Overpressurized bubbles versus voids formed in helium implanted annealed silicon
Autor(a) principal: | |
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Data de Publicação: | 1997 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UFRGS |
Texto Completo: | http://hdl.handle.net/10183/140720 |
Resumo: | The formation of helium induced cavities in silicon is studied as a function of implant energy (10 and 40 keV) and dose (131015, 131016, and 531016 cm22). Specimens are analyzed after annealing (800 °C, 10 min) by transmission electron microscopy (TEM) and elastic recoil detection (ERD). Cavity nucleation and growth phenomena are discussed in terms of three different regimes depending on the implanted He content. For the low (131015 cm22) and high (531016 cm22) doses our results are consistent with the information in the literature. However, at the medium dose (131016 cm22), contrary to the gas release calculations which predict the formation of empty cavities, ERD analysis shows that a measurable fraction of the implanted He is still present in the annealed samples. In this case TEM analyses reveal that the cavities are surrounded by a strong strain field contrast and dislocation loops are generated. The results obtained are discussed on the basis of an alternative nucleation and growth behavior that allows the formation of bubbles in an overpressurized state irrespective of the competition with the gas release process. |
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Fichtner, Paulo Fernando PapaleoKaschny, Jorge Ricardo de AraujoYankov, Rossen A.Mucklich, A.Kreissig, UlrichSkorupa, Wolfgang2016-05-11T02:10:27Z19970003-6951http://hdl.handle.net/10183/140720000192461The formation of helium induced cavities in silicon is studied as a function of implant energy (10 and 40 keV) and dose (131015, 131016, and 531016 cm22). Specimens are analyzed after annealing (800 °C, 10 min) by transmission electron microscopy (TEM) and elastic recoil detection (ERD). Cavity nucleation and growth phenomena are discussed in terms of three different regimes depending on the implanted He content. For the low (131015 cm22) and high (531016 cm22) doses our results are consistent with the information in the literature. However, at the medium dose (131016 cm22), contrary to the gas release calculations which predict the formation of empty cavities, ERD analysis shows that a measurable fraction of the implanted He is still present in the annealed samples. In this case TEM analyses reveal that the cavities are surrounded by a strong strain field contrast and dislocation loops are generated. The results obtained are discussed on the basis of an alternative nucleation and growth behavior that allows the formation of bubbles in an overpressurized state irrespective of the competition with the gas release process.application/pdfengApplied physics letters. New York. Vol. 70, no. 6 (Feb. 1997), p. 732-734HélioFísica da matéria condensadaOverpressurized bubbles versus voids formed in helium implanted annealed siliconEstrangeiroinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFRGSinstname:Universidade Federal do Rio Grande do Sul (UFRGS)instacron:UFRGSORIGINAL000192461.pdf000192461.pdfTexto completo (inglês)application/pdf556912http://www.lume.ufrgs.br/bitstream/10183/140720/1/000192461.pdfe83d5566047a194b628d582ed2f89b24MD51TEXT000192461.pdf.txt000192461.pdf.txtExtracted Texttext/plain19416http://www.lume.ufrgs.br/bitstream/10183/140720/2/000192461.pdf.txt73389e2514de8180d190b686c178157bMD52THUMBNAIL000192461.pdf.jpg000192461.pdf.jpgGenerated Thumbnailimage/jpeg2218http://www.lume.ufrgs.br/bitstream/10183/140720/3/000192461.pdf.jpg90d750191b15722478a4b34857573fc8MD5310183/1407202020-01-16 05:09:31.548364oai:www.lume.ufrgs.br:10183/140720Repositório de PublicaçõesPUBhttps://lume.ufrgs.br/oai/requestopendoar:2020-01-16T07:09:31Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)false |
dc.title.pt_BR.fl_str_mv |
Overpressurized bubbles versus voids formed in helium implanted annealed silicon |
title |
Overpressurized bubbles versus voids formed in helium implanted annealed silicon |
spellingShingle |
Overpressurized bubbles versus voids formed in helium implanted annealed silicon Fichtner, Paulo Fernando Papaleo Hélio Física da matéria condensada |
title_short |
Overpressurized bubbles versus voids formed in helium implanted annealed silicon |
title_full |
Overpressurized bubbles versus voids formed in helium implanted annealed silicon |
title_fullStr |
Overpressurized bubbles versus voids formed in helium implanted annealed silicon |
title_full_unstemmed |
Overpressurized bubbles versus voids formed in helium implanted annealed silicon |
title_sort |
Overpressurized bubbles versus voids formed in helium implanted annealed silicon |
author |
Fichtner, Paulo Fernando Papaleo |
author_facet |
Fichtner, Paulo Fernando Papaleo Kaschny, Jorge Ricardo de Araujo Yankov, Rossen A. Mucklich, A. Kreissig, Ulrich Skorupa, Wolfgang |
author_role |
author |
author2 |
Kaschny, Jorge Ricardo de Araujo Yankov, Rossen A. Mucklich, A. Kreissig, Ulrich Skorupa, Wolfgang |
author2_role |
author author author author author |
dc.contributor.author.fl_str_mv |
Fichtner, Paulo Fernando Papaleo Kaschny, Jorge Ricardo de Araujo Yankov, Rossen A. Mucklich, A. Kreissig, Ulrich Skorupa, Wolfgang |
dc.subject.por.fl_str_mv |
Hélio Física da matéria condensada |
topic |
Hélio Física da matéria condensada |
description |
The formation of helium induced cavities in silicon is studied as a function of implant energy (10 and 40 keV) and dose (131015, 131016, and 531016 cm22). Specimens are analyzed after annealing (800 °C, 10 min) by transmission electron microscopy (TEM) and elastic recoil detection (ERD). Cavity nucleation and growth phenomena are discussed in terms of three different regimes depending on the implanted He content. For the low (131015 cm22) and high (531016 cm22) doses our results are consistent with the information in the literature. However, at the medium dose (131016 cm22), contrary to the gas release calculations which predict the formation of empty cavities, ERD analysis shows that a measurable fraction of the implanted He is still present in the annealed samples. In this case TEM analyses reveal that the cavities are surrounded by a strong strain field contrast and dislocation loops are generated. The results obtained are discussed on the basis of an alternative nucleation and growth behavior that allows the formation of bubbles in an overpressurized state irrespective of the competition with the gas release process. |
publishDate |
1997 |
dc.date.issued.fl_str_mv |
1997 |
dc.date.accessioned.fl_str_mv |
2016-05-11T02:10:27Z |
dc.type.driver.fl_str_mv |
Estrangeiro info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
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http://hdl.handle.net/10183/140720 |
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0003-6951 |
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000192461 |
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http://hdl.handle.net/10183/140720 |
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eng |
language |
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dc.relation.ispartof.pt_BR.fl_str_mv |
Applied physics letters. New York. Vol. 70, no. 6 (Feb. 1997), p. 732-734 |
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openAccess |
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