Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate

Detalhes bibliográficos
Autor(a) principal: Souza, Joel Pereira de
Data de Publicação: 1994
Outros Autores: Boudinov, Henri Ivanov, Fichtner, Paulo Fernando Papaleo
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFRGS
Texto Completo: http://hdl.handle.net/10183/117946
Resumo: The effect of C on the implantation damage accumulation in Si crystal and on the electrical T activation of dopants was investigated, using RBS-channeling technique, sheet resistivity and Hall measurements. The damage profiles in Si implanted with 12C+ or llBS at 50 keV to the same doses and dose rate were compared. It was found that the damage accumulates at a noticeably higher rate during 12c+im plantation than in the case of "B+, especially for doses > 2 x I0l5 ~rn-~I t. i s shown that the dynamic annealing is strongly reduced in regions doped with C. In addition, the influence of C on the electrical activation of the co-implanted dopant is discussed for the case of B and Bi. A model considering an interaction between C and Si self-interstitial (Sir) atoms during implantation and the subsequent thermal annealing is proposed to explain the enhanced implantation damage accumulation and the activation behavior of B in samples co-implanted with C
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spelling Souza, Joel Pereira deBoudinov, Henri IvanovFichtner, Paulo Fernando Papaleo2015-06-18T02:01:03Z19940103-9733http://hdl.handle.net/10183/117946000220163The effect of C on the implantation damage accumulation in Si crystal and on the electrical T activation of dopants was investigated, using RBS-channeling technique, sheet resistivity and Hall measurements. The damage profiles in Si implanted with 12C+ or llBS at 50 keV to the same doses and dose rate were compared. It was found that the damage accumulates at a noticeably higher rate during 12c+im plantation than in the case of "B+, especially for doses > 2 x I0l5 ~rn-~I t. i s shown that the dynamic annealing is strongly reduced in regions doped with C. In addition, the influence of C on the electrical activation of the co-implanted dopant is discussed for the case of B and Bi. A model considering an interaction between C and Si self-interstitial (Sir) atoms during implantation and the subsequent thermal annealing is proposed to explain the enhanced implantation damage accumulation and the activation behavior of B in samples co-implanted with Capplication/pdfengBrazilian journal of physics. São Paulo. Vol. 24, no. 2 (June 1994), p. 538-542Física da matéria condensadaImplantação de íonsEffects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrateinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/otherinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFRGSinstname:Universidade Federal do Rio Grande do Sul (UFRGS)instacron:UFRGSORIGINAL000220163.pdf000220163.pdfTexto completo (inglês)application/pdf199195http://www.lume.ufrgs.br/bitstream/10183/117946/1/000220163.pdf7602427a68d21b218ded3003c069fd5cMD51TEXT000220163.pdf.txt000220163.pdf.txtExtracted Texttext/plain16787http://www.lume.ufrgs.br/bitstream/10183/117946/2/000220163.pdf.txt4b78e91ca6deab32b3b07d75405df2e3MD52THUMBNAIL000220163.pdf.jpg000220163.pdf.jpgGenerated Thumbnailimage/jpeg1831http://www.lume.ufrgs.br/bitstream/10183/117946/3/000220163.pdf.jpg335812f3c11ab1b30990fff0d9d4d7c8MD5310183/1179462022-02-22 05:02:56.579409oai:www.lume.ufrgs.br:10183/117946Repositório de PublicaçõesPUBhttps://lume.ufrgs.br/oai/requestopendoar:2022-02-22T08:02:56Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)false
dc.title.pt_BR.fl_str_mv Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate
title Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate
spellingShingle Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate
Souza, Joel Pereira de
Física da matéria condensada
Implantação de íons
title_short Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate
title_full Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate
title_fullStr Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate
title_full_unstemmed Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate
title_sort Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate
author Souza, Joel Pereira de
author_facet Souza, Joel Pereira de
Boudinov, Henri Ivanov
Fichtner, Paulo Fernando Papaleo
author_role author
author2 Boudinov, Henri Ivanov
Fichtner, Paulo Fernando Papaleo
author2_role author
author
dc.contributor.author.fl_str_mv Souza, Joel Pereira de
Boudinov, Henri Ivanov
Fichtner, Paulo Fernando Papaleo
dc.subject.por.fl_str_mv Física da matéria condensada
Implantação de íons
topic Física da matéria condensada
Implantação de íons
description The effect of C on the implantation damage accumulation in Si crystal and on the electrical T activation of dopants was investigated, using RBS-channeling technique, sheet resistivity and Hall measurements. The damage profiles in Si implanted with 12C+ or llBS at 50 keV to the same doses and dose rate were compared. It was found that the damage accumulates at a noticeably higher rate during 12c+im plantation than in the case of "B+, especially for doses > 2 x I0l5 ~rn-~I t. i s shown that the dynamic annealing is strongly reduced in regions doped with C. In addition, the influence of C on the electrical activation of the co-implanted dopant is discussed for the case of B and Bi. A model considering an interaction between C and Si self-interstitial (Sir) atoms during implantation and the subsequent thermal annealing is proposed to explain the enhanced implantation damage accumulation and the activation behavior of B in samples co-implanted with C
publishDate 1994
dc.date.issued.fl_str_mv 1994
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dc.language.iso.fl_str_mv eng
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dc.relation.ispartof.pt_BR.fl_str_mv Brazilian journal of physics. São Paulo. Vol. 24, no. 2 (June 1994), p. 538-542
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