, p. 1-6, 2014.
0272-9172
http://hdl.handle.net/11449/220415
10.1557/opl.2014.701
2-s2.0-84938360068
url http://dx.doi.org/10.1557/opl.2014.701
http://hdl.handle.net/11449/220415
identifier_str_mv Materials Research Society Symposium Proceedings, v. 1634, n. January, p. 1-6, 2014.
0272-9172
10.1557/opl.2014.701
2-s2.0-84938360068
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Materials Research Society Symposium Proceedings
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 1-6
dc.source.none.fl_str_mv Scopus
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
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